| Literature DB >> 31405278 |
Bernhard Reineke1, Basudeb Sain1, Ruizhe Zhao2, Luca Carletti3, Bingyi Liu4, Lingling Huang2, Costantino De Angelis5, Thomas Zentgraf1.
Abstract
Nonlinear wavefront control is a crucial requirement in realizing nonlinear optical applications with metasurfaces. Numerous aspects of nonlinear frequency conversion and wavefront control have been demonstrated for plasmonic metasurfaces. However, several disadvantages limit their applicability in nonlinear nanophotonics, including high dissipative loss and low optical damage threshold. In contrast, it has been shown that metasurfaces made of high-index dielectrics can provide strong nonlinear responses. Regardless of the recent progress in nonlinear optical processes using all-dielectric nanostructures and metasurfaces, much less advancement has been made in realizing a full wavefront control directly with the generation process. Here, we demonstrate the nonlinear wavefront control for the third-harmonic generation with a silicon metasurface. We use a Pancharatnam-Berry phase approach to encode phase gradients and holographic images on nanostructured silicon metasurfaces. We experimentally demonstrate the polarization-dependent wavefront control and the reconstruction of an encoded hologram at the third-harmonic wavelength with high fidelity. Further, we show that holographic multiplexing is possible by utilizing the polarization states of the third harmonic generation. Our approach eases design and fabrication processes and paves the way to an easy to use toolbox for nonlinear optical wavefront control with all-dielectric metasurfaces.Entities:
Keywords: Silicon; dielectric; holography; metasurface; nonlinear; phase manipulation
Year: 2019 PMID: 31405278 PMCID: PMC6746059 DOI: 10.1021/acs.nanolett.9b02844
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189
Figure 1(a) Schematic illustration of the generation of third harmonic light with antenna’s rotation. Upon rotation the generated nonlinear signal gains phases of θco = 2σϕ and θcross = 4σϕ in co- and cross-polarization states, respectively. (b) Schematic of the working principle of a geometric-phase silicon metasurface. A fundamental beam of right circularly polarized (RCP) light is incident onto the metasurface. The nanostructures within the metasurface can generate a third harmonic light. Further, they are arranged onto the surface to encode a phase gradient of 0–2π (0–4π) at the RCP (LCP) generated third harmonic light. (c) Scanning electron microscopy image of a part of the fabricated Si metasurface.
Figure 2(a) Schematic illustration of the optical measurement setup. The first combination of a linear polarizer and a quarter-wave plate (QWP) prepares the circularly polarized input light at the fundamental wavelength. The second combination analyses the output THG light. The lens in front of the sample focuses the light onto the sample, while the lenses behind the objective lens image the back focal plane of the objective onto the CMOS camera. The THG light is collected by a 40×/NA 0.6 microscope objective. (b) Third harmonic diffraction spots generated by the phase-gradient metasurface. The THG signals are measured with different combinations of circularly polarized input and output light. The inset shows the top view of the corresponding metasurface. The scale bar represents 1 μm. (c) Third harmonic diffractions spots for metasurface without phase-gradient for different combinations of circularly polarized input and output light. The inset shows the top view of the metasurface. Note that the color scheme was modified to increase the visibility of the weaker THG diffraction spot in the image.
Figure 3Measured THG intensity vs wavelength for the different combinations of the input and output polarizations. (a) Results for the gradient-phase metasurface showing a nearly constant THG signal. (b) Results for the metasurface without phase gradient. Here, only the zeroth-order is analyzed because every nanofin has the same rotation and therefore has the same phase. (c) THG intensities of a 650 nm thick amorphous silicon film and an ITO-coated glass substrate without silicon. The silicon film shows only a weak THG in the copolarization states and a negligible signal in the cross-polarization. In comparison, the ITO-coated glass substrate shows a negligible THG signal in both polarization states.
Figure 4(a) Measured holographic image of the letter “X” for different combinations of the input and output polarizations. The image only appears in the copolarization state of the THG signal while no image is observed in the cross-polarization state. (b) The simulated holographic image of the letter “X”. The image is designed to appear within an angle of 20° in the Fourier space. (c) Measured multiplexed holographic image for different combinations of the input and output polarizations. (d) The corresponding simulated holographic image of the “sun” and the “cloud” for both polarization states.