Rapid fabrication of silk films with controlled architectures via electrogelation.

Current methods to produce silk films include casting and spin coating. Here we introduce a new method for the fabrication of silk films: electrogelation. Through use of a closed-loop anode, films with high surface smoothness and optical transparency are produced. Bending the electrode loop allows films with three-dimensional topologies to be formed, possessing thicknesses capable of descending into the submicron thin film regime.