Literature DB >> 32040297

Directly Linking Low-Angle Grain Boundary Misorientation to Device Functionality for GaAs Grown on Flexible Metal Substrates.

Jonathan D Poplawsky1, Pavel Dutta2, Harvey Guthrey3, Donovan Leonard1, Wei Guo1, Mitsul Kacharia4, Monika Rathi2, Devendra Khatiwada2, Carlos Favela2, Sicong Sun2, Chuanze Zhang2, Seth Hubbard4, Venkat Selvamanickam2.   

Abstract

A new growth method to make highly oriented GaAs thin films on flexible metal substrates has been developed, enabling roll-to-roll manufacturing of flexible semiconductor devices. The grains are oriented in the <001> direction with <1° misorientations between them, and they have a comparable mobility to single-crystalline GaAs at high doping concentrations. At the moment, the role of low-angle grain boundaries (LAGBs) on device performance is unknown. A series of electron backscatter diffraction (EBSD) and cathodoluminesence (CL) studies reveal that increased doping concentrations decrease the grain size and increase the LAGB misorientation. Cross-sectional scanning transmission electron microscopy (STEM) reveals the complex dislocation structures within LAGBs. Most importantly, a correlative EBSD/electron beam-induced current (EBIC) experiment reveals that LAGBs are carrier recombination centers and that the magnitude of recombination is dependent on the degree of misorientation. The presented results directly link increased LAGB misorientation to degraded device performance, and therefore, strategies to reduce LAGB misorientations and densities would improve highly oriented semiconductor devices.

Entities:  

Keywords:  cathodoluminescence; electron beam-induced current; flexible semiconductors; photovoltaics; scanning transmission electron microscopy

Year:  2020        PMID: 32040297     DOI: 10.1021/acsami.9b22124

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  1 in total

1.  Grain boundary passivation via balancing feedback of hole barrier modulation in HfO2-x for nanoscale flexible electronics.

Authors:  Yeon Soo Kim; Harry Chung; Suhyoun Kwon; Jihyun Kim; William Jo
Journal:  Nano Converg       Date:  2022-09-30
  1 in total

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