| Literature DB >> 30645416 |
Quang Minh Thai, Nicolas Pauc, Joris Aubin, Mathieu Bertrand, Jérémie Chrétien, Vincent Delaye, Alexei Chelnokov, Jean-Michel Hartmann, Vincent Reboud, Vincent Calvo.
Abstract
We demonstrate lasing up to 230 K in a GeSn heterostructure micro-disk cavity. The GeSn 16.0% optically active layer was grown on a step-graded GeSn buffer, limiting the density of misfit dislocations. The lasing wavelengths shifted from 2720 to 2890 nm at 15 K up to 3200 nm at 230 K. Compared to results reported elsewhere, we attribute the increase in maximal lasing temperature to two factors: a stronger optical confinement by a thicker active layer and a better carrier confinement provided by a GeSn 13.8% / GeSn 16.0% / GeSn 13.8% double heterostructure.Entities:
Year: 2018 PMID: 30645416 DOI: 10.1364/OE.26.032500
Source DB: PubMed Journal: Opt Express ISSN: 1094-4087 Impact factor: 3.894