Improved ultrasonic degradation of hydrophilic and hydrophobic aldehydes in water by combined use of atomization and UV irradiation onto the mist surface.

Ultrasonic irradiation of 430 kHz, which induces both the chemical effect of pyrolysis and the physical effect of atomization, was carried out to achieve highly effective decomposition of organic substances in water with UV254 irradiation and H2O2 addition. To investigate the influence of physicochemical properties of the substrate on the degradation rate, three different aldehydes, namely, formaldehyde, acetaldehyde, and benzaldehyde, were selected as model substrates. Upon ultrasonic irradiation alone, the removal ratio of the hydrophobic substrate benzaldehyde reached 100% after 120 min, whereas the removal ratios of the hydrophilic substrates formaldehyde and acetaldehyde were only 21.1% and 53.0%, respectively. By combining ultrasonic atomization and UV254 irradiation, formaldehyde and acetaldehyde underwent effective gas-phase decomposition on the surfaces of the mist particles. Photolysis by UV254 irradiation mainly affected for the decomposition of aldehydes on the mist surface rather than the reaction of hydroxyl radicals derived from H2O2 made by water sonolysis. However, the addition of H2O2 effectively improved the decomposition and mineralization rates for both hydrophilic and hydrophobic aldehydes owing to the generation of hydroxyl radicals on the surfaces of the mist particles, which greatly contributed to the gas-phase decomposition. Consequently, the effective decomposition of organic pollutants was achieved regardless of their physicochemical properties in aqueous media.