| Literature DB >> 32251329 |
L Avilés-Félix1, A Olivier2, G Li3, C S Davies3,4, L Álvaro-Gómez2, M Rubio-Roy2, S Auffret2, A Kirilyuk3,4, A V Kimel3, Th Rasing3, L D Buda-Prejbeanu2, R C Sousa2, B Dieny2, I L Prejbeanu2.
Abstract
Ever since the first observation of all-optical switching of magnetization in the ferrimagnetic alloy GdFeCo using femtosecond laser pulses, there has been significant interest in exploiting this process for data-recording applications. In particular, the ultrafast speed of the magnetic reversal can enable the writing speeds associated with magnetic memory devices to be potentially pushed towards THz frequencies. This work reports the development of perpendicular magnetic tunnel junctions incorporating a stack of Tb/Co nanolayers whose magnetization can be all-optically controlled via helicity-independent single-shot switching. Toggling of the magnetization of the Tb/Co electrode was achieved using either 60 femtosecond-long or 5 picosecond-long laser pulses, with incident fluences down to 3.5 mJ/cm2, for Co-rich compositions of the stack either in isolation or coupled to a CoFeB-electrode/MgO-barrier tunnel-junction stack. Successful switching of the CoFeB-[Tb/Co] electrodes was obtained even after annealing at 250 °C. After integration of the [Tb/Co]-based electrodes within perpendicular magnetic tunnel junctions yielded a maximum tunneling magnetoresistance signal of 41% and RxA value of 150 Ωμm2 with current-in-plane measurements and ratios between 28% and 38% in nanopatterned pillars. These results represent a breakthrough for the development of perpendicular magnetic tunnel junctions controllable using single laser pulses, and offer a technologically-viable path towards the realization of hybrid spintronic-photonic systems featuring THz switching speeds.Entities:
Year: 2020 PMID: 32251329 PMCID: PMC7089968 DOI: 10.1038/s41598-020-62104-w
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1(a) Coercive field map of [Tb(tTb)/Co(tCo)]5. The coercive field values were obtained from the M(H) loops measured with H applied perpendicular to the plane of the film. The superimposed gray region in the center indicates the region in which H was not sufficient to saturate the stack. The black dashed line schematically represents the thickness values of Tb and Co for which the coercive field diverges i.e. where magnetic compensation occurs at room temperature. (b) Coercive field of [Tb/Co]5 multilayer as a function of Co thickness tCo: 7–13 Å with the thickness of the Tb layers fixed at tTb = 10 Å. Insets: R(H) for tCo = 8.1 Å and tCo = 10.9 Å as indicated.
Figure 2(a) R(H) obtained from EHE experiments and (b) x-ray reflectivity measurements of [Tb(10 Å)/Co(12 Å)]5 samples as-deposited and annealed at temperatures T = 200, 250 and 300 °C as indicated.
Figure 3(a) Structure of half-MTJ stack used to optimize the magnetic coupling between the [Tb(10 Å)/Co(12 Å)]5 multilayer and the CoFeB electrode. (b) Hysteresis loop of the CoFeB/Ta/[Tb(tTb)/Co(tCo)]5 stack measured on opposite sides of the compensation region. (c) Coercivity map of the half-MTJ along the Tb and Co thickness wedges. The regions enclosed by the symbols indicate the three regions of the CoFeB/Ta/[Tb(tTb)/Co(tCo)]5 structure in which all-optical switching was achieved using different pulse durations: ▵: [Tb(11 Å)/Co(13 Å)]5, ○: [Tb(10 Å)/Co(13 Å)]5 and □: [Tb(8 Å)/Co(12 Å)]5 as indicated. (d–e) Background-corrected magneto-optical images demonstrating successful single-shot all-optical switching of magnetization in the CoFeB/Ta/[Tb(10 Å)/Co(13 Å)]5 stack using (d) ps- and e) fs-long laser pulses in with an incident fluence of 4.7 mJ/cm2 and 3.5 mJ/cm2 respectively.
Figure 4(a) Top: Schematic of the MTJ studied. The MTJ consists of an optically-switchable storage layer CoFeB (13Å)/Ta/[Tb/Co] and a CoFeB free layer, separated by a MgO tunnel barrier. Bottom: SEM Image of the 50 nm patterned MTJ in an intermediate step of the nanofabrication process. (scale bar: 4 μm). Inset: Zoom of the capping layer of the 50 nm-junction before the deposition of the upper electrical contact (scale bar: 100 nm) (b) Out-of-plane M(H) curve measured for the MTJ with the stack [Tb/Co]5. Insets: illustrations of the 4 magnetic states of the MTJ indicating the stages intended for optical writing (state (i) to state (ii)) and electrical readout (state (i) to state (iii)). (c) TMR vs RxA of nano-patterned junctions for stacks with different repetition numbers N of the [Tb/Co] stacks as indicated, with 9.4 Å and 18 Å MgO barriers. The dispersion in the TMR and RxA as calculated from shunt and series resistance models (dashed lines) are also shown. The wafer-level TMR potential for optimal processing is 38% and 28% respectively.