Literature DB >> 31092982

Nondestructive shape process monitoring of three-dimensional high aspect ratio targets using through-focus scanning optical microscopy.

Ravi Kiran Attota1,2, Hyeonggon Kang1,3, Keana Scott4, Richard Allen5, Andras E Vladar1, Benjamin Bunday6,7.   

Abstract

Low-cost, high-throughput and nondestructive metrology of truly three-dimensional (3-D) targets for process control/monitoring is a critically needed enabling technology for high-volume manufacturing (HVM) of nano/micro technologies in multi-disciplinary areas. In particular, a survey of the typically used metrology tools indicates the lack of a tool that truly satisfies the HVM metrology needs of 3-D targets, such as high aspect ratio (HAR) targets. Using HAR targets here we demonstrate that through-focus scanning optical microscopy (TSOM) is a strong contender to fill the gap for 3-D shape metrology. Differential TSOM (D-TSOM) images are extremely sensitive to small and/or dissimilar types of 3-D shape variations. Based on this here we propose a TSOM method that involves creating a database of cross-sectional profiles of the HAR targets along with their respective D-TSOM signals. Using the database, we present a simple-to-use, low-cost, high-throughput and nondestructive process-monitoring method suitable for HVM of truly 3-D targets, which also does not require optical simulations, making its use straightforward and automatable. Even though HAR targets are used for this demonstration, the similar process can be applied to any truly 3-D targets with dimensions ranging from micro-scale to nano-scale. The TSOM method couples the advantage of analyzing truly isolated targets with the ability to simultaneously analyze many targets present in the large field-of-view of a conventional optical microscope.

Entities:  

Keywords:  TSOM; high-throughput semiconductor metrology; nanomanufacturing; nanometrology; nondestructive process control; three-dimensional metrology; through-focus scanning optical microscopy

Year:  2018        PMID: 31092982      PMCID: PMC6512994          DOI: 10.1088/1361-6501/aae4c2

Source DB:  PubMed          Journal:  Meas Sci Technol        ISSN: 0957-0233            Impact factor:   2.046


  1 in total

1.  Electron Reflectometry for Measuring Nanostructures on Opaque Substrates.

Authors:  Lawrence H Friedman; Wen-Li Wu
Journal:  Appl Phys Lett       Date:  2019       Impact factor: 3.791

  1 in total

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