Literature DB >> 30593831

Rigorous control of vesicle-forming lipid pKa by fluorine-conjugated bioisosteres for gene-silencing with siRNA.

Ayaka Okamoto1, Hiroyuki Koide1, Naoki Morita2, Yusuke Hirai1, Yuji Kawato2, Hiromichi Egami2, Yoshitaka Hamashima2, Tomohiro Asai1, Takehisa Dewa3, Naoto Oku4.   

Abstract

While the influence of pKa provided by amine-containing materials in siRNA delivery vectors for use in gene-silencing has been widely studied, there are little reports in which amine pKa is controlled rigorously by using bioisosteres and its effect on gene-silencing. Here, we report that amine pKa could be rigorously controlled by replacement of hydrogen atom(s) with fluorine atom(s). A series of mono- and di-amine lipids with a different number of fluorine atoms were synthesized. The pKa of the polyamine lipids was shifted to a lower value with an increase in the number of fluorine atoms. The optimal pKa for high gene-silencing efficiency varied according to the number of amine residues in the polyamine lipid. Whereas the endosomal escape ability of mono-amine lipid-containing lipid vesicles (LVs) depended on the pKa, that of all tested di-amine lipid-containing LVs showed equal membrane-destabilizing activity. LVs showing moderately weak interactions with siRNA facilitated cytoplasmic release of siRNA, resulting in strong gene-silencing. These findings indicate that appropriate amine pKa engineering depending on the number of amines is important for the induction of effective RNA interference.
Copyright © 2019 Elsevier B.V. All rights reserved.

Entities:  

Keywords:  Fluorine; Lipid nanoparticle; pK(a); siRNA

Mesh:

Substances:

Year:  2018        PMID: 30593831     DOI: 10.1016/j.jconrel.2018.12.044

Source DB:  PubMed          Journal:  J Control Release        ISSN: 0168-3659            Impact factor:   9.776


  1 in total

1.  siRNA Vehicles for High Endosomal Escapability.

Authors:  Hiroyuki Koide; Sei Yonezawa; Tomohiro Asai
Journal:  Methods Mol Biol       Date:  2021
  1 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.