We investigate the nanoscale excitation of Ag nanocubes with coherent cathodoluminescence imaging spectroscopy (CL) to resolve the factors that determine the spatial resolution of CL as a deep-subwavelength imaging technique. The 10-30 keV electron beam coherently excites localized plasmons in 70 nm Ag cubes at 2.4 and 3.1 eV. The radiation from these plasmon modes is collected in the far-field together with the secondary electron intensity. CL line scans across the nanocubes show exponentially decaying tails away from the cube that reveal the evanescent coupling of the electron field to the resonant plasmon modes. The measured CL decay lengths range from 8 nm (10 keV) to 12 nm (30 keV) and differ from the calculated ones by only 1-3 nm. A statistical model of electron scattering inside the Ag nanocubes is developed to analyze the secondary electron images and compare them with the CL data. The Ag nanocube edges are derived from the CL line scans with a systematic error less than 3 nm. The data demonstrate that CL probes the electron-induced plasmon fields with nanometer accuracy.
We investigate the nanoscale excitation of Ag nanocubes with coherent cathodoluminescence imaging spectroscopy (CL) to resolve the factors that determine the spatial resolution of CL as a deep-subwavelength imaging technique. The 10-30 keV electron beam coherently excites localized plasmons in 70 nm Ag cubes at 2.4 and 3.1 eV. The radiation from these plasmon modes is collected in the far-field together with the secondary electron intensity. CL line scans across the nanocubes show exponentially decaying tails away from the cube that reveal the evanescent coupling of the electron field to the resonant plasmon modes. The measured CL decay lengths range from 8 nm (10 keV) to 12 nm (30 keV) and differ from the calculated ones by only 1-3 nm. A statistical model of electron scattering inside the Ag nanocubes is developed to analyze the secondary electron images and compare them with the CL data. The Ag nanocube edges are derived from the CL line scans with a systematic error less than 3 nm. The data demonstrate that CL probes the electron-induced plasmon fields with nanometer accuracy.
Cathodoluminescence (CL) spectroscopy
is a well-known technique for nanoscale optical materials characterization.[1−4] In CL, a high-energy (∼1–100 keV) electron beam is
raster-scanned over a sample and a two-dimensional map is constructed
of the emission spectrum at each electron excitation position, providing
insights in optical properties at subwavelength scale. CL can result
from incoherent emission processes induced by the incoming electrons
such as electron–hole recombination in semiconductors or color
center emission in wide-bandgap materials. In contrast, in coherent
CL excitation, a material is directly polarized by the time-varying
electric fields created by the electron as it passes by the material.
The induced polarization then radiates into the far field where it
is detected.[2,5] This coherent excitation is similar
to that of a light beam that polarizes material and subsequently scatters,
with the exception that the time-varying evanescent electron fields
that couple to the polarizable object only make a single cycle in
time, as opposed to commonly used light beams (see Supporting Information). The corresponding excitation energy
spectrum spans a broad range from 0 to ∼40 eV making high-energy
electrons an effective broadband source of excitation in the optical
spectral range.[2,5,6]Coherent CL has gained great interest in recent years as it offers
a method to characterize optical nanomaterials with three unique characteristics:
(1) nanoscale probe size, (2) broadband excitation spectrum, and (3)
attosecond excitation pulse. Coherent CL has been very successful
in identifying optical modes in resonant plasmonic and dielectric
nanostructures,[7−9] hybridization of coupled nanoscale systems,[10,11] mapping the local density of states in photonic crystals,[12,13] and much more. A key question that has not been well addressed so
far is what fundamentally determines the spatial resolution of CL
in practical experimental conditions.In conventional optical
microscopy, the maximum spatial resolution
is defined by Abbe’s diffraction limit and is ∼200 nm
in the visible spectral range, depending on the numerical aperture.
