| Literature DB >> 30890745 |
Mathilde Bocé1,2, Marine Tassé1, Sonia Mallet-Ladeira1, Flavien Pillet2, Charlotte Da Silva2, Patricia Vicendo3, Pascal G Lacroix1, Isabelle Malfant4, Marie-Pierre Rols2.
Abstract
Antibiotic resistance is becoming a global scourge with 700,000 deaths each year and could cause up to 10 million deaths by 2050. As an example, Staphylococcus epidermidis has emerged as a causative agent of infections often associated with implanted medical devices. S. epidermidis can form biofilms, which contribute to its pathogenicity when present in intravascular devices. These staphylococci, embedded in the biofilm matrix, are resistant to methicillin, which had long been the recommended therapy and which has nowadays been replaced by less toxic and more stable therapeutic agents. Moreover, current reports indicate that 75 to 90% of Staphylococcus epidermidis isolates from nosocomial infections are methicillin-resistant strains. The challenge of successfully combating antibiotics resistance in biofilms requires the use of compounds with a controlled mode of action that can act in combination with antibiotics. Ruthenium nitrosyl complexes are potential systems for NO release triggered by light. The influence of trans(NO, OH)-[RuFT(Cl)(OH)NO](PF6) on Staphylococcus epidermidis resistant to methicillin is described. The results show a 50% decrease in cell viability in bacteria treated with low concentrations of NO. When combined with methicillin, this low dose of NO dramatically decreases bacterial resistance and makes bacteria 100-fold more sensitive to methicillin.Entities:
Mesh:
Substances:
Year: 2019 PMID: 30890745 PMCID: PMC6424994 DOI: 10.1038/s41598-019-41222-0
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1Trans(NO, OH)-[RuFT(Cl)(OH)NO]+ complex. Displacement ellipsoids are drawn at the 50% probability level. Hydrogen atoms are omitted for clarity except H2a from OH ligand.
Figure 2NO photorelease from trans(NO, OH)-[RuFT(Cl)(OH)NO](PF6). Triplet electron paramagnetic resonance signals from NO trapping by [Fe(MGD)2] (A); Chronoamperograms of NO upon irradiation steps of 15 s (arrows). The typical sensitivity of the NO detector was about 100 pA/nM (B); Evolution of absorption spectra of trans(NO, OH)-[RuFT(Cl)(OH)NO](PF6) in water (0.5% DMSO) at 365 nm. (C).
Figure 3Observation of S. epidermidis ATCC 35984 and ATCC 12228. S. epidermidis ATCC 35984 after 3 hours (A) or 10 hours (B) of culture under agitation in LB (arrows show aggregates and filaments). 2D or 3D AFM images of S. epidermidis ATCC 35984 (C) and S. epidermidis ATCC 12228 (D).
Figure 4Growth of Staphylococcus epidermidis: Effect of methicillin on S. epidermidis ATCC 35984 (A) and S. epidermidis ATCC 12228 (B). Effect of methicillin and trans(NO, OH)-[RuFT(Cl)(OH)NO](PF6) on S. epidermidis ATCC 35984. (C) Without/with irradiation of 0.1 µM [RuNO]; (D) Number of colonies of S. epidermidis ATCC 35984 after treatment with methicillin (left side) and with combined treatment ([RuNO]-methicillin (right side) in presence of irradiated [RuNO]. [RuNO] stands for trans(NO, OH)-[RuFT(Cl)(OH)NO](PF6) and was irradiated during 10 minutes with a Hg lamp (32 mW).