| Literature DB >> 30964263 |
Shifei Kang1,2, Maofen He1, Mengya Chen1, Yanfei Liu1, Yuting Wang2,3, Yangang Wang4, Mingdong Dong2, Xijiang Chang5, Lifeng Cui1.
Abstract
Surface amino group regulation and structural engineering of graphitic carbon nitride (g-CN) for better catalytic activity have increasingly become a focus of academia and industry. In this work, the ammonia plasma produced by a microwave surface wave plasma generator was developed as a facile source to achieve fast, controllable surface modification, and structural engineering of g-CN by ultrafast plasma treatment in minutes, thus enhancing photocatalytic performance of g-CN. The morphology, surface hydrophilicity, optical absorption properties, and states of C-N bonds were investigated to determine the effect of plasma immersion modification on the g-CN catalyst. The structure and photoelectric features of the plasma-modified samples were characterized by X-ray diffractometry, Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy, and electrochemical impedance spectroscopy. The results indicate that the ammonia plasma-treated g-CN-NH3 exhibits an ultrathin nanosheet structure, enriched amino groups, and an ideal molecular structure, a narrower band gap (2.35 eV), extended light-harvesting edges (560 nm), and enhanced electron transport ability. The remarkably enhanced photocatalytic activity demonstrated in the photoreduction and detoxification of hexavalent chromium (Cr(VI)) can be ascribed to the optimization of the structural and photoelectric properties induced by the unique ammonia plasma treatment. The effective and ultrafast approach developed in this work is promising in the surface amino group regulation and structural engineering of various functional materials.Entities:
Keywords: ammonia plasma; graphitic carbon nitride; photocatalytic activity; structural engineering; surface modification
Year: 2019 PMID: 30964263 DOI: 10.1021/acsami.9b01068
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229