| Literature DB >> 31991590 |
Jing Tian1, Heng Yao1, Maxime Cavillon1, Enric Garcia-Caurel2, Razvigor Ossikovski2, Michel Stchakovsky3, Celine Eypert3, Bertrand Poumellec1, Matthieu Lancry1.
Abstract
This paper compares anisotropic linear optical properties (linear birefringence, linear dichroism, degree of polarization) and performances (absorption coefficient, thermal stability) of two types of birefringent waveplates fabricated in silica glass by femtosecond laser direct writing. The first type of waveplate is based on birefringence induced by self-organized nanogratings imprinted in the glass. One the other hand, the second design is based on birefringence originating from the stress-field formed around the aforementioned nanogratings. In addition to the provided comparison, the manufacturing of stress-engineered half waveplates in the UV-Visible range, and with mm-size clear aperture and negligible excess losses, is reported. Such results contrast with waveplates made of nanogratings, as the later exhibit significantly higher scattering losses and depolarization effects in the UV-Visible range.Entities:
Keywords: birefringent devices; femtosecond laser processing; silica glass; stress birefringence
Year: 2020 PMID: 31991590 PMCID: PMC7074171 DOI: 10.3390/mi11020131
Source DB: PubMed Journal: Micromachines (Basel) ISSN: 2072-666X Impact factor: 2.891
Figure 1(a) Typical optical microscope images of stress-engineering waveplates taken between in crossed polarizers. Blue arrow indicates the center of the clear aperture. (b) Optical retardance R (in nm) as a function of the distance d (in mm) between the two stress bars (stressor gap 5 µm, 100 stressors per bar, 10 layers). (c) Optical retardance R measured at 550 nm as a function of the number of stressors per bar. The clear aperture was fixed to 1 mm. Conditions: SuprasilCG glass, λ = 1030 nm; 250 fs; 100 kHz; 1 mm/s scanning speed; numerical aperture 0.16 NA; 2 µJ/pulse.
Figure 2Experimental values of effective linear anisotropic optical properties for 1 mm clear aperture stress waveplate: (a) Linear birefringences LB and LB’ (defined in text). (b) Slow axis orientation (in degree) of the linear birefringence as a function of the wavelength. Waveplate design: stressor gap Δy = 5 µm, 100 stressors per bar, 10 layers with Δz = 50 µm.
Figure 3(a) Spectral dependence of the anisotropic linear optical properties Total LB (continuous lines) and Total LD (dashed lines) extracted from Mueller matrix decomposition. Black lines are for the stress-engineered waveplate (a half waveplate at 450 nm) whereas red and blue lines are for nanogratings-based waveplates written in Xx and Xy configurations. (b) Spectral dependence of the linear Degree of Polarization.
Figure 4(a) Comparison of absorption coefficient k(λ) spectra for different waveplates together with pristine silica. Black line is for the stress-engineered waveplate (a half waveplate at 450 nm) whereas red and blue lines are for nanogratings-based waveplates written in Xx and Xy configurations. (b) Absorption coefficient k(λ) spectra of nanogratings-based waveplates for different pulse energies. Note that each waveplate was annealed for 2 hours at 600 °C prior to measurements.
Figure 5(a) Experimental values of the normalized evolution of optical retardance R (proportional to LB) at 550 nm with annealing temperature. Note we add the retardance values for each point as a label. Black dots are for the stress-engineered waveplate whereas red squares are for a nanogratings-based waveplate written in Xy configuration. (b) Normalized evolutions of Total LB and Total LD according to annealing temperature. Lines are guides to the eye.