| Literature DB >> 30923708 |
Abstract
Understanding and modeling kinetics is an essential part of the optimization and implementation of chemical reactions. In the case of photocatalytic reactions this is mostly done one-dimensionally, i.e., only considering the effect of one parameter at the same time. However, as discussed in this study, many of the relevant reaction parameters have mutual interdependencies that call for a holistic multi-dimensional approach to accurately model and understand their influence. Such an approach is described herein, and all the relevant equations given so that researchers can readily implement it to analyze and model their reactions.Entities:
Keywords: heterogeneous photocatalysis; high light intensity; kinetic analysis; molecular photocatalysis; photocatalysis; photoredox catalysis; temperature effects
Year: 2019 PMID: 30923708 PMCID: PMC6426749 DOI: 10.3389/fchem.2019.00128
Source DB: PubMed Journal: Front Chem ISSN: 2296-2646 Impact factor: 5.221
Figure 1Illustration of the three elementary reactions which are the basis of the kinetic model. Shown are the generation of reactive surface sites (R1), the recombination (R2) and the charge transfer to the target substrate (R3).
Figure 2Exemplary dependency of the local reaction rate (Equation 8) on the light intensity for different catalyst concentrations in a double logarithmic plot. Parameters used: ϕ = 0.1, k = 500 μmol L−1 min−1, k* = 5.000 μmol g−1 min−1, θ = 1.
Figure 3Exemplary dependency of the (normalized) local reaction rate (Equation 8 divided by ) in dependence of the catalyst concentration for various LVRPA. Parameters used: ϕ = 1, k = 500 μmol L−1 min−1, k* = 1.500 μmol g−1 min−1, θ = 1.
Figure 4Exemplary course of the substrate concentration (starting from 10 mmol L−1) over time in a given volume element for different LVRPA according to Equation (12). Parameters used: ϕ = 0.026, c0 = 2.5 g L−1, k = 653 μmol L−1 min−1, k* = 1358 μmol g−1 min−1, K = 0.1 L mmol−1.
Figure 5(A) Exemplary course of the average reaction rate 〈r〉 in dependence of the volumetric photon flux density q according to Equation (19). (B) Locally resolved reaction rate as a function of reactor depth z according to Equation (8) with Equation (15) for the three cases marked A–C in (A). Parameters used: ϕ = 1, c0 = 2.5 g L−1, k = 500 μmol L−1 min−1, k* = 1.500 μmol g−1 min−1, θ = 1, ϵ = 16.4 L g−1 cm−1, d = 0.1 cm.
Figure 6Interdependence of the measured H2O2 formation rate constant k on the amount of catalyst and the photon flux density shown as black and dark gray dots. Also shown is the calculated best fit to the proposed model (Equation 23) as a surface plot; the vertical lines attached to the data points show their respective difference to the calculation. Data points that are black mean they are on or above the surface plot, and dark gray data points signify they are below the surface. Parameters used: ϕ = 0.02623, k = 653 μmol L−1 min−1, k* · θ = 1358 μmol g−1 min−1, ϵ = 16.4 L g−1 cm−1, d = 4 cm. Reprinted with permission from Burek et al. (2019), ©2018 American Chemical Society.
Figure 7The change in average reaction rate is a function of light intensity for different temperatures calculated according to Equation (23) with Equation (24). Also shown are the apparent activation energies obtained from Arrhenius plots at a given light intensity. Parameters used: ϕ = 1, c0 = 2.5 g L−1, k = 500 μmol L−1 min−1, A = 3.325 × 108 μmol g−1 min−1, E = 30 kJ mol−1, θ = 1, ϵ = 16.4 L g−1 cm−1, d = 0.1 cm.
Figure 8Illustration of the four elementary reactions which are the basis of the kinetic model for molecular photocatalytic reactions. Shown are the generation of the excited state (R1), the relaxation (R2), oxidative quenching (R3) and regeneration of the photocatalyst (R4).
| α | - | Optical thickness |
| ϵ | L g-1 cm-1 | Mass extinction coefficient (of heterogeneous photocatalyst) |
| ϵ | L mol-1 cm-1 | Molar extinction coefficient (of molecular photocatalyst) |
| ϕ | - | Intrinsic quantum yield |
| θ | - | Surface coverage of the catalyst with the substrate |
| τ | s | Half-life time of the photocatalyst's excited state |
| mol g-1 s-1 | Pre-exponential factor | |
| g L-1 | Catalyst concentration | |
| mol L-1 | Concentration of unexcited reactive centers | |
| mol L-1 | Concentration of total reactive centers | |
| mol L-1 | Concentration of excited reactive centers | |
| cm | Total length of the reactor alongside the beam direction (z) | |
| kJ mol-1 | Activation energy | |
| kJ mol-1 | Apparent activation energy | |
| - | Fluorescence intensity | |
| - | Fluorescence intensity in the absence of a quencher | |
| mol m-2 s-1 | Photon irradiance incident at the reactor surface | |
| mol m-2 s-1 | Photon irradiance at a specific position alongside the beam direction (z) | |
| s-1 | First-order rate constant for the conversion of the substrate to the product | |
| mol g-1 s-1 | Rate constant | |
| mol L-1 s-1 | Pseudo Langmuir-Hinshelwood rate constant | |
| L mol-1 s-1 | Second-order rate constant for the conversion of the substrate to the product | |
| L mol-1 s-1 | Second-order rate constant for the regeneration of the photocatalyst | |
| mol L-1 s-1 | Recombination rate constant | |
| L mol-1 | Adsorption constant for the substrate on the photocatalyst | |
| L mol-1 | Pseudo Langmuir-Hinshelwood adsorption constant | |
| mol L-1 s-1 | Local volumetric rate of photon absorption (LVRPA) | |
| mol L-1 s-1 | LVRPA at a specific depth of reactor alongside the beam direction (z) | |
| mol L-1 s-1 | Maximum LVRPA at any position in the reactor | |
| mol L-1 s-1 | Average volumetric rate of photon absorption (AVRPA) | |
| [ | mol L-1 | Concentration of the photocatalyst in the ground state |
| [ | mol L-1 | Total concentration of the photocatalyst in all states |
| [ | mol L-1 | Concentration of the photocatalyst in the excited state |
| [ | mol L-1 | Concentration of the photocatalyst in the oxidized state |
| mol L-1 s-1 | Volumetric photon flux density | |
| mol L-1 s-1 | Local reaction rate | |
| mol L-1 s-1 | Maximum local reaction rate | |
| 〈 | mol L-1 s-1 | Average reaction rate |
| J mol-1 K-1 | Universal gas constant | |
| [ | mol L-1 | Concentration of the substrate |
| [ | mol L-1 | Concentration of substrate 1 |
| [ | mol L-1 | Concentration of substrate 2 |
| K | Absolute temperature | |
| cm | Depth into in the reactor alongside the beam direction |