| Literature DB >> 30820087 |
David Chew1, Vincent Bennani1, John M Aarts1, Nicholas Chandler1, Andrew Gray2, Bronwyn Lowe3.
Abstract
OBJECTIVE: To compare the bond strength of porcelain to enamel and dentin preparations finished with either ultrasonic instruments or diamond burs, with or without acid etching.Entities:
Keywords: Bonding strengths; porcelain; ultrasonic
Year: 2019 PMID: 30820087 PMCID: PMC6385573 DOI: 10.4103/JCD.JCD_302_18
Source DB: PubMed Journal: J Conserv Dent ISSN: 0972-0707
Materials, product name, and manufacturer information
| Materials | Product name | Manufacturer |
|---|---|---|
| Acrylic | Castapress | Vertex-Dental B.V., Zeist, The Netherlands |
| End cutting burs | Tissue Guard End-Cutting bur (fine grit 60 µm) | Premier Two Striper, OH, PA, USA |
| Tissue Guard End-Cutting bur (very fine grit 45 µm) | Premier Two Striper, OH, PA, USA | |
| Glass ionomer cement | GC Fuji IX GP | GC Corporation, Tokyo, Japan |
| Shoulder kit | Satelec Perfect Margin PMS 1 (76 µm) | Satelec, Merignac, France |
| Satelec Perfect Margin PMS 2 (46 µm) | Satelec, Merignac, France | |
| Satelec Perfect Margin PMS 3 (no grit) | Satelec, Merignac, France | |
| Bonding system | Syntac System | Ivoclar Vivadent AG, Schaan, Liechtenstein |
| Phosphoric acid (37%) | Total etch | Ivoclar Vivadent AG, Schaan, Liechtenstein |
| Lithium disilicate glass ceramic | IPS e.max CAD | Ivoclar Vivadent AG, Schaan, Liechtenstein |
| Silane coupling agent | Monobond | Ivoclar Vivadent AG, Schaan, Liechtenstein |
| Resin luting agent | Variolink Veneer Esthetic | Ivoclar Vivadent AG, Schaan, Liechtenstein |
| Light cure | Bluephase style | Ivoclar Vivadent AG, Schaan, Liechtenstein |
PMS: Perfect Margin Shoulder,CAD: Computer Aid Design, IPS: Ivoclar Porcelain System
Figure 1Samples distribution
Figure 2Scanning electron microscope image of rotary instrument tissue guard end-cutting (bur) (×65). Only the tip is uniformly coated with diamond particles. The extremity of the shaft is also beveled inward to avoid the production of any undercuts during placement of finishing lines. (a) Scanning electron microscope image of tissue guard end-cutting bur, grit 60 μm, (b) scanning electron microscope image of tissue guard end-cutting bur, grit 45 μm
Figure 3Scanning electron microscope image of ultrasonic instrument (×50). For perfect margin shoulder 1 and 2 the entire surface of the instrument is uniformly coated with diamond particles. Perfect margin shoulder 3 is uncoated. (a) Scanning electron microscope image of perfect margin shoulder 1, 76 μm grit. (b) Scanning electron microscope image of perfect margin shoulder 2, 46 μm grit. (c) Scanning electron microscope image of perfect margin shoulder 3, no grit
Summary of results including: mean, standard deviation, confidence interval 95%, and value for all examined groups
| Dentin | Enamel | ||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| No etch | Etch | Overall between treatment effects | Etch | Between treatment effects | |||||||||||
| Mean | SD | Mean | SD | Difference | 95% CI | Mean | SD | Difference | 95% CI | ||||||
| No intervention | 16 | 11.04 | 4.52 | 15 | 17.73 | 5.74 | 0.88 | −2.26-4.03 | 0.582 | 36 | 42.48 | 16.05 | −9.88 | 1.33-18.42 | 0.023 |
| End cutting burs | 31 | 9.87 | 4.11 | 31 | 17.02 | 6.55 | Ref | 38 | 52.29 | 17.01 | Ref | ||||
| Ultrasonic | 30 | 12.87 | 5.58 | 31 | 19.68 | 8.58 | 2.88 | 1.58-4.18 | <0.001 | 36 | 60.50 | 15.59 | 7.35 | 2.66-12.04 | 0.002 |
| Difference | 95% CI | ||||||||||||||
| Effect of etching | 7.63 | 6.02-9.24 | <0.001 | ||||||||||||
Counts, means, and SDs are for preparation sites and ignore clustering within teeth. Differences, 95% CIs, and P values are from linear mixed models incorporating clustering within teeth and controlling for preparation site position. SDs: Standard deviations, CIs: Confidence intervals
Figure 4Comparison between enamel and dentin bonding for the three interventions in the etched group (Mpa)
Figure 5Comparison of the dentin bond strength between finishing interventions in both etch and no etch groups (MPa)