| Literature DB >> 31857386 |
Tatsuyuki Makita1,2,3, Shohei Kumagai1,2, Akihito Kumamoto4, Masato Mitani1,2, Junto Tsurumi5, Ryohei Hakamatani1,2, Mari Sasaki1,2, Toshihiro Okamoto1,2,3,6, Yuichi Ikuhara4, Shun Watanabe7,2,3,6, Jun Takeya7,2,3,5.
Abstract
Thin film transistors (TFTs) are indispensable building blocks in any electronic device and play vital roles in switching, processing, and transmitting electronic information. TFT fabrication processes inherently require the sequential deposition of metal, semiconductor, and dielectric layers and so on, which makes it difficult to achieve reliable production of highly integrated devices. The integration issues are more apparent in organic TFTs (OTFTs), particularly for solution-processed organic semiconductors due to limits on which underlayers are compatible with the printing technologies. We demonstrate a ground-breaking methodology to integrate an active, semiconducting layer of OTFTs. In this method, a solution-processed, semiconducting membrane composed of few-molecular-layer-thick single-crystal organic semiconductors is exfoliated by water as a self-standing ultrathin membrane on the water surface and then transferred directly to any given underlayer. The ultrathin, semiconducting membrane preserves its original single crystallinity, resulting in excellent electronic properties with a high mobility up to 12 [Formula: see text] The ability to achieve transfer of wafer-scale single crystals with almost no deterioration of electrical properties means the present method is scalable. The demonstrations in this study show that the present transfer method can revolutionize printed electronics and constitute a key step forward in TFT fabrication processes.Entities:
Keywords: organic semiconductors; organic single crystal; thin film transistor
Year: 2019 PMID: 31857386 PMCID: PMC6955328 DOI: 10.1073/pnas.1909932116
Source DB: PubMed Journal: Proc Natl Acad Sci U S A ISSN: 0027-8424 Impact factor: 11.205
Fig. 1.Water exfoliation of a solution-processed OSC thin film. (A) Molecular structure of . (B) Cross-polarized microscopy image of single-crystal thin film fabricated via continuous edge-casting on a mica substrate. The white arrow denotes the direction of crystal growth. (C) Schematic illustration of the water exfoliation. (D) Photograph of a thin film floating on the water surface. (E) SAED pattern of a thin film transferred onto a TEM grid. The TEM measurements were performed with an accelerating voltage of 80 kV at room temperature.
Fig. 2.Mechanism of water exfoliation. (A–C) Contact angle profiles for surfaces of (A) -, (B) mica-, and (C) -treated glass substrates. (D) Schematic illustration of the water infiltration.
Fig. 3.Transfer technique for OSC thin film. (A) Schematic illustration of the transfer technique. A few droplets of water are applied near the edge of a template substrate, represented here by -treated glass, with a thin film placed on the destination substrate, after which the template substrate is carefully removed. (B) Photograph of a leaf on which a single-crystal thin film of was transferred. The area surrounded by the dashed square is covered with the thin film. (C) X-ray oscillation photograph of the transferred film measured on a 30-m–thick glass substrate.
Fig. 4.Device fabrication on . (A) Schematic illustration of the present bottom-gate top-contact device configuration. (B) Laser confocal microscopy image of the thin film transferred on the CYTOP surface. The transfer characteristics of the present device are shown in C for the saturation regime and in D for the linear regime. (E) Output characteristics of the present device. The channel length (L) and width (W) are 110 and 540 , respectively. A value of 21.4 was used as the capacitance of the gate dielectric per unit area, which was extracted from a capacitance–voltage measurement ().
Fig. 5.OTFT array on a food wrap. (A) Schematic illustration of the present device configuration. (B) Cross-polarized optical microscopy images of a device fabricated on food wrap. The transfer characteristics of the present device are shown in C for the saturation regime and in D for the linear regime. (E) Output characteristics of the present device. L and W are 95 and 335 , respectively. (F) Photograph of the fabricated OTFT array laminated on the surface of an apple.
Fig. 6.OTFT array made of a transferred inch-size thin film. (A) Photograph of an inch-size thin film deposited on a /Si wafer coated with parylene. (B) Schematic illustration of the present device configuration. (C) Transfer characteristics of the 100 fabricated OTFTs. The transfer characteristics of the present device are shown in D for the saturation regime and in E for the linear regime. (F) Output curves of the present device. L and W are 100 and 500 , respectively. (G–I) Histograms of (G) , (H) , and (I) reliability factor for the 100 fabricated OTFTs.