Optical super-resolution microscopy techniques achieve better spatial
resolution through a specific preparation of the excitation state
of the sample (STED microscopy, 30–80 nm)[14] or using stochastic analysis to reconstruct an image (PALM,
STORM, 10–50 nm).[15,16] In scanning optical
near-field microscopy (SNOM), the probe can couple to near-field features
at a resolution down to 10–20 nm.[17] CL imaging brings together some of these features: it is a near-field
probing technique in which the electron beam prepares an excited (polarized)
state of matter of which the radiation is detected, creating optical
excitation images with features that are far below the standard optical
diffraction limit.Previous measurements have shown CL maps
with deep-subwavelength
feature sizes, but the spatial resolution could not be accurately
derived because of several reasons: plasmons were imaged on spherical
samples in which the distance between beam and particle surface varies
strongly along the trajectory,[18] the measurement
pixel size was too large to study nanoscale features in detail,[19] the sample geometry was not well-defined enough,
or the beam diameter was too large to perform analysis at the true
nanoscale.[13] We note that also electron
energy loss spectroscopy (EELS) has been used to reveal nanoscale
optical features in plasmonic nanostructures, also aided by the very
small electron beam spot size in the transmission electron microscopes
on which EELS microscopy is carried out.[20−26] The exact spatial resolution that can be experimentally achieved
with CL and how close plasmon field profiles, and optical mode profiles
in general that are derived from the measurements, approach theoretical
profiles has remained unresolved.In this paper, we investigate
the resonant plasmonic near-field
distribution of Ag nanocubes with atomically flat edges (see Supporting Information) that serve as a model
system with well-defined plasmonic resonances.[27,28] We show that the evanescent decay lengths of the near-field profiles
derived from the CL data approach the calculated ones by 1 nm at 10
keV and 3 nm at 30 keV. The Ag nanocube edges can be derived from
the CL maps with an accuracy better than 3 nm. The data demonstrate
that CL probes the electron-induced plasmon fields with nanometer
accuracy.Fundamentally, the coupling strength of the electron
beam and a
resonantly polarizable object is determined by the overlap between
the evanescent field of the electron with the polarizable charges
in the object, and the strength with which the generated field acts
back on the electron.[2,29] It has been shown that the associated
energy loss probability is directly linked to the local density of
optical states (LDOS).[2] By extension, CL
is a direct probe of the radiative LDOS as it probes radiation. The
extent of the evanescent field about the electron trajectory and the
extent of the modal field thus determine the spatial extent of the
CL image of the object. As the electron field extension increases
with electron velocity, the CL image for a given resonant photonic
object will be more extended if a higher-energy primary electron beam
is used in the CL experiment.[2,7] Similarly, it will be
more extended as lower-frequency optical modes are probed.[2]In our analysis, we use a scanning electron microscope (SEM)
equipped
with a CL collection system composed of a half-parabolic mirror that
is placed between the sample and the electron column, with the mirror
focus aligned with the electron spot on the sample using a micro actuation
system.[30] The electron beam passes through
a 600-μm-diameter hole in the mirror and the collected light
is sent through a vacuum port to an optical analysis system (see Supporting Information). Figure a shows a high-angle dark-field 30 keV scanning
transmission electron microscopy image of a Ag nanocube with a width D = 70 nm. The straight sidewalls are easily recognized
in the image and enable a very accurate analysis of CL and secondary
electron (SE) line scans across the particle.
Figure 1
(a) High-resolution HAADF-STEM image of a 70 nm Ag nanocube.
(C)
CL spectra (30 keV) taken at the center and a corner of a 70 nm Ag
nanocube on a 15 nm Si3N4 membrane. (b) CL spectra
(30 keV) taken at the center and a corner of a 70 nm Ag nanocube on
a 15 nm Si3N4 membrane. (c) Top, simultaneously
collected SE intensity and CL intensity (1.3–5.4 eV spectral
range, 1 nm step size) collected in a 25 nm wide rectangular region
across the nanocube; bottom, laterally integrated CL and SE intensities
along the nanocube. Solid lines are model fits. The dashed vertical
lines indicate the nanocube boundaries derived from the SE (blue dashed
line) and CL (red dashed line) models.
(a) High-resolution HAADF-STEM image of a 70 nm Ag nanocube.
(C)
CL spectra (30 keV) taken at the center and a corner of a 70 nm Ag
nanocube on a 15 nm Si3N4 membrane. (b) CL spectra
(30 keV) taken at the center and a corner of a 70 nm Ag nanocube on
a 15 nm Si3N4 membrane. (c) Top, simultaneously
collected SE intensity and CL intensity (1.3–5.4 eV spectral
range, 1 nm step size) collected in a 25 nm wide rectangular region
across the nanocube; bottom, laterally integrated CL and SE intensities
along the nanocube. Solid lines are model fits. The dashed vertical
lines indicate the nanocube boundaries derived from the SE (blue dashed
line) and CL (red dashed line) models.Figure b
shows
the 30 keV CL spectrum for central and corner excitation of the nanocube.
