Literature DB >> 31769995

A Reconfigurable Remotely Epitaxial VO2 Electrical Heterostructure.

Yuwei Guo1, Xin Sun2, Jie Jiang1,3, Baiwei Wang1, Xinchun Chen4, Xuan Yin4, Wei Qi4, Lei Gao5, Lifu Zhang1, Zonghuan Lu2, Ru Jia1, Saloni Pendse1, Yang Hu1,2, Zhizhong Chen1, Esther Wertz2, Daniel Gall1, Jing Feng3, Toh-Ming Lu2, Jian Shi1,6.   

Abstract

The reconfigurability of the electrical heterostructure featured with external variables, such as temperature, voltage, and strain, enabled electronic/optical phase transition in functional layers has great potential for future photonics, computing, and adaptive circuits. VO2 has been regarded as an archetypal phase transition building block with superior metal-insulator transition characteristics. However, the reconfigurable VO2-based heterostructure and the associated devices are rare due to the fundamental challenge in integrating high-quality VO2 in technologically important substrates. In this report, for the first time, we show the remote epitaxy of VO2 and the demonstration of a vertical diode device in a graphene/epitaxial VO2/single-crystalline BN/graphite structure with VO2 as a reconfigurable phase-change material and hexagonal boron nitride (h-BN) as an insulating layer. By diffraction and electrical transport studies, we show that the remote epitaxial VO2 films exhibit higher structural and electrical quality than direct epitaxial ones. By high-resolution transmission electron microscopy and Cs-corrected scanning transmission electron microscopy, we show that a graphene buffered substrate leads to a less strained VO2 film than the bare substrate. In the reconfigurable diode, we find that the Fermi level change and spectral weight shift along with the metal-insulator transition of VO2 could modify the transport characteristics. The work suggests the feasibility of developing a single-crystalline VO2-based reconfigurable heterostructure with arbitrary substrates and sheds light on designing novel adaptive photonics and electrical devices and circuits.

Entities:  

Keywords:  Remote epitaxy; diode; heterostructure; metal−insulator transition

Year:  2019        PMID: 31769995     DOI: 10.1021/acs.nanolett.9b02696

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  3 in total

1.  Pinhole-seeded lateral epitaxy and exfoliation of GaSb films on graphene-terminated surfaces.

Authors:  Sebastian Manzo; Patrick J Strohbeen; Zheng Hui Lim; Vivek Saraswat; Dongxue Du; Shining Xu; Nikhil Pokharel; Luke J Mawst; Michael S Arnold; Jason K Kawasaki
Journal:  Nat Commun       Date:  2022-07-18       Impact factor: 17.694

2.  Wafer-scale freestanding vanadium dioxide film.

Authors:  He Ma; Xiao Xiao; Yu Wang; Yufei Sun; Bolun Wang; Xinyu Gao; Enze Wang; Kaili Jiang; Kai Liu; Xinping Zhang
Journal:  Sci Adv       Date:  2021-12-08       Impact factor: 14.136

3.  MOVPE Growth of GaN via Graphene Layers on GaN/Sapphire Templates.

Authors:  Kazimieras Badokas; Arūnas Kadys; Dominykas Augulis; Jūras Mickevičius; Ilja Ignatjev; Martynas Skapas; Benjaminas Šebeka; Giedrius Juška; Tadas Malinauskas
Journal:  Nanomaterials (Basel)       Date:  2022-02-25       Impact factor: 5.076

  3 in total

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