| Literature DB >> 30404300 |
David Lowell1, David George2, Jeffrey Lutkenhaus3, Chris Tian4, Murthada Adewole5, Usha Philipose6, Hualiang Zhang7, Yuankun Lin8,9.
Abstract
In this paper, we have systematically studied the holographic fabrication of three-dimensional (3D) structures using a single 3D printed reflective optical element (ROE), taking advantage of the ease of design and 3D printing of the ROE. The reflective surface was setup at non-Brewster angles to reflect both s- and p-polarized beams for the interference. The wide selection of reflective surface materials and interference angles allow control of the ratio of s- and p-polarizations, and intensity ratio of side-beam to central beam for interference lithography. Photonic bandgap simulations have also indicated that both s and p-polarized waves are sometimes needed in the reflected side beams for maximum photonic bandgap size and certain filling fractions of dielectric inside the photonic crystals. The flexibility of single ROE and single exposure based holographic fabrication of 3D structures was demonstrated with reflective surfaces of ROEs at non-Brewster angles, highlighting the capability of the ROE technique of producing umbrella configurations of side beams with arbitrary angles and polarizations and paving the way for the rapid throughput of various photonic crystal templates.Entities:
Keywords: 3D laser fabrication; holographic lithography; micro/nano fabrication; photonic crystals; single optical element
Year: 2016 PMID: 30404300 PMCID: PMC6190044 DOI: 10.3390/mi7070128
Source DB: PubMed Journal: Micromachines (Basel) ISSN: 2072-666X Impact factor: 2.891
Figure 1(a) Model of the lab-designed ROE in the 4 + 1 configuration, designed using CAD software. The reflective surfaces are mounted on the support structures to reflect a single circularly polarized laser beam; (b) schematic of wave vector configuration for four side beams and one central beam in the 4 + 1 configuration; (c) schematic of an aperture for beam selection; (d) photonic band structure for one of holographic photonic crystals; and (e) plot of maximum bandgap size and filling fraction of dielectric that produces maximum bandgap for the PhCs that can be fabricated using a reflective surface with refractive index n and angle of incidence 67°.
Figure 2(a) Cross-section view SEM of over-exposed sample formed with 4 + 1 configuration ROE; (b,c) Top-view SEM of holographically fabricated, well-developed 3D structures with 4 + 1 configuration ROE with large areas showing no diffraction pattern (b) and enlarged view (c); Fabricated (d) and (e) simulated cross-sectional view of 3D structure formed with 4 + 1 configuration. The structure is not uniform as was expected due to a designed shift in the angle of incidence of a side beam. The dark-red solid line is in parallel with the sample surface and the yellow dashed line indicates the orientation of the holographic structures.
Figure 3(a) Simulated top view of the 5 + 1 interference pattern and (b) atomic force micrograph (AFM) of fabricated quasi-crystals in DPHPA using a 5 + 1 configuration ROE. Five-circle clusters, pentagons, sun-like shapes of ten lines and decagons are drawn for eye guidance; (c) simulated interference patterns showing the front and back sides of a cubic volume; (d–f) cross-section SEM images of fabricated 3D quasicrystals in SU-8 cut in different orientation revealing various structural information; and (g) a side view of simulated 3D interference pattern due to 5 + 1 beams.
Figure 4(a) SEM of cross-section of not fully developed 3D PhCs in SU-8 but cut in an orientation where layer-by-layer pattern can be seen; (b) SEM of top-view of fabricated structures with six-fold symmetry in SU-8. Yellow lines indicate the orientation of structures in different layers. The hexagonal structure and the lattice constant Λ are indicated by the green hexagon and red arrow, respectively, for eye guidance; (c) SEM of the cross section of fabricated 3D PhCs in SU-8 and (d) the simulated interference pattern. Yellow lines indicate analogous fabricated and simulated structures; (e) measured FTIR reflection spectra from SU-8 PhCs and overexposed SU-8 film without any structures.
Figure 5(a) Diffraction pattern from fabricated 3D photonic crystal template in SU-8 using 532 nm laser; (b) top-view of simulated interference among pure s-wave side beams plus the central circularly polarized beam; (c) among pure p-wave side beams plus the central circularly polarized beam; (d) among side beams with both s- and p-waves plus the central circularly polarized beam. Interference patterns generated with 4 + 1 and 6 + 1 configurations are shown in top and bottom row in (b,c,d), respectively. Circles indicate the corresponding locations of high intensity spots. Dotted circles indicate the spots located at the bottom as shown in the side view in the insert in (c).