| Literature DB >> 31540315 |
Feng Huang1, Jingzhou Li2,3, Zhuhua Xu4, Yuan Liu5, Ripeng Luo6,7, Si-Wei Zhang8,9, Pengbo Nie10,11, Yanfei Lv12, Shixi Zhao13, Weitao Su14, Wen-Di Li15, Shichao Zhao16, Guodan Wei17,18, Hao-Chung Kuo19,20, Feiyu Kang21,22.
Abstract
Two-dimensional (2D) tungsten disulfide (WS2) has inspired great efforts in optoelectronics, such as in solar cells, light-emitting diodes, and photodetectors. However, chemical vapor deposition (CVD) grown 2D WS2 domains with the coexistence of a discontinuous single layer and multilayers are still not suitable for the fabrication of photodetectors on a large scale. An emerging field in the integration of organic materials with 2D materials offers the advantages of molecular diversity and flexibility to provide an exciting aspect on high-performance device applications. Herein, we fabricated a photodetector based on a 2D-WS2/organic semiconductor materials (mixture of the (Poly-(N, N'-bis-4-butylphenyl-N, N'-bisphenyl) benzidine and Phenyl-C61-butyric acid methyl ester (Poly-TPD/PCBM)) heterojunction. The application of Poly-TPD/PCBM organic blend film enhanced light absorption, electrically connected the isolated WS2 domains, and promoted the separation of electron-hole pairs. The generated exciton could sufficiently diffuse to the interface of the WS2 and the organic blend layers for efficient charge separation, where Poly-TPD was favorable for hole carrier transport and PCBM for electron transport to their respective electrodes. We show that the photodetector exhibited high responsivity, detectivity, and an on/off ratio of 0.1 A/W, 1.1 × 1011 Jones, and 100, respectively. In addition, the photodetector showed a broad spectral response from 500 nm to 750 nm, with a peak external quantum efficiency (EQE) of 8%. Our work offers a facile solution-coating process combined with a CVD technique to prepare an inorganic/organic heterojunction photodetector with high performance on silicon substrate.Entities:
Keywords: 2D-WS2; organic semiconductor; photodetector; responsivity
Year: 2019 PMID: 31540315 PMCID: PMC6781271 DOI: 10.3390/nano9091312
Source DB: PubMed Journal: Nanomaterials (Basel) ISSN: 2079-4991 Impact factor: 5.076
Figure 1Illustration (color online) of the fabrication procedure of the photodetector based on the organic semiconductor/inorganic tungsten disulfide (WS2) heterojunction. (a) The silicon substrate with ZnO and SiO2 film (ZnO/SiO2/Si). (b) Two-dimensional (2D) WS2 growth on the surface of SiO2/Si through a chemical vapor deposition (CVD) method. During the growth of the WS2, ZnO was removed from the SiO2/Si. (c) (Poly-(N,N′-bis-4-butylphenyl-N,N′-bisphenyl) benzidine and Phenyl-C61-butyric acid methyl ester (Poly-TPD/PCBM) (1:1) organic film preparation by spin-coating on the surface of the 2D WS2. (d) Metal electrode evaporation on the surface of the Poly-TPD/PCBM film.
Figure 2(a) The X-ray diffraction (XRD) spectra of the ZnO/SiO2/Si substrate (black line) and WS2 film (red line). (b) X-ray photoelectron spectroscopy (XPS) spectrum of the WS2 film. UV-Vis absorption spectrum of the (c) WS2 film and (d) Poly-TPD/PCBM (1:1).
Figure 3(a,b) Typical field emission scanning electron microscopy (FESEM) images of the WS2 film. Images (a,b) were taken at different locations. (c) Atomic force microscope (AFM) image of 1:1 Poly-TPD and PCBM mixture.
Figure 4The Raman (a) and photoluminescence (PL) spectra (b) of the WS2 monolayer (red line) and multilayers (blue line). Inset in (a) is a detailed illustration of the B and A modes. The insert in (b) is an SEM image, and the scale bar represents 5 μm. (c) Photoluminescence (PL) and (d) optical microscopy images of WS2 mono-/multimixed layers taken at the same location.
Figure 5Performance of the WS2/Poly-TPD/PCBM-based photodetector. (a) Source-drain current (I) versus drain voltage (V). (b) I versus gate voltage (V) curves of the photodetector in dark (black line) and under laser (red line). (c,d) Responsivity and detectivity curves and the external quantum efficiency (EQE) of the device as a function of V ranging from −30 V to 20 V. Measurements were performed at room temperature with a laser at 450 nm. The light intensity was 0.14 mW/cm2. The V was 0 V in (a), and the V was 15 V in (b–d).
Photoresponse parameters of different materials and devices.
| Device Structure | Incident Light | Response Time | Ref. | ||
|---|---|---|---|---|---|
| 2D WS2/Poly-TPD/PCBM/Au | 450 nm | 1.02 | 1.4 × 1011 | <181 ms | This work |
| Monolayer WS2/Au | 532 nm | 0.59 | 6.5 × 1010 | 280 ms | [ |
| Multilayer WS2/Au | 635 nm | 0.7 | 2.7 × 1010 | 4.1 s | [ |
| MoTe2/Au | 532 nm | 0.0004 | 1.08 × 108 | 42.5 μs | [ |
| GeSe2/Au | 450 nm | 2.5 | N/A | 0.2 s | [ |
| GeP/Au | 532 nm | 3.1 | N/A | >1s | [ |
Figure 6(a) The photocurrent versus applied V sweeping from −10 V to 10 V (V = 0 V) at different light intensities. The inset shows the detailed I–V characteristics in the 0 V region. (b) The dependence of the photocurrent (I) (in (a)) on the laser intensity (mW/cm2) (V = 0 V, V = 10 V). (c) Power intensity dependence of the responsivity (V = 0 V, V = 10 V). (d) Spectral dependence of the EQE using a 100-ps pulse laser (V = 0 V, V = 10 V). (e) Photoresponse in the dark and under 450-nm laser irradiation with a light intensity of 0.14 mW/cm2 (V = 0 V, V = 10 V). (f) Rise and decay time of the photodetector (V = 0 V, V = 10 V).