| Literature DB >> 30860589 |
Ken Harada1,2, Kodai Niitsu3, Keiko Shimada1, Tetsuji Kodama4, Tetsuya Akashi5,6, Yoshimasa A Ono1, Daisuke Shindo1,7, Hiroyuki Shinada5, Shigeo Mori2.
Abstract
Electron holography in Fraunhofer region was realized by using an asymmetric double slit. A Fraunhofer diffraction wave from a wider slit worked as an objective wave interfered with a plane wave from a narrower slit as a reference wave under the pre-Fraunhofer condition and recorded as a hologram. Here, the pre-Fraunhofer condition means that the following conditions are simultaneously satisfied: single-slit observations are performed under the Fraunhofer condition and the double-slit observations are performed under the Fresnel condition. Amplitude and phase distributions of the Fraunhofer diffraction wave were reconstructed from the hologram by the Fourier transform reconstruction method. The reconstructed amplitude and phase images corresponded to Fraunhofer diffraction patterns; in particular, the phase steps of π at each band pattern in the phase image were confirmed. We hope that the developed Fraunhofer electron holography can be extended to a direct phase detection method in the reciprocal space.Entities:
Keywords: Fraunhofer diffraction; double slit; electron holography; interferometry; phase distribution
Year: 2019 PMID: 30860589 PMCID: PMC6547415 DOI: 10.1093/jmicro/dfz007
Source DB: PubMed Journal: Microscopy (Oxf) ISSN: 2050-5698 Impact factor: 1.571
Fig. 1.Illustration of the present experimental setup and for explanation of ‘pre-Fraunhofer condition.’ An electron wave passed through the left single slit is an object wave and an electron wave passed through the right narrower slit is a reference wave. In the pre-Fraunhofer region, the reference wave spreads to an almost plane-wave-like wave enabling to record holograms of the Fraunhofer diffraction pattern on the left.
Fig. 2.Wave optical simulation on wave propagation from an asymmetric double slit by changing the right-slit width ωright: (a) 38 nm, (b) 22 nm, (c) 10 nm, and (d) 5 nm. The left-slit width ωleft is 120 nm.
Fig. 3.A schematic diagram of the optical system. A double slit is installed at the specimen position and is imaged on the electron biprism (BP) filaments. The double slit and the BP filament are focused on the image plane. Defocusing conditions are controlled by the magnifying lens below the objective lens. The width of the right slit is varied by using the BP filament. In the inset is a scanning electron micrograph of the fabricated double slit, having 120 nm width, 10 μm length and 800 nm spacing between the slit.
Fig. 4.Series of the experimental results by changing the right slit width ωright: (a) ωright = 38 nm, (b) 22 nm, (c) 10 nm and (d) 5 nm. The defocus distance Δf was 23.2 mm for all panels. Inset images in blue at the bottom of each panel are calculated results along the yellow lines in Fig. 2.
Fig. 5.(a) Electron hologram of a Fraunhofer diffraction from the left slit. (b) The Fraunhofer diffraction pattern only from the left slit with 120 nm width recorded at the defocus distance Δf of 23.2 mm. Amplitude and phase distributions in a white square region in (a) are reconstructed and shown in Fig. 6.
Fig. 6.Reconstructed amplitude and phase images, and phase profile; (a) amplitude image, (b) phase image, and (c) phase profile along the red broken line in (b). Fringe interval in the Fraunhofer pattern becomes slightly narrower at the top of the panel, probably caused by the wider opening width of the left slit. The amount width increment is estimated to be about 7 nm, which is attributed to fluctuations in the film thickness. Non-uniform patterns in the reconstructed center band in (a) and (b) are artifacts probably due to a loss of interference fringes of the hologram; however, these patterns have no direct effects on experimental results.