| Literature DB >> 31360768 |
F Bencivenga1, R Mincigrucci1, F Capotondi1, L Foglia1, D Naumenko1, A A Maznev2, E Pedersoli1, A Simoncig1, F Caporaletti3, V Chiloyan2, R Cucini4, F Dallari3, R A Duncan2, T D Frazer5, G Gaio1, A Gessini1, L Giannessi1, S Huberman2, H Kapteyn5, J Knobloch5, G Kurdi1, N Mahne1,4, M Manfredda1, A Martinelli3, M Murnane5, E Principi1, L Raimondi1, S Spampinati1, C Spezzani1, M Trovò1, M Zangrando1,4, G Chen2, G Monaco3, K A Nelson2, C Masciovecchio1.
Abstract
Advances in developing ultrafast coherent sources operating at extreme ultraviolet (EUV) and x-ray wavelengths allow the extension of nonlinear optical techniques to shorter wavelengths. Here, we describe EUV transient grating spectroscopy, in which two crossed femtosecond EUV pulses produce spatially periodic nanoscale excitations in the sample and their dynamics is probed via diffraction of a third time-delayed EUV pulse. The use of radiation with wavelengths down to 13.3 nm allowed us to produce transient gratings with periods as short as 28 nm and observe thermal and coherent phonon dynamics in crystalline silicon and amorphous silicon nitride. This approach allows measurements of thermal transport on the ~10-nm scale, where the two samples show different heat transport regimes, and can be applied to study other phenomena showing nontrivial behaviors at the nanoscale, such as structural relaxations in complex liquids and ultrafast magnetic dynamics.Entities:
Year: 2019 PMID: 31360768 PMCID: PMC6660206 DOI: 10.1126/sciadv.aaw5805
Source DB: PubMed Journal: Sci Adv ISSN: 2375-2548 Impact factor: 14.136
Fig. 1Experimental setup.
The setup used in the present experiment is schematically shown in (A). The red beams are the excitation pulses (λex), while the green one is the probe (λpr). The green dashed line downstream is the signal beam. PM1 is a plane mirror used to route half of the beam into the probe’s branch line. The latter consists of two additional plane mirrors (PM3 and PM4) and a DL, made out by four multilayer mirrors (not shown) with high reflectivity at λpr; the DL thus also acts as a bandpass filter at λpr. The radiation at λpr in the branch lines of the excitation pulses is removed by SSFs (SSFA and SSFB). The three beams are finally focused at the sample at the desired angles by three focusing mirrors (FM). (B and C) Sketch of the wavefront division beam-splitting approach. (D) Image of the signal beam on the detector.
Fig. 2EUV TG signal.
Black lines in (A), (B), and (C) are the EUV TG signals from Si3N4 membranes at LTG = 110, 85, and 28 nm, respectively, while the red line through the data is an exponential decay that accounts for the overall signal decay. (D) Comparison of the EUV TG signal at LTG = 85 nm, sampled with finer steps around the time zero region (black circles connected by lines), with the optically probed EUV TG signal (blue circles connected by lines; in this case, LTG = 280 nm and the sample is a 500-nm-thick Si3N4 membrane); the latter data are scaled to fit in the same scale, the vertical red dashed line indicates Δt = 0, while the red circle encloses the small bump observed at time zero in the EUV TG data.
Fig. 3Dispersion of EUV TG signal parameters.
Full dots are the dispersion relations of the frequency (A) and decay rate (B) as a function of the EUV TG wave vector (2π/LTG), as extracted from the data shown in Fig. 2. Red lines indicate the linear and quadratic trends of these two quantities.
Fig. 4EUV TG signal from Si.
The black line is the EUV TG signal from Si at LTG = 110 nm, the red line through the data is an exponential decay that accounts for the overall signal decay, while the blue line is the decay expected according to heat diffusion theory. The inset shows the region close to time zero sampled with finer Δt steps and larger accumulation time to reduce the noise level relative to that in the data shown in the main panel.