| Literature DB >> 30552352 |
Giuseppe Quero1, Patrizio Vaiano1, Francesco Fienga2,3, Martino Giaquinto1, Valentina Di Meo4, Georgi Gorine3,5, Pierluigi Casolaro6, Luigi Campajola6, Giovanni Breglio7, Alessio Crescitelli4, Emanuela Esposito4, Armando Ricciardi1, Antonello Cutolo1, Federico Ravotti3, Salvatore Buontempo2,3, Marco Consales8, Andrea Cusano9.
Abstract
In this work, we report on the first demonstration of Lab on Fiber (LOF) dosimeter for ionizing radiation monitoring at ultra-high doses. The new dosimeter consists in a metallo-dielectric resonator at sub-wavelength scale supporting localized surface plasmon resonances realized on the optical fiber (OF) tip. The resonating structure involves two gold gratings separated by a templated dielectric layer of poly(methyl methacrylate) (PMMA). Two LOF prototypes have been manufactured and exposed at the IRRAD Proton Facility at CERN in Geneva to 23 GeV protons for a total fluence of 0.67 × 1016 protons/cm2, corresponding to an absorbed dose of 1.8 MGy. Experimental data demonstrated the "radiation resistance" feature of the LOF devices and a clear dependence of the reflected spectrum versus the total dose, expressed by a cumulative blue-shift of ~1.4 nm of the resonance combined with a slight increase of 0.16 dBm in the reflected spectrum. The numerical analysis carried out to correlate the experimental results with the dimensional and physical properties of the resonator, expected to be tightly connected to the absorbed dose, suggests that the main phenomenon induced by exposure to proton beam and able to explain the measured spectral behavior is the reduction of the PMMA thickness, which is also consistent with past literature in the field. Preliminary results demonstrated the potentiality of the proposed platform as dosimeter at MGy dose levels for high energy physics experiments.Entities:
Year: 2018 PMID: 30552352 PMCID: PMC6294823 DOI: 10.1038/s41598-018-35581-3
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1Different active and passive technologies for TID dosimetry available on the market are shown with respect to their monitoring range[60]. The highlighted and empty area in the Ultra High Dose range indicates the target area of the technology presented in this paper.
Operational range of current PH-RADMON devices for the LHC experiment[4] as compared with the performance required (after 10 years of operation) from the new Ultra High Fluence and Dose dosimetry for the future HL-LHC upgrade and FCC[4,7,60].
| LHC | FCC | |||
|---|---|---|---|---|
| Diodes LBSD/BPW[ | RadFETs LAAS/REM[ | Ultra High Fluence Monitor[ | Ultra High Dose Monitor[this work] | |
| Type of Device | p-i-n photodiode | Thick oxide MOSFET | Thin metal film Resistors | Metallo/dielectric resonator on Fiber Optic |
| Working Principle | Increase of diode’s forward current | Shift of transistor threshold voltage | Increase of film resistivity | Shift of resonance frequency |
| Radiation Interaction | Displacement Damage in Silicon | Charge trapping in gate oxide | Displacement Damage in Metal* | Compression of PMMA layer due to absorbed dose* |
| Target Max Radiation (over 10 years) | Tunnel: 1.0 × 1011 n1MeV/cm2 Experiments: 1.0 × 1015 n1MeV/cm2 | Tunnel: 1 kGy Experiments: 100 kGy | Tunnel: 1.0 × 1013 n1MeV/cm2 Experiments: 2.8 × 1016 n1MeV/cm2 | Tunnel: 100 kGy Experiments: 90 MGy |
| Device Operating Range | LBSD: 1.0 × 108÷2.0 × 1012 BPW: 2.0 × 1012÷2.0 × 1015 | LAAS: 0.01 Gy÷10 Gy REM: 10 Gy÷100 kGy | From 1015 n1MeV/cm2 | From 100 kGy |
(*effects being investigated in ongoing activities).
Figure 2Cross section view of the LOF resonator realized on the OFT.
Figure 3(a) Schematic of the LOF nanostructure (unit cell) and electric field distribution in correspondence of the resonance wavelength (λres∼1566 nm); (b) numerical reflected spectrum.
