Literature DB >> 30694651

Two-Mode MoS2 Filament Transistor with Extremely Low Subthreshold Swing and Record High On/Off Ratio.

Xue-Feng Wang1, He Tian1, Yanming Liu1, Shuhong Shen1, Zhaoyi Yan1, Ningqin Deng1, Yi Yang1, Tian-Ling Ren1.   

Abstract

With rapid development of integrated circuits, urgent requirements for a transistor with lower subthreshold swing (SS) and better contact properties are needed. To optimize the SS and contact issues, we propose a concept of molybdenum disulfide (MoS2) filament transistor with two modes. We successfully fabricated the proposed devices in a wafer-scale. Mode I can enable the device with extremely low SS down to 2.26 mV/dec by switching the contact filament between on and off while mode II can realize a record high on/off ratio of 2.6 × 109 by using filament as quasi-zero dimensional (quasi-0D) contact. Compared to conventional three-dimensional (3D) contact, quasi-0D contact using conductive filament improves the current density nearly 50 times. We also built a spice model to simulate the electrical behaviors, and the simulation results show an extremely low SS in mode I (using abrupt filament formation/rupture) and excellent quasi-0D contact in mode II. The two-mode MoS2 filament transistor can significantly improve the SS and contact comparing to those of the state-of-the-art transistors, which has the great potential to boost the development of the next generation mainstream transistors.

Entities:  

Keywords:  filament transistor; molybdenum disulfide; on/off ratio; quasi-0D contact; subthreshold swing

Year:  2019        PMID: 30694651     DOI: 10.1021/acsnano.8b08876

Source DB:  PubMed          Journal:  ACS Nano        ISSN: 1936-0851            Impact factor:   15.881


  4 in total

1.  A Horizontal-Gate Monolayer MoS2 Transistor Based on Image Force Barrier Reduction.

Authors:  Kun Yang; Hongxia Liu; Shulong Wang; Wei Li; Tao Han
Journal:  Nanomaterials (Basel)       Date:  2019-09-02       Impact factor: 5.076

2.  Atomic threshold-switching enabled MoS2 transistors towards ultralow-power electronics.

Authors:  Qilin Hua; Guoyun Gao; Chunsheng Jiang; Jinran Yu; Junlu Sun; Taiping Zhang; Bin Gao; Weijun Cheng; Renrong Liang; He Qian; Weiguo Hu; Qijun Sun; Zhong Lin Wang; Huaqiang Wu
Journal:  Nat Commun       Date:  2020-12-04       Impact factor: 14.919

3.  Ultra-Steep-Slope High-Gain MoS2 Transistors with Atomic Threshold-Switching Gate.

Authors:  Jun Lin; Xiaozhang Chen; Xinpei Duan; Zhiming Yu; Wencheng Niu; Mingliang Zhang; Chang Liu; Guoli Li; Yuan Liu; Xingqiang Liu; Peng Zhou; Lei Liao
Journal:  Adv Sci (Weinh)       Date:  2022-01-17       Impact factor: 16.806

4.  Improved Performance of NbOx Resistive Switching Memory by In-Situ N Doping.

Authors:  Jing Xu; Yuanyuan Zhu; Yong Liu; Hongjun Wang; Zhaorui Zou; Hongyu Ma; Xianke Wu; Rui Xiong
Journal:  Nanomaterials (Basel)       Date:  2022-03-21       Impact factor: 5.076

  4 in total

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