| Literature DB >> 30241294 |
Ying Cai1,2, Fei Li3,4, Jingdong Zhang5,6, Zixian Wu7,8.
Abstract
The awareness of occupational health risk management in the electronics industry is weak in China, and many Chinese occupational health management regulations have not been effectively implemented. China's current occupational hazards classification method and the Environmental Protection Agency (EPA) inhalation risk assessment model recognized internationally were used to perform health risk assessments for a chip manufacturing company in the electronics industry in order to determine the existing problems and put forward the optimization proposals of the occupational hazards classification method in China. The results showed that the detected concentrations of toxic and harmful chemicals in all testing points did not exceed the occupational health exposure limits in China. According to the EPA inhalation risk assessment model, the highest values of non-carcinogenic risks of ammonia, chlorine, fluoride, sulfuric acid, hydrogen chloride, ethylene glycol, phosphine, boron trifluoride, isopropanol, benzene, and xylene were 5.10, 67.12, 1.71, 45.98, 1.83, 1.43, 160.35, 46.56, 2.52, 5.55, and 5.37, respectively, which means workers in electronic chip manufacturing companies exposed to these chemicals have higher occupational health risks. However, on the basis of the occupational hazards classification method, the occupational health risks of exposure to the toxic and hazardous chemicals are relatively harmless operations. The evaluation results of the EPA inhalation risk assessment model are generally higher than those of the occupational hazards classification method. It's recommended to refine the value of occupational exposure limit B, taking more characteristics of the hazard factors into account and fuzzifying the parameters to optimize the occupational hazards classification method. At the same time, it is suggested that the electronic chip manufacturing company should conduct anti-virus risk management covering in three aspects: increasing the awareness of occupational hazards, enhancing system ventilation, and improving personal health management measures.Entities:
Keywords: EPA inhalation risk assessment model; electronics industry; occupational hazards classification; occupational health; risk management
Mesh:
Substances:
Year: 2018 PMID: 30241294 PMCID: PMC6210263 DOI: 10.3390/ijerph15102061
Source DB: PubMed Journal: Int J Environ Res Public Health ISSN: 1660-4601 Impact factor: 3.390
Figure 1The main technological process of the chip manufacturing company.
The main technological process and occupational health hazards identification of the chip manufacturing company.
| Main Process | Possible Chemical Hazards |
|---|---|
| Cleaning | Hydrogen peroxide, sulfuric acid, phosphoric acid, nitric acid, hydrofluoric acid, hydrochloric acid, isopropyl alcohol, acetone. and ammonia |
| Oxidation and Diffusion | Diborane and phosphine |
| Ion Implantation | Phosphine, arsine, and boron trifluoride |
| Lithography | TMAH, cyclopentanone, isopropanol, ethylene glycol, and butyl acetate |
| Wet Etching | Sulfuric acid, hydrofluoric acid, nitric acid, phosphoric acid, ammonia, and hydrogen peroxide |
| Dry Etching | Sulphur hexafluoride, hydrogen chloride, and chlorine |
| Chemical Vapor Deposition | Hydrogen chloride, fluoride, silane, phosphine, arsine, diborane, chlorine trifluoride, ammonia, chlorine, and nitrogen oxides |
| Chemical Mechanical Polishing | Ammonia, hydrofluoric acid, hydrogen peroxide, and potassium hydroxide |
| Metalization | Copper, ammonia, hydrofluoric acid, sulfuric acid, nitric acid, fluoride, and hydrogen peroxide |
| Public Auxiliary Facilities | Hydrochloric acid, sulfuric acid, sodium hydroxide, ammonia, fluoride, hydrogen fluoride, chlorine, isopropyl alcohol, acetone, ozone, carbon monoxide, carbon dioxide, methane and MACHs |
On-site detection factors, basis, methods, instruments, and model.
