| Literature DB >> 32121168 |
Stefan Lundgaard1,2, Soon Hock Ng1,2, Yoshiaki Nishijima3,4, Michael Mazilu5, Saulius Juodkazis1,4,6.
Abstract
We demonstrate a concept and fabrication of lithography-free layered metal-SiO2 thin-film structures which have reduced reflectivity (black appearance), to as low as 0.9%, with 4.9% broadband reflectance (8.9% for soda lime) in the 500-1400 nm range. The multi-layered (four layers) thin-film metamaterial is designed so that optical impedance matching produces minimal reflectance and transmittance within the visible and infra-red (IR) spectral region for a range of incident angles. The structure has enhanced absorbance and is easily tuned for reduced minimal transmission and reflection. This approach should allow for novel anti-reflection surfaces by impedance matching to be realized.Entities:
Keywords: Metamateraial; optical absorber; thin-film optics
Year: 2020 PMID: 32121168 DOI: 10.3390/mi11030256
Source DB: PubMed Journal: Micromachines (Basel) ISSN: 2072-666X Impact factor: 2.891