Resume of the main radiation effects reported in literature occurring in the classes of materials used to build the LOF device.
| Material | Phenomenon reported | References |
|---|---|---|
| PMMA | Increase of the real part of the RI as the result of compaction of the irradiated PMMA layer (densification). Increase of the propagation losses. |
[ |
| Metal | Increase of metal resistivity with increasing particle fluence. |
[ |
| Fiber glass | Increase of the imaginary part of the RI (radiation-induced attenuation). Increase of the real part of the RI (radiation-induced RI variation). |
[ |
Figure 4(a) Numerical simulations predicting the effects of a perturbation of nPMMA on the LOF resonance wavelength. Black dashed lines refer to nominal value of nPMMA. The inset box indicates the equation of the linear fitting. (b) Whole spectrum evolution determined by the variation of nPMMA. The black arrow indicates the variation direction of the parameter.
Figure 5(a) Numerical simulations predicting the effects of a perturbation of kPMMA on the resonance wavelength. Logarithmic scale is used for the x-axis. The inset box indicates the equation of the quadratic fitting. (b) Whole spectrum evolution determined by the variation of kPMMA. The black arrow indicates the variation direction of the parameter.
Figure 6(a) Numerical simulations predicting the effects of a variation of tPMMA(with steps of 10 nm) on the resonance wavelength. Black dashed lines refer to nominal value of tPMMA. The inset box indicates the equation of the quadratic fitting. (b) Whole spectrum evolution determined by the variation of tPMMA. The black arrow indicates the variation direction of the parameter.
Sensitivity analysis. The signs reported in the second column follow the legend: “ + “ for a positive change, “−“ for a negative change. The reflectance baseline sensitivity is evaluated on the normalized reflectance in the range 0–1.
| Material Property | Sign | Variation reported in literature | LOF structure | |
|---|---|---|---|---|
| Range | λRES Sensitivity | Baseline Sensitivity | ||
| ΔnPMMA | + | nPMMA,nom = 1.490 @ 633 nm [refs[ | + 310 nm/RIU | –0.375 RIU-1 |
| ΔkPMMA | + | kPMMA,nom = 5.1·10−6 [ref.[ | + 70 nm/a.u. | –5.21 a.u.-1 |
| ΔtPMMA | − | tPMMA,nom = 1 mm ÷ 3 mm [refs[ | + 0.136 nm/nm | −0.001 nm−1 |
| Δrholes | + | Data Not Available | + 0.183 nm/nm | +0.002 nm−1 |
| Δngold | + | Data Not Available | −1.9 nm/RIU | −0.18 RIU−1 |
| kgold | − | kgold,nom (λ = 1566 nm) = 9.91 [ref.[ | −7.58 nm/a.u. | −0.03 a.u.−1 |
| Δnfiber | + | nfiber,nom = 1.453 ÷ 1.455 @ 1566 nm [ref.[ | + 721 nm/RIU | −0.006 RIU−1 |
| Δkfiber | + | kfiber,nom = 1.29·10−10 @ 1550 nm [ref.[ | −39.1 nm/a.u. | −7.4 a.u.−1 |
Figure 7(a) Schematic representation of the technological steps used in the probe realization process: i) polymeric overlay deposition, ii) OFT exposure to electron beam and polymer development, iii) gold superstrate deposition. (b) Optical microscope image of an OFT after the deposition of the PMMA layer, showing a uniform region with a diameter of about 50 μm around the fiber core. (c) SEM image showing the top view of the metallo-dielectric nanostructure realized on the OFT.
Figure 8Experimental normalized reflectance spectrum of the 2D hybrid metallo-dielectric structure: (a) prototype A; (b) prototype B.
Figure 9(a) OF samples placed on the irradiation table IRRAD3; (b,c) detail of the OF sensor mounted on the sample holders.
Figure 10Daily and cumulative dose absorbed by the LOF devices during the exposure to proton beam.
Figure 11Spectra reflected by the two LOF prototypes during the exposure to 23 GeV proton beam for 9 days. The legend indicates the dose accumulated at the end of each day; (a) prototype A; (b) prototype B.
Figure 12Average of the resonance wavelength shifts calculated for both LOF sensors; (a) wavelength shift reported as a function of the time (1 point per hour); (b) calibration curve displaying the wavelength shift reported as a function of the dose (1 point per day). Error bars refer to the standard deviation calculated on the two prototypes.