| No. | Detection Factors | Detection Basis | Detection Methods | Detection Instrument |
|---|---|---|---|---|
| 1 | Ammonia | GBZ/T160.29-2004 | Nanoreagent spectrophotometry | JH722S visible spectrophotometer |
| 2 | Chlorine | GBZ/T160.37-2004 | Methyl orange spectrophotometry | JH722S visible spectrophotometer |
| 3 | Ozone | GBZ/T160.32-2004 | Eugenol spectrophotometry | JH722S visible spectrophotometer |
| 4 | Fluoride | GBZ/T160.36-2004 | Ion selective electrode method | PHS-3D pH meter |
| 5 | Sulfuric acid | GBZ/T 160.33-2004 | Barium chloride turbidimetry | JH722S visible spectrophotometer |
| 6 | Hydrogen chloride | GBZ/T160.37-2004 | Mercury thiocyanate spectrophotometry | JH722S visible spectrophotometer |
| 7 | Ethylene glycol | GBZ/T160.48-2007 | Gas chromatography | Fl 9790II gas chromatograph |
| 8 | Phosphine | GBZ/T160.30-2004 | Ammonium molybdate spectrophotometry | JH722S visible spectrophotometer |
| 9 | Boron trifluoride | GBZ/T160.27-2004 | Phenylglycolic acid spectrophotometry | JH722S visible spectrophotometer |
| 10 | Isopropanol | GBZ/T160.48-2007 | Gas chromatography | Agilent 7890 A gas chromatograph |
| 11 | MACHs | GBZ/T160.42-2007 | Gas chromatography | Agilent 7890 A gas chromatograph |
The operation classification results of toxic and harmful chemicals.
| Grading Index Range | Level |
|---|---|
| 0 | Level 0 (relatively harmless operations) |
| 0 < G ≤ 6 | Level I (mildly hazard operations) |
| 6 < G ≤ 24 | Level II (moderately hazardous operations) |
| G > 24 | Level III (highly hazardous operations) |
Test results of occupational health hazard factors in the electronic chip manufacturing company.
| Hazard Factors | Concentration Range (mg/m3) | Exposure Limits (mg/m3) | Exposure Time (h) | Judgement Result |
|---|---|---|---|---|
| Ammonia | 0.500–7.600 | 20 | 10 | Qualified |
| Chlorine | 0.030–0.030 | 1 | 10 | Qualified |
| Ozone | 0.060–0.170 | 0.3 | 10 | Qualified |
| Fluoride | 0.010–0.036 | 2 | 10 | Qualified |
| Sulfuric acid | 0.013–0.411 | 1 | 10 | Qualified |
| Hydrogen chloride | 0.011–0.109 | 0.75 | 10 | Qualified |
| Ethylene glycol | 1.700–1.700 | 20 | 10 | Qualified |
| Phosphine | 0.090–0.143 | 0.3 | 10 | Qualified |
| Boron trifluoride | 1.213–1.803 | 3 | 10 | Qualified |
| Isopropanol | 1.500–1.500 | 350 | 10 | Qualified |
| Benzene | 1.200–1.200 | 6 | 10 | Qualified |
| Toluene | 0.900–0.900 | 50 | 10 | Qualified |
| Xylene | 1.600–1.600 | 50 | 10 | Qualified |
Evaluation results of two methods of occupational hazards classification for the electronic chip manufacturing company.
| Hazard Factors | EPA Inhalation Risk Assessment Model | Occupational Hazard Classification | ||
|---|---|---|---|---|
| HQ | High Risk Ratio | Low Risk Ratio | Risk Level | |
| Ammonia | 0.34–5.10 | 76% | 24% | Level 0 relatively harmless operation |
| Chlorine | 67.12 | 100% | 0% | Level 0 relatively harmless operation |
| Ozone | 0.05–0.14 | 0% | 100% | Level 0 relatively harmless operation |
| Fluoride | 0.48–1.71 | 24% | 76% | Level 0 relatively harmless operation |
| Sulfuric acid | 1.45–45.98 | 100% | 0% | Level 0 relatively harmless operation |
| Hydrogen chloride | 0.18–1.83 | 9% | 91% | Level 0 relatively harmless operation |
| Ethylene glycol | 1.43 | 100% | 0% | Level 0 relatively harmless operation |
| Phosphine | 100.68–160.35 | 100% | 0% | Level 0 relatively harmless operation |
| Boron trifluoride | 31.32–46.56 | 100% | 0% | Level 0 relatively harmless operation |
| Isopropanol | 2.52 | 100% | 0% | Level 0 relatively harmless operation |
| Benzene | 5.55 | 100% | 0% | Level 0 relatively harmless operation |
| (Risk: 1.3 × 10−7) | 0% | 100% | ||
| Toluene | 0.06 | 0% | 100% | Level 0 relatively harmless operation |
| Xylene | 5.37 | 100% | 0% | Level 0 relatively harmless operation |