| Literature DB >> 30229646 |
Weijin Li1,2, Baohui Ren1, Yanning Chen1, Xusheng Wang1, Rong Cao1.
Abstract
Development of metal-organic framework (MOF) films for selectively positioning inhibitors in metallic anticorrosion applications remains a substantial challenge due to the difficulty of controlling the arrangement of inhibitor molecules in MOF pores. Cetyltrimethyl ammonium bromide (CTAB), which contains hydrophobic and hydrophilic tails, was chosen as a prototypical inhibitor and was selectively located in the pores of the classic HKUST-1 thin film on a metallic surface. Experimental results reveal that the prepared CTAB@HKUST-1 film displays good metallic anticorrosion performances, especially for bronze conservation. A possible anticorrosion mechanism of CTAB@HKUST-1 is proposed and fully discussed. The study provides an avenue for developing MOF-based thin films for metallic anticorrosion applications to address the environmental development issues related to corrosion.Entities:
Keywords: anticorrosion; electrophoretic deposition; inhibitors; metal−organic frameworks; thin films
Year: 2018 PMID: 30229646 DOI: 10.1021/acsami.8b13602
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229