| Literature DB >> 31402643 |
Vitalii Mikheev1, Anastasia Chouprik1, Yury Lebedinskii1, Sergei Zarubin1, Yury Matveyev2, Ekaterina Kondratyuk1, Maxim G Kozodaev1, Andrey M Markeev1, Andrei Zenkevich1, Dmitrii Negrov1.
Abstract
While the conductance of a first-order memristor is defined entirely by the external stimuli, in the second-order memristor it is governed by the both the external stimuli and its instant internal state. As a result, the dynamics of such devices allows to naturally emulate the temporal behavior of biological synapses, which encodes the spike timing information in synaptic weights. Here, we demonstrate a new type of second-order memristor functionality in the ferroelectric HfO2-based tunnel junction on silicon. The continuous change of conductance in the p+-Si/Hf0.5Zr0.5O2/TiN tunnel junction is achieved via the gradual switching of polarization in ferroelectric domains of polycrystalline Hf0.5Zr0.5O2 layer, whereas the combined dynamics of the built-in electric field and charge trapping/detrapping at the defect states at the bottom Si interface defines the temporal behavior of the memristor device, similar to synapses in biological systems. The implemented ferroelectric second-order memristor exhibits various synaptic functionalities, such as paired-pulse potentiation/depression and spike-rate-dependent plasticity, and can serve as a building block for the development of neuromorphic computing architectures.Entities:
Keywords: ferroelectric hafnium oxide; ferroelectric memristor; ferroelectric tunnel junction; resistive switching; second-order memristor; synaptic plasticity
Year: 2019 PMID: 31402643 DOI: 10.1021/acsami.9b08189
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229