Resonant localized surface plasmon modes with main peaks at 2.4 and
3.1 eV are clearly observed. Earlier work has shown these correspond
to a vertical dipole mode centered in the particle, and a mode with
field maxima at the corners, respectively.[31−34] To study the spatial extent of
the CL maps with much more precision, we scan the electron beam in
1 nm steps over a narrow rectangular box (dimensions ∼25 ×
600 nm2) across the particle and collect the CL intensity
in the 1.3–5.4 eV spectral range to cover the full plasmon
spectrum. The SE intensity is collected simultaneously. Figure c shows the CL and SE line
profiles, made by integration of the data in the lateral direction
of the rectangle. Clearly the extent of the CL profile is wider than
that of the SE profile.To analyze the shape of the SE profile,
we used Casino V3.3, a
Monte Carlo based computer code[35] to simulate
electron trajectories in a Ag nanocube. Figure a and c show the distribution of inelastic
scattering events for an electron beam incident at the center of the
top facet (x′ = 0) at 10 and 30 keV. Figure b and d show the
simulated SE coefficient, defined as the average number of secondary
electrons escaping the sample per primary electron, as a function
of the impact position x of the incoming electron
beam in a plane through the center of the cube. We perform simulations
for two effective electron beam widths of 2 nm and of 12 nm (full-width
at half-maximum, fwhm; standard deviation σbeam =
0.85 nm, σbeam = 5.1 nm) that reflect the primary
electron beam diameter on the cube and the effect of mechanical instabilities
of the measurement system resulting in variations in alignment of
the electron beam with the sample. Clear SE peaks are observed close
to the edge of the cube, similar to what is observed in the experimental
SE data of Figure c. Elevated SE signals are expected near the sharp edge as the escape
probability is higher near the edge.[36]
Figure 2
Monte
Carlo simulations of electron scattering in a 70 nm Ag nanocube
(10 and 30 keV). (a, c) Distribution of inelastic scattering events
for the electron beam incident at the center of the top facet (dots)
and probability that a SE generated at a certain lateral position x′ escapes from the nanocube integrated over the
nanocube height, per primary electron (blue dashed line, σbeam = 0.85 nm; green dashed line, σbeam =
5.1 nm). (b, d) Simulated probability that a secondary electron is
generated and escapes from the nanocube for two effective beam widths
(blue dots, σbeam = 0.85 nm; green dots, σbeam = 5.1 nm) as a function of the lateral position x of the incident electron beam, and model fits (blue and
green drawn lines). The open circles indicate the nanocube edge as
derived from the fits. The orange vertical dashed lines indicate the
particle edges used in the Casino simulation.
Monte
Carlo simulations of electron scattering in a 70 nm Ag nanocube
(10 and 30 keV). (a, c) Distribution of inelastic scattering events
for the electron beam incident at the center of the top facet (dots)
and probability that a SE generated at a certain lateral position x′ escapes from the nanocube integrated over the
nanocube height, per primary electron (blue dashed line, σbeam = 0.85 nm; green dashed line, σbeam =
5.1 nm). (b, d) Simulated probability that a secondary electron is
generated and escapes from the nanocube for two effective beam widths
(blue dots, σbeam = 0.85 nm; green dots, σbeam = 5.1 nm) as a function of the lateral position x of the incident electron beam, and model fits (blue and
green drawn lines). The open circles indicate the nanocube edge as
derived from the fits. The orange vertical dashed lines indicate the
particle edges used in the Casino simulation.Next, we reproduce the simulated profiles Icube(x) of Figure b and d with an analytical model, where the
SE density generated at position x′ by a primary
electron incident at position x, CSE(x′,x), is
represented by a Gaussian distribution centered around x inside the cube with standard deviation σSE (see Supporting Information, Eq S1). The SE intensity
detected for an electron impact position x is then
given by the integration over the cube of CSE(x′,x) multiplied by the
probability Pdet (x′,σesc) that a SE generated at a certain position x′ escapes from the nanocube. We then convolve this product
with a Gaussian distribution B(x,σbeam) that reflects the effective electron beam
diameter on the cube:In our analysis, we model Pesc(x′,σesc) by a component that is independent of x′,
representing SEs escaping from the top of the cube, and a component
that increases toward the facets that follows a cumulative distribution
for a Gaussian centered at the edge, with a standard deviation σesc that reflects the electron escape depth from the cube (see Supporting Information, Eqs S2–S4). Eq is then used to fit the
simulated data for the two beam widths in Figure b and d. To fit the data, the positions of
the edges were kept as a free parameters. As can be seen, the analytical
model fits the simulated data for both beam widths very well. The
nanocube edges derived from the model (open circles in Figure b,d) match well with the edges
