| Literature DB >> 31677288 |
Jeffry M Bulson1, Dionysios Liveris2, Irina Derkatch1, Gary Friedman1,3, Jan Geliebter1, Sin Park1, Sarnath Singh2, Marc Zemel1, Raj K Tiwari2.
Abstract
BACKGROUND: Onychomycosis affects almost 6% of the world population. Topical azoles and systemic antifungal agents are of low efficacy and can have undesirable side effects. An effective, non-invasive therapy for onychomycosis is an unmet clinical need.Entities:
Keywords: zzm321990Candida albicanszzm321990; zzm321990Trichophyton mentagrophyteszzm321990; cold atmospheric plasma; dielectric barrier discharge; fungus; non-thermal atmospheric plasma; onychomycosis; pulsed electric field
Mesh:
Substances:
Year: 2019 PMID: 31677288 PMCID: PMC7003814 DOI: 10.1111/myc.13030
Source DB: PubMed Journal: Mycoses ISSN: 0933-7407 Impact factor: 4.377
Figure 1Plasma treatment experimental setup (A) before application of the plasma patch electrode and (B) with conformal application of the electrode to the cadaver nail plate on the agar nail mould. Plasma patch electrode (C) removed from the system and (D) installed in a treatment apparatus showing plasma discharge on patient hallux under the electrode
Figure 5Dose‐response curve for plasma treatment of nail plate inoculated with Candida albicans plotted as (A) kill ratio and (B) log reduction vs dose for fixed intensity (AMP = 18.5 kV) and treatment sequence (SEQ = 3×4′(1′)). Individual independent measurements, R, are plotted as small closed red circles (), and average values, , are shown as closed black squares (■) with 95% confidence interval error bars (CI = (t .95/√n)∙SD, where n = 3 or 4). The solid curve is the least‐squares best‐fit (r 2 = .922) variable‐slope sigmoidal dose‐response with D 50 = 63.6 kPulses and h = 1.50. Dashed curve is best fit to sigmoidal dose‐response transformed to log reduction
Figure 2Images of Candida albicans and Trichophyton mentagrophytes cultures treated with plasma directly on agar without nails. Treatment conditions for both organisms were AMP = 18.5 kV, SEQ = 1 × 1′(0′) and PRF as indicated. PRF = 0 Hz is untreated control
Figure 3Temperature measurements. (A) Peak temperature measured under the nail plate in vitro during plasma treatment vs dose rate, and (A‐inset) measured temperature vs time at PRF = 500 Hz. All data collected at AMP = 18 kV and SEQ = 3 × 8′(2′). Temperature with increasing dose plotted as red circles () and six additional nail plate samples tested at PRF = 500 Hz plotted as brown triangles (). (B) Average log reduction of viability vs temperature for Candida albicans exposed to an elevated temperature bath for 1, 5, and 10 min
Figure 4Cultured Candida albicans inoculated nail mould agar appearance after plasma treatment through the nail. Treatment conditions were AMP = 18.5 kV, SEQ = 3 × 4′(1′), and PRF as indicated. PRF = 0 Hz is untreated control. Colonies that grew under and along‐side the agar mould may have originated from cells that leaked out from under the nail before treatment and were not exposed to NTAP