| Literature DB >> 31088050 |
Aisheng Song1, Ruoyu Shi1, Hongliang Lu2,3, Lei Gao4, Qunyang Li1,5, Hui Guo2,3, Yanmin Liu1, Jie Zhang1, Yuan Ma4, Xin Tang1, Shixuan Du2,3, Xin Li6, Xiao Liu1, Yuan-Zhong Hu1, Hong-Jun Gao2,3, Jianbin Luo1, Tian-Bao Ma1.
Abstract
Contacting interfaces with physical isolation and weak interactions usually act as barriers for electrical conduction. The electrical contact conductance across interfaces has long been correlated with the true contact area or the "contact quantity". Much of the physical understanding of the interfacial electrical contact quality was primarily based on Landauer's theory or Richardson formulation. However, a quantitative model directly connecting contact conductance to interfacial atomistic structures still remains absent. Here, we measure the atomic-scale local electrical contact conductance instead of local electronic surface states in graphene/Ru(0001) superstructure, via atomically resolved conductive atomic force microscopy. By defining the "quality" of individual atom-atom contact as the carrier tunneling probability along the interatomic electron transport pathways, we establish a relationship between the atomic-scale contact quality and local interfacial atomistic structure. This real-space model unravels the atomic-level spatial modulation of contact conductance, and the twist angle-dependent interlayer conductance between misoriented graphene layers.Entities:
Keywords: Two-dimensional materials; ab initio calculations; atomic resolution imaging; electrical contacts; heterostructure; real-space model
Year: 2019 PMID: 31088050 DOI: 10.1021/acs.nanolett.9b00695
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189