used in the simulations (dashed vertical lines): for the small beam
spot size, they match within 1 nm. For the large spot size, they match
within 2 and 7 nm for 10 and 30 keV, respectively, which is very small
compared to the modeled beam spot size of 12 nm fwhm.The escape
probability Pesc(x,σesc) derived from the
fits of eq is displayed
in Figure a and c
for the two beam energies and beam widths. As expected, the curves
for two different beam widths are similar, as SE detection is independent
of the way in which SEs are generated. The Pesc(x) curve for 10 keV shows a higher intensity
in the center because a higher fraction of SEs (integrated over the
cube height) escapes through the top surface. For both beam energies
we find σesc = 3 nm, which corresponds to the electron
escape depth in Ag for SEs in the keV energy range.[37]Calculations of CL spectra and images were performed
using the
MNPBEM17 computer code that uses the boundary element method (BEM)
to solve Maxwell’s equations in and outside the nanocube for
a given electron trajectory.[38,39] The BEM method uses
a Green’s function method to calculate the surface charges
and currents and derives the corresponding far-field CL radiation
spectrum. Figure a
shows the calculated 30 keV CL spectra: a low-energy resonance is
observed at 2.9 eV for excitation in the center; a sharp resonance
appears at 3.4 eV for corner excitation. The small higher-energy peaks
are assigned to higher-order resonances with more complex spatial
field profiles.[34] These resonances can
be compared with the center and corner resonances at 2.6 and 3.1 eV,
respectively, found in Figure b. We ascribe the discrepancy in spectral shape between experiment
and simulation to several factors: differences in particle dimensions
and corner rounding that can strongly affect the spectral shape,[27,34] the effect of the substrate in the experiment (not included in the
simulations), the formation of a thin oxide shell on the Ag surface
after etching off the ligands, and carbon deposition during electron
irradiation, all of which redshift and broaden the resonances.
Figure 3
MNPBEM calculations
for 70 nm Ag cubes. (a) 30 keV CL spectra for
electrons incident at the center or a corner. (b) CL intensity as
a function of beam position away from the nanocube, integrated over
the 1.6–3.5 eV spectral range used in the measurements in Figure c, for 10, 15, 20,
and 30 keV electrons. The drawn lines are exponential fits to the
data.
MNPBEM calculations
for 70 nm Ag cubes. (a) 30 keV CL spectra for
electrons incident at the center or a corner. (b) CL intensity as
a function of beam position away from the nanocube, integrated over
the 1.6–3.5 eV spectral range used in the measurements in Figure c, for 10, 15, 20,
and 30 keV electrons. The drawn lines are exponential fits to the
data.Figure b shows
the calculated CL intensity as a function of beam position away from
the nanocube. The data are derived from BEM calculations integrated
over the 1.6–3.5 eV spectral range that covers both resonances.
The data are fitted with exponential curves, yielding effective 1/e
decay lengths from 8 to 12 nm, as the energy is increased from 10
to 30 keV.The spatial frequency of optical waves to which the
electron couples
in the direction along the trajectory k = ω/v is well above the free-space
optical wave vector k0 = ω/c (electron
velocity v = 0.19–0.33c in
the 10–30 keV energy range, ω the angular frequency, c the speed of light in vacuum), so that the electron induced
field in the transverse directions is evanescent with a characteristic
decay length L = γ × v/ω, with γ the Lorenz contraction
factor (1 – v2/c2)−1/2.[2] At
30 keV and 2.6 eV, this translates to L = 14 nm.
We note that the precise shape of the profiles in Figure b is determined by the time-integrated
convolution of the different resonant nanocube modal fields (in space
and time) within the 1.6–3.5 eV spectral range with the evanescent
electron fields.Next, we analyze the measured CL line scan
in Figure c. We fit
the data with a model
for the CL intensity ICL(x) with an exponential decay with decay length L and
maximum amplitude a outside the particle and two
exponential terms with amplitude b and decay length L that describe the decaying intensity away from the edge
on top of the particle (see Supporting Information; Eqn. S5). To obtain the measured data, the model for ICL(x) is convoluted with a
Gaussian distribution for the beam width. The nanocube size, D, is also a parameter in the fits. As can be seen, the
model fits the data in Figure c very well.We then performed a large number of measurements
as in Figure c on
different Ag
nanocubes. We fit all data with the model for ICL(x) to determine the decay length L and nanocube size D. A histogram of the
distribution of decay lengths from a total of 159 measurements is
shown in Figure for
four beam energies in the range 10–30 keV. Gaussian fits are
made through the distributions. The decay length derived from the
data is 9 nm at 10 keV, while it is 8 nm in the BEM simulation and
15 nm at 30 keV, while it is 12 nm in BEM.
