| Literature DB >> 31762261 |
Asif Hayat1, Naghma Shaishta2, Sunil Kumar Baburao Mane2,3, Javid Khan3, Ashiq Hayat4.
Abstract
Photocatalytic full water splitting remains the perfect way to generate oxygen (O2) and hydrogen (H2) gases driven by sunlight to address the future environmental issues as well as energy demands. Owing to its exceptional properties, polymeric carbon nitride (PCN) has been one of the most widely investigated semiconductor photocatalysts. Nevertheless, blank PCN characteristically displays restrained photocatalytic performance due to high-density defects in its framework that may perhaps perform the part of the recombination midpoint for photoproduced electron-hole pairs. Therefore, to overcome this problem, a simple approach to introduce 7,7,8,8-tetracyanoquinodimethane (TCNQ) with an electron-withdrawing characteristic modifier into the pristine PCN framework by the ionothermal method to enhance its optical, conductive, and photocatalytic properties has been undertaken. Results show that such integration of TCNQ results in the delocalization of the π-conjugated structure; significant changes in its chemical electronic configuration, band gap, and surface area; and enhanced production of electrons under visible light. As a result of this facile integration, our best sample (CNU-TCNQ9.0) produced a hydrogen evolution rate (HER) of 164.6 μmol h-1 for H2 and an oxygen evolution rate (OER) of 14.8 μmol h-1 for O2, which were found to be 2.4- and 2.6-fold greater than those produced with pure carbon nitride (CNU) sample, respectively. Hence, this work provides a reasonable alternative method to synthesize and design novel CNU-TCNQ backbone photocatalyst for organic photosynthesis, CO2 reduction, hydrogen evolution, etc.Entities:
Keywords: full water splitting; hydrogen evolution rate (HER); ionothermal copolymerization; oxygen evolution rate (OER); polymeric carbon nitride (PCN); tetracyanoquinodimethane (TCNQ)
Year: 2019 PMID: 31762261 DOI: 10.1021/acsami.9b15537
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229