| Literature DB >> 31458885 |
Samuel J Rowley-Neale1,1, Marina Ratova1, Lucas T N Fugita2, Graham C Smith3, Amer Gaffar1,1, Justyna Kulczyk-Malecka1,1, Peter J Kelly1,1, Craig E Banks1,1.
Abstract
The design and fabrication of inexpensive highly efficient electrocatalysts for the production of hydrogen via the hydrogen evolution reaction (HER) underpin a plethora of emerging clean energy technologies. Herein, we report the fabrication of highly efficient electrocatalysts for the HER based on magnetron-sputtered MoS2 onto a nanocarbon support, termed MoS2/C. Magnetron sputtering time is explored as a function of its physiochemical composition and HER performance; increased sputtering times give rise to materials with differing compositions, i.e., Mo4+ to Mo6+ and associated S anions (sulfide, elemental, and sulfate), and improved HER outputs. An optimized sputtering time of 45 min was used to fabricate the MoS2/C material. This gave rise to an optimal HER performance with regard to its HER onset potential, achievable current, and Tafel value, which were -0.44 (vs saturated calomel electrode (SCE)), -1.45 mV s-1, and 43 mV dec-1, respectively, which has the highest composition of Mo4+ and sulfide (MoS2). Electrochemical testing toward the HER via drop casting MoS2/C upon screen-printed electrodes (SPEs) to electrically wire the nanomaterial is found to be mass coverage dependent, where the current density increases up to a critical mass (ca. 50 μg cm-2), after which a plateau is observed. To allow for a translation of the bespoke fabricated MoS2/C from laboratory to new industrial applications, MoS2/C was incorporated into the bulk ink utilized in the fabrication of SPEs (denoted as MoS2/C-SPE), thus allowing for improved electrical wiring to the MoS2/C and resulting in the production of scalable and reproducible electrocatalytic platforms. The MoS2/C-SPEs displayed far greater HER catalysis with a 450 mV reduction in the HER onset potential and a 1.70 mA cm-2 increase in the achievable current density (recorded at -0.75 V (vs SCE)), compared to a bare/unmodified graphitic SPE. The approach of using magnetron sputtering to modify carbon with MoS2 facilitates the production of mass-producible, stable, and effective electrode materials for possible use in electrolyzers, which are cost competitive to Pt and mitigate the need to use time-consuming and low-yield exfoliation techniques typically used to fabricate pristine MoS2.Entities:
Year: 2018 PMID: 31458885 PMCID: PMC6644582 DOI: 10.1021/acsomega.8b00258
Source DB: PubMed Journal: ACS Omega ISSN: 2470-1343
Figure 1(A) Linear sweep voltammograms (LSVs) showing the HER activity of a bare/unmodified SPE, polycrystalline platinum electrode, and SPEs that have been modified (via drop casting) with 14 μg cm–2 of the carbon nanopowder (no MoS2) and MoS2/C, which has been magnetron-sputtered for 7.5, 15, 30, 45, 60, and 120 min. For comparative purposes, a bare/unmodified SPE and a polycrystalline Pt electrode were also tested. Solution composition: 0.5 M H2SO4; scan rate: 25 mV s–1 (vs SCE). (B) Coverage study of 0, 7.1, 14.1, 21.2, 28.3, 35.4, 49.5, 56.8, 63.6, and 70.7 μg cm–2 of the optimized 45 min MoS2/C variant electrically wired via drop casting onto SPEs. (C, D) Transmission electron microscopy (TEM) of the nanocarbon after magnetron sputter deposition of MoS2 for 45 min. Example of an energy-dispersive X-ray (EDX) sample spot is shown in (D).
Summary of the HER Performance of the Fabricated MoS2/C Materials and Comparison to the Academic Literature/Controlsa
| MoS2 material on an SPE (14 μg cm–2) | Tafel slope (mV dec–1) | current density (mA cm–2) at –0.75 V | HER onset (V vs SCE) |
|---|---|---|---|
| 2 h MoS2/C | 47 | –1.19 | –0.50 |
| 1 h MoS2/C | 50 | –1.30 | –0.46 |
| 45 min MoS2/C | 43 | –1.45 | –0.44 |
| 30 min MoS2/C | 50 | –0.53 | –0.49 |
| 15 min MoS2/C | 104 | –0.16 | –0.61 |
| 7.5 min MoS2/C | 121 | –0.11 | –0.80 |
| 2.5% MoS2/C-SPE | 59 | –0.93 | –0.49 |
| 5.0% MoS2/C-SPE | 53 | –1.16 | –0.48 |
| 7.5% MoS2/C-SPE | 44 | –1.58 | –0.45 |
| 10% MoS2/C-SPE | 43 | –1.81 | –0.45 |
| controls: pristine 2D-MoS2▲ | 92 | –1.284 | –0.46 |
| carbon nanopowder▲ | 125 | –0.13 | –0.82 |
| bare/unmodified SPE | 133 | –0.12 | –0.84 |
| polycrystalline Pt | 18 | * | –0.28 |
Key: *; current density too large to be recorded on potentiostat used; SPE: screen-printed electrode; ▲; 14 μg cm–2 mass coverage deposited via drop casting; Pt: platinum.
Elemental Composition of the MoS2/C Variants Deduced via XPS Analysis as a Function of Magnetron Sputtering Time
| time
(min) | ||||||
|---|---|---|---|---|---|---|
| element | 7.5 | 15 | 30 | 45 | 60 | 120 |
| C 1s | 91.01 | 85.07 | 86.84 | 83.32 | 91.38 | 91.39 |
| O 1s | 5.47 | 7.43 | 7.19 | 6.74 | 4.79 | 5.34 |
| Mo4+ | 0.43 | 1.32 | 1.04 | 2.06 | 0.55 | 0.5 |
| Mo6+ | 0.85 | 1.21 | 1.03 | 0.9 | 0.51 | 0.41 |
| S (sulfide) | 0.72 | 2.25 | 1.66 | 4.17 | 0.97 | 1.08 |
| S (elemental) | 0.81 | 1.88 | 1.29 | 1.79 | 0.68 | 0.59 |
| S (sulfate) | 0.71 | 0.84 | 0.96 | 1.02 | 1.12 | 0.69 |
Figure 2(A) Linear sweep voltammograms (LSVs) showing the HER activity of a bare/unmodified SPE, polycrystalline platinum electrode, and the 2.5, 5.0, 7.5, and 10.0% MoS2/C-SPEs produced using the optimized 45 min MoS2/C. Solution composition: 0.5 M H2SO4; scan rate: 25 mV s–1. (B) Tafel slopes corresponding to the Faradaic regions of the LSVs shown in (A). Solution composition: 0.5 M H2SO4, scan rate: 25 mV s–1 (vs SCE). (B) Cyclic stability examination of a 10% MoS2/C-SPE via LSV (scan rate: 100 mV s–1 (vs SCE)) was performed between the potential range of 0 and −1.4 V, repeated for 1000 cycles; this figure shows the first scan (black line), 10th (red line) scan, 100th (blue) scan, and 1000th scan (green line). Note that the inset displays the current output achieved when the potential was held at −0.75 V (vs SCE).
Summary of Magnetron Sputtering Deposition Conditions for the Fabrication of the MoS2/C Samples
| deposition parameters | |
| target material | MoS2 |
| substrate material | carbon nanopowder (5 g) |
| Ar flow | 15 sccm |
| process pressure | 2 × 10–1 Pa |
| deposition time | 7.5, 15, 30, 45, 60, 120 min |
| time-average power | 500 W |
| target current | 0.89 A |
| target voltage | –560 V |