| Literature DB >> 30986639 |
Runlong Hao1, Zheng Wang2, Xingzhou Mao3, Yaping Gong2, Bo Yuan3, Yi Zhao4, Baojuan Tian3, Meng Qi3.
Abstract
A novel advanced oxidation process (AOP) of ultraviolet/chlorite-ammonia (UV/NaClO2-NH4OH) was developed to remove Hg0 from flue gas. The distribution of mercury concentration in three solutions of NaClO2-NH4OH, KCl, and H2SO4-KMnO4 was determined by cold atom fluorescence spectrometry (AFS). The role of NH4OH was to help NaClO2 preserving and/or stabilizing Hg2+ meanwhile inhibiting the photo-production of ClO2. In the absence of UV, decreasing pH promoted the release of Hg2+ from NaClO2-NH4OH; introducing NO, SO2, O2, Br-, Cl-, and HCO3- suppressed Hg0 oxidation. In the presence of UV, rising temperature accelerated the release of Hg2+ from NaClO2-NH4OH; while SO2, Br- and HCO3- facilitated Hg0 oxidation. In the absence and presence of UV, Hg0 oxidation was controlled by ClO2- and by ClO/Cl2O2/HO/ClO2, respectively. The formations of ClO/HO/ClO2 were confirmed by electron spin resonance (ESR). X-ray photoelectron spectroscopy (XPS) revealed that the products of Hg0 and ClO2- were HgCl2, and ClO2, Cl-, ClO3-, Cl2, and ClO4-, respectively. Analysis of kinetics showed that the Hatta numbers were 23-133 and 69-305 without and with UV, respectively, thus, the gas-film mass transfer was the rate-determining step. This paper gives a new insight in radical behavior in Hg0 oxidation.Entities:
Keywords: ClO radical; Hg(0) removal; Kinetics; UV/NaClO(2)
Year: 2019 PMID: 30986639 DOI: 10.1016/j.jhazmat.2019.03.134
Source DB: PubMed Journal: J Hazard Mater ISSN: 0304-3894 Impact factor: 10.588