Figure 4
CL decay length L away from the cubes. Histograms
of the decay length L derived by fitting the model
for ICL to 159 measured CL line scans
as in Figure c. The
green vertical lines show the decay lengths derived from the BEM calculations
in Figure b. The dashed
lines are Gaussian fits to the histograms.
CL decay length L away from the cubes. Histograms
of the decay length L derived by fitting the model
for ICL to 159 measured CL line scans
as in Figure c. The
green vertical lines show the decay lengths derived from the BEM calculations
in Figure b. The dashed
lines are Gaussian fits to the histograms.These data show that the experimental artifacts captured
in the
beam width σbeam can be fitted to yield the plasmonic
field profiles with an accuracy of 1–3 nm. The remaining very
small difference may be related to the difference between the experimental
Ag cube geometry and the input parameters for the BEM simulations
and the fact that the spectral range and detector response function
for the CL line scans and spectral weight in the BEM simulations was
slightly different.Finally, to investigate the consistency
between the SE and CL models
introduced above, we compare the size of the nanocubes determined
from the fits of Icube to the SE data
as described above with the size determined from the fits of ICL to the CL data. This is illustrated in Figure , which shows SE
and CL line scans at 10 keV with the corresponding fits of ICL and Icube. The
dashed vertical lines show the position of the edge determined by
the two methods. The difference Δd between
these values for a total of 159 measurements (with two edges each)
is plotted in the histograms of Figure b for four different energies.
Figure 5
(a) SE and CL line scans
at 10 keV with model fits for Icube and ICL. The
vertical dashed lines indicate the nanocube edges derived from the
two fits, with the difference Δd indicated.
(b) Histograms of Δd for 159 measurements for
four different energies. The dashed lines are Gaussian fits through
the data.
(a) SE and CL line scans
at 10 keV with model fits for Icube and ICL. The
vertical dashed lines indicate the nanocube edges derived from the
two fits, with the difference Δd indicated.
(b) Histograms of Δd for 159 measurements for
four different energies. The dashed lines are Gaussian fits through
the data.Gaussian fits are made through
the histograms of which the center
values determine the accuracy with which the particle size is determined
from the CL line scan; it varies from Δd =
−3 nm to Δd = 1.5 nm when the beam energy
increases from 10 to 30 keV. From this analysis, we conclude that
the edge position of the cube can be derived from the CL line scan
with an accuracy (systematic error) better than 3 nm. The width of
the histograms of Figure b reflects the precision with which the edge position can
be determined from a single CL line; the standard deviation is below
σ = 3 nm in all cases. The strong correspondence between these
experimental data and calculated data further confirms that the electron-induced
field profiles can be accurately derived from the measured CL line
profiles. It indicates that our measurement accuracy is not limited
by distortions of the primary electron beam diameter due to the relatively
large working distance, mechanical instabilities and misalignments,
or errors in the data analysis determined by statistical variations
in the CL data.In conclusion, we have determined the factors
that determine the
spatial resolution of 10–30 keV cathodoluminescence imaging
spectroscopy (CL). Using 70 nm Ag cubes as a model system with sharp
edges, we coherently excite localized plasmons of which the CL radiation
is collected. The half-width at half-maximum of the plasmon CL line
scan at 10(30) keV is 7(10) nm wider than the physical nanocube size,
directly reflecting the extent of the evanescent field around the
electron trajectory and the plasmonic field distributions. The CL
decay length derived from the data differs from the calculated value
from boundary-element simulations by only 1 nm at 10 keV and 3 nm
at 30 keV. A statistical electron scattering model describes the secondary
emission line scans well and is used to determine the physical nanocube
size. The Ag nanocube edge position derived from the CL line scans
show an accuracy (systematic error) less than 3 nm compared to the
secondary electron line scan. The nanoparticle edge position can be
derived with a standard deviation below σ = 3 nm. The strong
correspondence between experimental data and calculations proves that
the electron-induced field profiles can be accurately derived and
firmly establishes CL as an optical characterization technique with
nanoscale spatial resolution.
Authors: Liang Jie Wong; Nicholas Rivera; Chitraang Murdia; Thomas Christensen; John D Joannopoulos; Marin Soljačić; Ido Kaminer Journal: Nat Commun Date: 2021-03-17 Impact factor: 14.919