| Literature DB >> 30966404 |
Yizhi Liu1, Xiaorong Wu2, Yi Sun3, Weili Xie4.
Abstract
Nanocomposite dental resins with 0, 2, 5, and 10 wt % methacryl polyhedral oligomeric silsesquioxane (POSS) as filler in the resin matrix were prepared by a light curing method.The atomic force microscopy (AFM), fourier transform infrared spectroscopy (FTIR), nanoindentation, and nanoscratch tests were carried out to study the effect of POSS contents on the compatibility, double bond conversion, volumetric shrinkage, hardness, modulus, and resistance of the dental resins. POSS was very uniformly dispersed and showed a good compatibility with the matrix. The double bond conversion increased and the volume reduced with the addition of POSS. As the POSS addition increased, the mechanical properties increased initially. Small addition of POSS remarkably enhanced the hardness and scratch resistance of the resin matrix.Entities:
Keywords: dental resin; hardness; methacryl POSS; scratch resistance; shrinkage
Year: 2018 PMID: 30966404 PMCID: PMC6415207 DOI: 10.3390/polym10040369
Source DB: PubMed Journal: Polymers (Basel) ISSN: 2073-4360 Impact factor: 4.329
Figure 1The molecule structure of methacryl polyhedral oligomeric silsesquioxane (POSS).
The compositions proportion of POSS hybrid dental nanocomposites.
| Resin Matrix | Nanofiller | ||||
|---|---|---|---|---|---|
| Resin System | Light Photo-Initiator | ||||
| Bis-GMA | TEGDMA | CQ | DMAEMA | methacryl POSS | |
| P00 | 49.5 | 49.5 | 0.5 | 0.5 | 0 |
| P02 | 47.5 | 49.5 | 0.5 | 0.5 | 2 |
| P05 | 44.5 | 49.5 | 0.5 | 0.5 | 5 |
| P10 | 39.5 | 49.5 | 0.5 | 0.5 | 10 |
Figure 2The atomic force microscopy (AFM) images of the structure of composite resins with different POSS additions: (a) P00, (b) P02, (c) P05, (d) P10.
Figure 3FTIR spectra of composite resins with different POSS additions.
Figure 4Double bond conversion of composite resins with different POSS additions.
The characterization of the hardness, elastic modulus, and average scratch depth of samples.
| Samples | Hardness (GPa) | Elastic Modulus (GPa) | Average Scratch Depth (nm) |
|---|---|---|---|
| P00 | 0.204 ± 0.008 | 2.931 ± 0.163 | −19,111 ± 502 |
| P02 | 0.243 ± 0.013 | 3.388 ± 0.213 | −15,684 ± 556 |
| P05 | 0.322 ± 0.019 | 4.136 ± 0.204 | −12,349 ± 473 |
| P10 | 0.285 ± 0.017 | 3.491 ± 0.241 | −18,331 ± 698 |
Figure 5Influence of composite resins with different POSS additions on the scratch profiles.