| Literature DB >> 32105375 |
Fei Gao1,2, Jian-Huan Wang1,2, Hannes Watzinger3, Hao Hu4, Marko J Rančić5, Jie-Yin Zhang1,2, Ting Wang1,2,6, Yuan Yao1, Gui-Lei Wang7, Josip Kukučka3, Lada Vukušić3, Christoph Kloeffel5, Daniel Loss5, Feng Liu8, Georgios Katsaros3, Jian-Jun Zhang1,2,6.
Abstract
Semiconductor nanowires have been playing a crucial role in the development of nanoscale devices for the realization of spin qubits, Majorana fermions, single photon emitters, nanoprocessors, etc. The monolithic growth of site-controlled nanowires is a prerequisite toward the next generation of devices that will require addressability and scalability. Here, combining top-down nanofabrication and bottom-up self-assembly, the growth of Ge wires on prepatterned Si (001) substrates with controllable position, distance, length, and structure is reported. This is achieved by a novel growth process that uses a SiGe strain-relaxation template and can be potentially generalized to other material combinations. Transport measurements show an electrically tunable spin-orbit coupling, with a spin-orbit length similar to that of III-V materials. Also, charge sensing between quantum dots in closely spaced wires is observed, which underlines their potential for the realization of advanced quantum devices. The reported results open a path toward scalable qubit devices using nanowires on silicon.Entities:
Keywords: controllable growth; germanium; nanowires; qubits; scalability
Year: 2020 PMID: 32105375 DOI: 10.1002/adma.201906523
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849