| Literature DB >> 30398875 |
Sonal Bhadauriya1, Xiaoteng Wang1, Praveen Pitliya2, Jianan Zhang3, Dharmaraj Raghavan2, Michael R Bockstaller3, Christopher M Stafford4, Jack F Douglas4, Alamgir Karim1.
Abstract
Polymer films provide a versatile platform in which complex functional relief patterns can be thermally imprinted with a resolution down to few nanometers. However, a practical limitation of this method is the tendency for the imprinted patterns to relax ("slump"), leading to loss of pattern fidelity over time. While increasing temperature above glass transition temperature ( Tg) accelerates the slumping kinetics of neat films, we find that the addition of polymer-grafted nanoparticles (PGNP) can greatly enhance the thermal stability of these patterns. Specifically, increasing the concentration of poly(methyl methacrylate) (PMMA) grafted titanium dioxide (TiO2) nanoparticles in the composite films slows down film relaxation dynamics, leading to enhanced pattern stability for the temperature range that we investigated. Interestingly, slumping relaxation time is found to obey an entropy-enthalpy compensation (EEC) relationship with varying PGNP concentration, similar to recently observed relaxation of strain-induced wrinkling in glassy polymer films having variable film thickness. The compensation temperature, Tcomp was found to be in the vicintity of the bulk Tg of PMMA. Our results suggest a common origin of EEC relaxation in patterned polymer thin films and nanocomposites.Entities:
Keywords: Polymer nanocomposite; enthalpy−entropy compensation effect; lithography; pattern decay; polymer thin films; stability
Year: 2018 PMID: 30398875 PMCID: PMC6537094 DOI: 10.1021/acs.nanolett.8b02514
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189