Literature DB >> 31578000

Focused-helium-ion-beam blow forming of nanostructures: radiation damage and nanofabrication.

Chung-Soo Kim1, Richard G Hobbs, Akshay Agarwal, Yang Yang, Vitor R Manfrinato, Michael P Short, Ju Li, Karl K Berggren.   

Abstract

Targeted irradiation of nanostructures by a finely focused ion beam provides routes to improved control of material modification and understanding of the physics of interactions between ion beams and nanomaterials. Here, we studied radiation damage in crystalline diamond and silicon nanostructures using a focused helium ion beam, with the former exhibiting extremely long-range ion propagation and large plastic deformation in a process visibly analogous to blow forming. We report the dependence of damage morphology on material, geometry, and irradiation conditions (ion dose, ion energy, ion species, and location). We anticipate that our method and findings will not only improve the understanding of radiation damage in isolated nanostructures, but will also support the design of new engineering materials and devices for current and future applications in nanotechnology.

Entities:  

Year:  2019        PMID: 31578000     DOI: 10.1088/1361-6528/ab4a65

Source DB:  PubMed          Journal:  Nanotechnology        ISSN: 0957-4484            Impact factor:   3.874


  2 in total

1.  An Experiment-Based Profile Function for the Calculation of Damage Distribution in Bulk Silicon Induced by a Helium Focused Ion Beam Process.

Authors:  Qianhuang Chen; Tianyang Shao; Yan Xing
Journal:  Sensors (Basel)       Date:  2020-04-17       Impact factor: 3.576

2.  Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching.

Authors:  Xiaolei Wen; Lansheng Zhang; Feng Tian; Yang Xu; Huan Hu
Journal:  Nanomaterials (Basel)       Date:  2022-09-20       Impact factor: 5.719

  2 in total

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