| Literature DB >> 31012200 |
Samuel W LaGasse1, Prathamesh Dhakras1, Kenji Watanabe2, Takashi Taniguchi2, Ji Ung Lee1.
Abstract
Metal-semiconductor interfaces, known as Schottky junctions, have long been hindered by defects and impurities. Such imperfections dominate the electrical characteristics of the junction by pinning the metal Fermi energy. Here, a graphene-WSe2 p-type Schottky junction, which exhibits a lack of Fermi level pinning, is studied. The Schottky junction displays near-ideal diode characteristics with large gate tunability and small leakage currents. Using a gate electrostatically coupled to the WSe2 channel to tune the Schottky barrier height, the Schottky-Mott limit is probed in a single device. As a special manifestation of the tunable Schottky barrier, a diode with a dynamically controlled ideality factor is demonstrated.Entities:
Keywords: 2D materials; Fermi level pinning; Schottky junctions; Schottky-Mott limit; graphene; van der Waals heterostructures
Year: 2019 PMID: 31012200 DOI: 10.1002/adma.201901392
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849