Literature DB >> 30645416

GeSn heterostructure micro-disk laser operating at 230 K.

Quang Minh Thai, Nicolas Pauc, Joris Aubin, Mathieu Bertrand, Jérémie Chrétien, Vincent Delaye, Alexei Chelnokov, Jean-Michel Hartmann, Vincent Reboud, Vincent Calvo.   

Abstract

We demonstrate lasing up to 230 K in a GeSn heterostructure micro-disk cavity. The GeSn 16.0% optically active layer was grown on a step-graded GeSn buffer, limiting the density of misfit dislocations. The lasing wavelengths shifted from 2720 to 2890 nm at 15 K up to 3200 nm at 230 K. Compared to results reported elsewhere, we attribute the increase in maximal lasing temperature to two factors: a stronger optical confinement by a thicker active layer and a better carrier confinement provided by a GeSn 13.8% / GeSn 16.0% / GeSn 13.8% double heterostructure.

Entities:  

Year:  2018        PMID: 30645416     DOI: 10.1364/OE.26.032500

Source DB:  PubMed          Journal:  Opt Express        ISSN: 1094-4087            Impact factor:   3.894


  3 in total

1.  Lasing in strained germanium microbridges.

Authors:  F T Armand Pilon; A Lyasota; Y-M Niquet; V Reboud; V Calvo; N Pauc; J Widiez; C Bonzon; J M Hartmann; A Chelnokov; J Faist; H Sigg
Journal:  Nat Commun       Date:  2019-06-20       Impact factor: 14.919

2.  Nanoscale growth of a Sn-guided SiGeSn alloy on Si (111) substrates by molecular beam epitaxy.

Authors:  Liming Wang; Yichi Zhang; Hao Sun; Jie You; Yuanhao Miao; Zuoru Dong; Tao Liu; Zuimin Jiang; Huiyong Hu
Journal:  Nanoscale Adv       Date:  2020-11-19

3.  Growth and Strain Modulation of GeSn Alloys for Photonic and Electronic Applications.

Authors:  Zhenzhen Kong; Guilei Wang; Renrong Liang; Jiale Su; Meng Xun; Yuanhao Miao; Shihai Gu; Junjie Li; Kaihua Cao; Hongxiao Lin; Ben Li; Yuhui Ren; Junfeng Li; Jun Xu; Henry H Radamson
Journal:  Nanomaterials (Basel)       Date:  2022-03-16       Impact factor: 5.076

  3 in total

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