| Literature DB >> 30373140 |
Jie Li1, Wenbo Hu2, Kang Wang3, Buyu Gao4, Yongdong Li5, Shengli Wu6, Jintao Zhang7, Huiqing Fan8.
Abstract
Au-doped MgO films were prepared by reactive sputtering of individual Mg and Au targets, and the Au doping effect on the electron-induced secondary electron emission (SEE) performance was explored by means of surface analysis, first-principle calculation, and electrical characteristic measurement. The results show that the size enlargement of MgO grains and the reduction of surface work functions induced by Au doping are the main reasons for the increase of the SEE coefficient (δ). Additionally, the superior SEE degradation property of the Au-doped MgO film under continuous electron bombardment results from the improvement of electrical conductivity. Through the optimization of Au doping concentration (x), Au-doped MgO film with an x value of 3.0% was found to have the best SEE performance due to its highest SEE coefficient and longest duration of maintaining a relatively high SEE coefficient; its maximum δ value reached 11.5-an increase of 32.2% in comparison with the undoped one.Entities:
Keywords: Au doping; Au-doped MgO films; electrical conductivity; first-principle calculation; secondary electron emission; work function
Year: 2018 PMID: 30373140 PMCID: PMC6267367 DOI: 10.3390/ma11112104
Source DB: PubMed Journal: Materials (Basel) ISSN: 1996-1944 Impact factor: 3.623
Figure 1δ–Ep curves of an undoped MgO film sample and three Au-doped MgO film samples with doping concentrations of 1.5%, 3.0%, and 4.5%.
Figure 2δ–t curves of an undoped MgO film sample and three Au-doped MgO film samples with doping concentrations of 1.5%, 3.0%, and 4.5%.
Figure 3SEM micrographs and MgO grain size probability histograms of (a) an undoped MgO film sample and three Au-doped MgO film samples with doping concentrations of (b) 1.5%, (c) 3.0%, and (d) 4.5%.
Figure 4AFM images of (a) an undoped MgO film sample and three Au-doped MgO film samples with doping concentrations of (b) 1.5%, (c) 3.0%, and (d) 4.5%.
Work functions of the (200) and (220) crystal planes of an undoped MgO crystal and three Au-doped MgO crystals with doping concentrations of 1.6%, 3.1%, and 4.7%.
| Au Doping Concentration (%) | Work Function (eV) | |
|---|---|---|
| (200) Crystal Plane | (220) Crystal Plane | |
| 0 | 5.32 | 5.38 |
| 1.6 | 1.86 | 2.97 |
| 3.1 | 1.92 | 3.25 |
| 4.7 | 2.22 | 3.52 |
Band gaps of an undoped MgO crystal and three Au-doped MgO crystals with doping concentrations of 1.6%, 3.1%, and 4.7%.
| Au Doping Concentration (%) | Band Gap (eV) |
|---|---|
| 0 | 4.76 |
| 1.6 | 2.47 |
| 3.1 | 2.26 |
| 4.7 | 1.96 |
Figure 5Total densities of electronic states (DOS) of (a) an undoped MgO film sample and three Au-doped MgO film samples with x of (b) 1.6%, (c) 3.1%, and (d) 4.7%.
Figure 6I–V curves of an undoped MgO film sample and three Au-doped MgO film samples with doping concentrations of 1.5%, 3.0%, and 4.5%.