| Literature DB >> 31041617 |
Jin-Ho Lee1,2, Eun-Ji Chae1, Soo-Jeong Park3, Jeong-Woo Choi4,5.
Abstract
γ-Aminobutyric acid (GABA) is an important inhibitory neurotransmitter in the central nervous system (CNS), which acts as a major biomarker for neurological disorders such as Parkinson's disease and Meningitis. To this end, the precise measurement of GABA molecule arisen as an important subject for the effective diagnosis and treatment of neurological disorders. However, yet highly sensitive biosensor systems which can analyze a wide range of GABA molecule in a fast response manner have not been reported. In this study, for the first time, a silicon nanowire field-effect transistor (FET) device based immunosensor was developed to detect GABA molecule. Zig-zag shaped silicon nanowires has been fabricated by electron beam lithography and the electrical property p-type FET device was validated through semiconductor analyzer. The optimal immobilizing condition of antibody against GABA molecule was determined by the fluorescent signal measurement. Various concentrations of GABA ranging from 970 fM to 9.7 μM were sensitively measured by conductance change on silicon nanowire-based through the immunoreactions. Further, owing to the ease of miniaturization and label-free system, we believe that the suggested device system has a potential to be utilized for an implantable biosensor to detect neurotransmitter in the brain and can create new opportunities in the field of diagnosis and treatment of neurological disorders.Entities:
Keywords: Biochip; Immunosensor; Neurotransmitter; Silicon nanowire field-effect device; γ-Aminobutyric acid (GABA)
Year: 2019 PMID: 31041617 PMCID: PMC6491525 DOI: 10.1186/s40580-019-0184-3
Source DB: PubMed Journal: Nano Converg ISSN: 2196-5404
Fig.1Schematic diagram of the silicon nanowire-based on field effect transistor device for GABA detection. When GABA was applied to this system, the conductance is increase due to the immunoreaction
Fig. 2a, b Scanning electron microscopy image of the fabricated nanowire pattern on SOI wafer. (Scale bar a 5 μm; b 500 nm)
Fig. 3Electrical properties of silicon nanowire-based FET device. a Source–drain current (ISD) versus source–drain voltage (VSD) plots at different gate voltages. b Source–drain current (ISD) versus gate voltage (VG) at a different source–drain voltage (VSD) of the fabricated nanowire pattern on SOI wafer
Fig. 4Optimization of antibody immobilization on the silicon surface by measuring the number of photons through the spectrometer
Fig. 5Monitoring GABA molecule through silicon nanowire-based FET device. a Reproducible conductance signal observed through selected concentrations of GABA molecule. b Conductance versus time data on GABA antibody modified p-type silicon nanowire after applying the target molecule (GABA) after applying the target molecule (GABA) range from 970 fM to 9.7 μM. c The calculated linear correlations between the concentration of GABA and conductance change of a p-type silicon nanowire-based FET device