| Literature DB >> 31719549 |
Eva Jesenská1,2, Takayuki Ishibashi3, Lukáš Beran4, Martin Pavelka4, Jaroslav Hamrle4, Roman Antoš4, Jakub Zázvorka4, Martin Veis5.
Abstract
Unlike ferromagnetic materials, ferrimagnetic metals have recently received considerable attention due to their bulk perpendicular magnetic anisotropy, low net magnetization and tunable magnetic properties. This makes them perfect candidates for the research of recently discovered spin-torque related phenomena. Among other ferrimagnetic metals, GdFe has an advantage in relatively large magnetic moments in both sublattices and tunability of compensation point above the room temperature by small changes in its composition. We present a systematic study of optical and magneto-optical properties of amorphous GdxFe(100-x) thin films of various compositions (x = 18.3, 20.0, 24.7, 26.7) prepared by DC sputtering on thermally oxidized SiO2 substrates. A combination of spectroscopic ellipsometry and magneto-optical spectroscopy in the photon energy range from 1.5 to 5.5 eV with advanced theoretical models allowed us to deduce the spectral dependence of complete permittivity tensors across the compensation point. Such information is important for further optical detection of spin related phenomena driven by vicinity of compensation point in nanostructures containing GdFe.Entities:
Year: 2019 PMID: 31719549 PMCID: PMC6851085 DOI: 10.1038/s41598-019-52252-z
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1Measured variable angle SE Psi and Delta spectra of (a) Gd20Fe/Ru and (b) Gd20Fe/SiO2 samples compared to the theoretical model.
Figure 2Real parts of diagonal elements of the permittivity tensor of the GdxFe(100-x) thin films.
Figure 3Imaginary parts of diagonal elements of the permittivity tensor of the GdxFe(100-x) thin films. The inset displays the dependence of the imaginary parts on Gd concentration at E = 2.8 eV.
Fitted parameters of Lorentz oscillators and Drude term used to parameterize optical functions of GdxFe(100-x) optical functions in the spectral range from 1.5 to 6 eV.
| Lorentz 1 | Lorentz 2 | Drude term | |||||||
|---|---|---|---|---|---|---|---|---|---|
| E (eV) | A | Γ (eV) | E (eV) | A | Γ (eV) | ρ (Ωm) | τ (fs) | εinf | |
| Gd | 1.89 | 6.66 | 2.30 | 2.56 | 1.10 | 1.09 | 0.0160 | 0.105 | 2.26 |
| Gd | 1.88 | 6.23 | 2.43 | 2.54 | 1.28 | 1.43 | 0.0162 | 0.106 | 2.28 |
| Gd | 1.84 | 6.04 | 2.70 | 2.49 | 1.67 | 1.84 | 0.0167 | 0.105 | 2.29 |
| Gd | 1.84 | 5.82 | 2.83 | 2.41 | 1.67 | 1.99 | 0.0168 | 0.104 | 2.31 |
In here, E stands for central energies of oscillators; A represents amplitudes and Γ broadenings. For Drude model, ρ represents resistivity and τ mean scattering time.
Figure 4Hysteresis loops of examined samples with (a) Ru and (b) SiO2 cappings at 2.38 eV.
Figure 5Polar MOKE (a) rotation and (b) ellipticity spectra of examined samples.
Figure 6Real parts of the off-diagonal elements of the permittivity tensors of GdxFe(100-x).
Figure 7Imaginary parts of the off-diagonal elements of the permittivity tensors of GdxFe(100-x).
Structure compositions and nominal thicknesses of examined samples.
| Substrate | Layer 1 | Layer 2 | Layer 3 | Indication of samples in figures and text | |
|---|---|---|---|---|---|
| Sample 1 | Si | SiO2 (300 nm) | Gd | Ru (3 nm) | Gd |
| Sample 2 | Si | SiO2 (300 nm) | Gd | SiO2 (20 nm) | Gd |
| Sample 3 | Si | SiO2 (300 nm) | Gd | Ru (3 nm) | Gd |
| Sample 4 | Si | SiO2 (300 nm) | Gd | Ru (3 nm) | Gd |
| Sample 5 | Si | SiO2 (300 nm) | Gd | SiO2 (20 nm) | Gd |
| Sample 6 | Si | SiO2 (300 nm) | Gd | Ru (3 nm) | Gd |
Fitted thicknesses used for the model of GdxFe(100-x) in SE and X-ray in the spectral range from 1.5 to 6 eV.
| tSiO2 (nm) SE | tGgFe (nm) SE | tGgFe (nm) X-ray | tRu (nm) | tSiO2 (nm) | r (nm) SE | |
|---|---|---|---|---|---|---|
| Gd | 307 | 131.6 | 136.9 | 3.1 | — | 2 |
| Gd | 307 | 130 | 136.9 | — | 11.3 | 0.3 |
| Gd | 307 | 103 | 99.6 | 2.9 | — | 2 |
| Gd | 307 | 95 | 87.7 | 2.7 | — | 1.9 |
| Gd | 307 | 87.7 | 87.7 | — | 10.5 | 0.7 |
| Gd | 307 | 93.4 | 93.4 | 2.2 | — | 1.9 |
In here, t stands for thickness and r for roughness of the film interface with the ambient air.