| Literature DB >> 31730351 |
Rosa Córdoba1,2,3, Dominique Mailly4, Roman O Rezaev5,6, Ekaterina I Smirnova5, Oliver G Schmidt5,7, Vladimir M Fomin5,8, Uli Zeitler9, Isabel Guillamón10, Hermann Suderow10, José María De Teresa1,2,11.
Abstract
Novel schemes based on the design of complex three-dimensional (3D) nanoscale architectures are required for the development of the next generation of advanced electronic components. He+ focused-ion-beam (FIB) microscopy in combination with a precursor gas allows one to fabricate 3D nanostructures with an extreme resolution and a considerably higher aspect ratio than FIB-based methods, such as Ga+ FIB-induced deposition, or other additive manufacturing technologies. In this work, we report the fabrication of 3D tungsten carbide nanohelices with on-demand geometries via controlling key deposition parameters. Our results show the smallest and highest-densely packed nanohelix ever fabricated so far, with dimensions of 100 nm in diameter and aspect ratio up to 65. These nanohelices become superconducting at 7 K and show a large critical magnetic field and critical current density. In addition, given its helical 3D geometry, fingerprints of vortex and phase-slip patterns are experimentally identified and supported by numerical simulations based on the time-dependent Ginzburg-Landau equation. These results can be understood by the helical geometry that induces specific superconducting properties and paves the way for future electronic components, such as sensors, energy storage elements, and nanoantennas, based on 3D compact nanosuperconductors.Entities:
Keywords: Ginzburg−Landau equation; Helium ion microscope; focused-ion-beam-induced deposition; nanosuperconductors; phase slips; three-dimensional nanoprinting
Year: 2019 PMID: 31730351 PMCID: PMC7005939 DOI: 10.1021/acs.nanolett.9b03153
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189
Figure 1(Left) Sketch of the growth of 3D nanohelix by He+-FIBID. (Right) SEM image of a WC 3D nanohelix of type 1, in which pattern parameters are indicated, DNW = nanowire diameter, DNH = nanohelix diameter (100 nm in this specific case), LT = turn length or pitch, and LNH = nanohelix length (52° tilted stage). The specific deposition parameters for the helix shown are Ibeam ≈ 1 pA, beam spacing = 10 nm, nominal diameter = 75 nm, beam dwell time = 700 ms, and turns = 23.
Figure 2SEM images of WC nanohelices of several types (from 1–8) grown by He+-FIBID (52° tilted stage). ΔV represents the locations of the voltage contacts. Inset in the SEM image type 1 shows the top view of the nanohelix (measured bar = 100 nm).
Growth Parameters and Nominal and Real Dimensions of WC Nanohelices Shown in Figure a
| nanohelix no. | 2 | 3 | 5 | 8 | ||||
|---|---|---|---|---|---|---|---|---|
| ion current | 0.92 | 0.92 | 1.47 | 1.31 | ||||
| nominal nanohelix diameter (nm) | 75 | 75 | 75 | 200 | ||||
| repeats | 16 | 12 | 6 | 4 | ||||
| dwell time (ms) | 1000 | 1400 | 2400 | 2000 | ||||
| real nanohelix diameter, | 115 | 116 | 146 | 277 | ||||
| nanowire diameter, | 58 | 50 | 58 | 45 | ||||
| pitch, | 220 | 440 | 1000 | 2300 | ||||
| curvature (nm–1 × 10–3) | 12.7 | 7 | 2.4 | 0.9 | ||||
| torsion (nm–1 × 10–3) | 7.7 | 8.5 | 5.2 | 2.4 |
For a helix parametrized through the radius R and pitch (2πb), x(t) = R sin t, y(t) = R cos t, z(t) = bt, the curvature k1 and torsion k2 provide an equivalent representation:[43]. We have selected the “radius–pitch” representation since these parameters directly correlate with the crucial physical parameters of the same dimensionality: coherence length and penetration depth.
Figure 3(a) Normalized resistance for nanohelices of types indicated in the legend as a function of temperature at 0 T. RN is the resistance at the normal state, at T = 10 K. Inset shows resistance versus temperature for nanohelix of type 7. Ibias = 100 nA. (b) Upper critical magnetic field (μ0Hc2) as a function of temperature for nanohelices of types indicated in the legend. Data are fitted to a power low equation. Inset shows resistance as a function of temperature for nanohelix of type 7 under perpendicular magnetic field, from 0 to 9 T.
Superconducting Parameters of Nanohelices of Types 1, 4, 6, and 7 Estimated from Experimental Magnetotransport Measurements
| nanohelix no. | 1 | 4 | ||
|---|---|---|---|---|
| 1281 | 1936 | 1796 | 3672 | |
| no. of turns | 4 | 3 | 2 | 3 |
| 6.73 | 6.50 | 6.23 | 7.06 | |
| μ0 | 14.3 | 12.1 | 12.8 | 15.3 |
| 0.72 ± 0.01 | 0.72 ± 0.04 | |||
| ξ0 (nm) | 4.80 | 5.22 | 5.07 | 4.64 |
| λ (nm) | 603 | 629 | 733 | 695 |
| 0.23 | 0.17 | 0.09 | 0.11 | |
| 17.8 | 15.3 | 10.8 | 14.1 |
Figure 4(a) Critical magnetic fields as a function of temperature for nanohelix of type 7. μ0Hc2 is estimated from 0.9RN and μ0Hmin from 0.1RN. These values are extracted from R vs T curves (under perpendicular magnetic field, from 0 to 9 T, black symbols) and from R vs μ0H curves (under perpendicular magnetic field, from 0 to 20 T, gray symbols), Ibias= 0.1 μA. Data is fitted to a power law dependence. (b) Tilt-angle applied magnetic field dependence on μ0Hc2 for nanohelix of type 7. μ0Hc2 values are extracted from R vs μ0H curves, Ibias= 0.1 μA.
Figure 5Experimental Resistance-vs-Current characteristics (left panels) for the nanohelix of type 6, and simulated order parameter distributions plotted over the 2D surface of the helical structure (right panels) for the magnetic fields 1 T (upper–right panel) and 2 T (lower–right panel). The values of the applied transport current in units of the critical current are indicated in the panels. The critical currents are evaluated from the experimental data to be 3.3 μA for 1 T and 3.0 μA for 2 T. Different vortex and phase-slip patterns correspond to steps of resistance (the correspondence is shown by the arrows).