| Literature DB >> 30353230 |
Jing Ma1,2, Yuanfei Ai3, Lei Kang4,5, Wen Liu1, Zhe Ma1,2, Peishuai Song1,4, Yongqiang Zhao1,2, Fuhua Yang1,5, Xiaodong Wang6,7.
Abstract
As three-dimensional (3D) nanostructures can significantly improve the absorption capacity of photons, it is widely used in various photovoltaic devices. However, the high-cost and complex preparation process of traditional 3D nanostructures restricted its development greatly. In this paper, a new type of nanocone cluster microstructure was prepared on polydimethylsiloxane (PDMS) substrate by using a simple template process. This novel nanocone cluster microstructure can significantly improve the light transmittance and reduce the light reflection, showing superior anti-reflection property. In the whole range of visible band, the nanocone cluster microstructure effectively reduces the reflectivity of the light, so that it remains below 3.5%. In addition, this kind of cluster microstructure showed excellent superhydrophobic property and self-cleaning ability with the contact angle of 151°.Entities:
Keywords: Anti-reflection; Nanostructure; PDMS; Superhydrophobic
Year: 2018 PMID: 30353230 PMCID: PMC6199206 DOI: 10.1186/s11671-018-2754-4
Source DB: PubMed Journal: Nanoscale Res Lett ISSN: 1556-276X Impact factor: 4.703
Fig. 1a–e The schematic fabrication process of nanocone cluster microstructures
Fig. 2SEM images of a V-shape AAO template and b–d PDMS nanocones with aspect ratios of 1, 2, and 3
Fig. 3Reflectance and transmittance measurements of the PDMS films with and without nanocone cluster microstructures
Fig. 4The water contact angles of PDMS films with different aspect ratios
Fig. 5Water droplets on a large surface of the superhydrophobic PDMS film