| Literature DB >> 30217976 |
Xiaojing Feng1,2, Xing Zhao1,3, Liu Yang1, Mengyao Li1,4, Fengxiang Qie1, Jiahui Guo1,4, Yuchun Zhang1, Tiehu Li3, Wenxia Yuan2, Yong Yan5.
Abstract
Semiconductor pn junctions are elementary building blocks of many electronic devices such as transistors, solar cells, photodetectors, and integrated circuits. Due to the absence of an energy bandgap and massless Dirac-like behaviour of charge carriers, graphene pn junction with electrical current rectification characteristics is hardly achieved. Here we show aEntities:
Year: 2018 PMID: 30217976 PMCID: PMC6138713 DOI: 10.1038/s41467-018-06150-z
Source DB: PubMed Journal: Nat Commun ISSN: 2041-1723 Impact factor: 14.919
Fig. 1Fabrication of an all carbon materials pn diode. a The scheme of an all carbon materials pn diode consisting of a 40 nm-thick negatively charged GO(−) layer (n), a 40 nm-thick positively charged GO(+) layer (p), two 20 nm-thick CNT conducive electrodes, and two transparent glass supports. b The molecular structures of chemically functionalized positively (p) and negatively (n) charged graphene oxides. The mobile counterions are chloride anion and tetramethyl ammonium cations, respectively. c The typical TEM image of highly dispersed positively charged GO sheets. Scale bar, 500 nm. d The surface morphology (SEM image) of a 40 nm-thick positively charged GO(+) layer with a 20 nm-thick CNT layer at the bottom. Scale bar, 2 μm. e The photographs of negatively charged GO layer (left, 40 nm-thick), positively charged GO layer (middle, 40 nm-thick), and laminated layers (right). (Note: both positively and negatively charged GO have conductive CNT electrodes (20 nm-thick) at the bottom)
Fig. 2Characteization of the graphene pn diode. a The typical current–voltage characteristics of a graphene pn diode with fast (black square, 0.1 V/0.1 s) and slow sweep rate (red triangle, 0.05 V/5 s). b The statistics of rectification ratio of graphene pn diodes (r, approximately 5) and two control experiments composed of either GO(−/−) or GO(+/+) layers, showing no current rectification characteristics (r, approximately 1). The error bar for pn diode is based on 11 devices. The error bars for control experiments are based on five devices. c The current transients were monitored by stepping the potential from 0 to +1 V or −1 V. d The current transients was recorded upon laminating the positively charged and negatively charged GO layers. The current decay was fitted biexponentially
Fig. 3Modelling of the current rectification. a Spatial distribution of tetramethyl ammonium cations (red) and chloride anions (black dash) after equilibration in the absence of applied bias. b The internal electric field at the junction in the absence of applied bias. c, d The steady state current–voltage characteristics (c) and the transient current responses (d) at either positive or negative constant bias
Fig. 4All carbon materials circuits based on graphene pn diode. a, b Demonstration of an AND logic gate (a) and an OR logic gate (b) fabricated by integrating graphene pn diodes and resistors. The inset is the circuit diagram. An input of 0 or 1 represents low (0 V) or high (2 V) potentials. For both gates, the resistance of the resistor is approximately 10 MΩ