| Literature DB >> 31059223 |
Wei Feng, Fanglu Qin, Miaomiao Yu, Feng Gao1, Mingjin Dai1, Yunxia Hu1, Lifeng Wang2, Juan Hou, Bin Li, PingAn Hu1.
Abstract
Multilayer InSe has emerged as a promising candidate for applications in novel electronic and optoelectronic devices due to its direct bandgap, high electron mobility, and excellent photoresponse with a broad response range. Here, we report synthesis of superlattice InSe nanosheets by simple thermal annealing for the first time. The mobility is increased to 299.1 cm2 V-1 s-1 for superlattice InSe FETs and is 4 times higher than 63.5 cm2 V-1 s-1 of pristine InSe device. The superlattice InSe photodetector shows an ultrahigh responsivity of 1.7 × 104 A/W (700 nm), which is 8.5 times greater than the pristine photodetector. Superlattice InSe photodetectors hold a good photoresponse stability and rapid response time of 20 ms. The electronic and photoresponse performance improvement of superlattice InSe is attributed to higher carrier sheet density and lower contact resistance for more effective electron injection and more photogenerated carrier injection, respectively. Those results suggest that superlattice is an effective method to further improve electronic and optoelectronic properties of two-dimensional InSe devices.Keywords: InSe; field-effect transistors; photodetectors; superlattice; thermal-annealing
Year: 2019 PMID: 31059223 DOI: 10.1021/acsami.9b01747
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229