| Literature DB >> 31187592 |
Xinxing Zhang1, Gaoxiang Liu2, Sandra Ciborowski2, Wei Wang1, Chu Gong1, Yifan Yao1, Kit Bowen2.
Abstract
Halogen bonding (XB) has emerged as an important bonding motif in supramolecules and biological systems. Although regarded as a strong noncovalent interaction, benchmark measurements of the halogen bond energy are scarce. Here, a combined anion photoelectron spectroscopy and density functional theory (DFT) study of XB in solvated Br- anions is reported. The XB strength between the positively-charged σ-hole on the Br atom of the bromotrichloromethane (CCl3 Br) molecule and the Br- anion was found to be 0.63 eV (14.5 kcal mol-1 ). In the neutral complexes, Br(CCl3 Br)1,2 , the attraction between the free Br atom and the negatively charged equatorial belt on the Br atom of CCl3 Br, which is a second type of halogen bonding, was estimated to have interaction strengths of 0.15 eV (3.5 kcal mol-1 ) and 0.12 eV (2.8 kcal mol-1 ).Entities:
Keywords: halogen bond; halogen bond energy; halogen-bond hole; photoelectron spectroscopy
Year: 2019 PMID: 31187592 DOI: 10.1002/anie.201906279
Source DB: PubMed Journal: Angew Chem Int Ed Engl ISSN: 1433-7851 Impact factor: 15.336