| Literature DB >> 31592418 |
Aiping Chen1, Yaomin Dai1, Ahmad Eshghinejad2, Zhen Liu3, Zhongchang Wang4, John Bowlan1, Erik Knall1, Leonardo Civale5, Judith L MacManus-Driscoll6, Antoinette J Taylor1, Rohit P Prasankumar1, Turab Lookman3, Jiangyu Li2, Dmitry Yarotski1, Quanxi Jia7.
Abstract
Room-temperature magnetoelectric (ME) coupling is developed in artificial multilayers and nanocomposites composed of magnetostrictive and electrostrictive materials. While the coupling mechanisms and strengths in multilayers are widely studied, they are largely unexplored in vertically aligned nanocomposites (VANs), even though theory has predicted that VANs exhibit much larger ME coupling coefficients than multilayer structures. Here, strong transverse and longitudinal ME coupling in epitaxial BaTiO3:CoFe2O4 VANs measured by both optical second harmonic generation and piezoresponse force microscopy under magnetic fields is reported. Phase field simulations have shown that the ME coupling strength strongly depends on the vertical interfacial area which is ultimately controlled by pillar size. The ME coupling in VANs is determined by the competition between the vertical interface coupling effect and the bulk volume conservation effect. The revealed mechanisms shed light on the physical insights of vertical interface coupling in VANs in general, which can be applied to a variety of nanocomposites with different functionalities beyond the studied ME coupling effect.Entities:
Keywords: epitaxial; interfaces; magnetoelectric couplings; nanocomposites; strain
Year: 2019 PMID: 31592418 PMCID: PMC6774036 DOI: 10.1002/advs.201901000
Source DB: PubMed Journal: Adv Sci (Weinh) ISSN: 2198-3844 Impact factor: 16.806
Figure 1Structural and microstructure of BTO:CFO VANs. a) RSM of BTO:CFO nanocomposite films on STO substrates around the STO (103) region. b) In‐plane and out‐of‐plane magnetization at 300 K. c) Angle‐dependent magnetization for longitudinal (L) and transverse (T) magnetic components under an external magnetic field of 20 kOe. d) AFM image of BTO:CFO nanocomposites. e) Plan‐view STEM image showing CFO nanopillars in BTO matrix. The dark region represents the CFO phase. The gray area shows the BTO matrix. f) Atomic‐resolution HAADF–STEM image showing the interface between BTO and CFO.
Figure 2a) Temperature dependence of the SHG intensity for P‐out polarization. b,c) The SHG intensity (295 K) at different azimuth angles while rotating the sample along the z‐axis for P‐out and S‐out polarizations, respectively. d,e) Comparison of the SHG signals (295 K) at 4 kOe (red curve) and zero field (blue curve) for P‐out and S‐out polarizations, respectively. The magnetic field is applied along the z‐axis. f,g) Histogram of the SHG intensity (295 K) at 4 kOe (red) and zero field (blue) for P‐out and S‐out polarizations, respectively.
Figure 3a) Corrected PFM amplitude mapping of the BTO:CFO nanocomposite film at a 2 kOe magnetic field. The scale bar in panel (a) is 100 nm. b) Amplitude–voltage butterfly loop of BTO:CFO nanocomposite films before and after the application of an external magnetic field of 2 kOe by using a variable field module. c) Amplitude histogram under different magnetic fields. d) The corrected PFM amplitude under different magnetic fields (0 and ±8 kOe).
Figure 4a) An illustration of the longitudinal ME coupling mode with the magnetic field (H) parallel to the CFO nanopillars. b) The calculated distribution of the out‐of‐plane strain change, Δε 33, in the x–y plane of BTO with an external magnetic field H. The dashed black circle represents a CFO pillar. ppm represents 10−6. An H of 0.5 kOe is used in simulation. c) An illustration of the transverse ME coupling mode with the magnetic field parallel to film surface (H). d) The calculated Δε 33 distribution in the x–y plane of BTO with an external magnetic field H. An H of 4.4 kOe is used in simulation. The pillar size used in panels (b) and (d) is 21 nm. e) CFO nanopillar size–dependent macroscopic displacement of the BTO matrix in the presence of external magnetic fields H and H.