| Literature DB >> 31991701 |
Ci Song1, Feng Shi1, Wanli Zhang1, Zhifan Lin1, Yuxuan Lin1.
Abstract
The silica opticsare widely applied in the modern laser system, and its fabrication is always the research focus. In the manufacturing process, the lapping process occurs between grinding and final polishing. However, lapping processes optimizations focus on decreasing the depth of sub-surface damage (SSD) or improving lapping efficiency individually. So, the optimum balance point between efficiency and damageshould be studied further. This manuscript establishes the effective removal rate of damage (ERRD)model, and the relationship between the ERRD and processing parameters is simulated. Then, high-efficiency, low-damage lapping processing routine is established based on the simulation. The correctness and feasibility are validated. In this work, the optimized method is confirmed that it can improve efficiency and decrease damage layer depth in the lapping process which promotes the development of optics in low-damage fabrication.Entities:
Keywords: effective removal rate of damage; lapping process; low-damage fabrication; sub-surface damage
Year: 2020 PMID: 31991701 PMCID: PMC7040670 DOI: 10.3390/ma13030569
Source DB: PubMed Journal: Materials (Basel) ISSN: 1996-1944 Impact factor: 3.623
Figure 1The schematic view of sub-surface damage (SSD) from grinding to polishing.
Figure 2Interaction among abrasive, lapping plate and workpiece.
Figure 3Micro-indentation mechanics.
Figure 4The relationship between effective removal rate of damage (ERRD) and abrasive.
Figure 5ERRD for various lapping pressure.
Figure 6ERRD for different lapping velocity.
Figure 7Results of ERRD with different abrasive.
Figure 8Result of ERRD under different lapping velocity.
Process parameters in the lapping process.
| Item | Conventional Lapping | Process A | Process B |
|---|---|---|---|
| Material removal amount | 250 μm | 250 μm | 250 μm |
| Abrasive | SiC | Diamond | SiC |
| Abrasive size | W20 | W20 | W7 |
| Pressure | 0.2 MPa | 0.2 MPa | 0.2 MPa |
| Velocity | 120 rpm | 180 rpm | 180 rpm |
Figure 9SSD results of sample 1.
Figure 10SSD results of sample 2.
Figure 11SSD results of sample 3.
Results under different lapping parameters.
| Item | Conventional Process | Process A | Process B |
|---|---|---|---|
| Lapping Time (h) | 9 | 2.5 | 5.3 |
| SSD depth (μm) | 18.76 | 40.14 | 6.83 |
Parameter of optimum lapping process.
| Item | Rough Lapping | Fine Lapping |
|---|---|---|
| Material removal amount | 200 μm | 50 μm |
| Abrasive | W20 Diamond | W7 SiC |
| Pressure | 0.2 MPa | 0.2 MPa |
| Velocity | 180 rpm | 180 rpm |
Figure 12SSD results of sample 4.