| Literature DB >> 30156331 |
Valentin Dubois1, Simon J Bleiker1, Göran Stemme1, Frank Niklaus1.
Abstract
The ability to manufacture a nanogap in between two electrodes has proven a powerful catalyst for scientific discoveries in nanoscience and molecular electronics. A wide range of bottom-up and top-down methodologies are now available to fabricate nanogaps that are less than 10 nm wide. However, most available techniques involve time-consuming serial processes that are not compatible with large-scale manufacturing of nanogap devices. The scalable manufacturing of sub-10 nm gaps remains a great technological challenge that currently hinders both experimental nanoscience and the prospects for commercial exploitation of nanogap devices. Here, available nanogap fabrication methodologies are reviewed and a detailed comparison of their merits is provided, with special focus on large-scale and reproducible manufacturing of nanogaps. The most promising approaches that could achieve a breakthrough in research and commercial applications are identified. Emerging scalable nanogap manufacturing methodologies will ultimately enable applications with high scientific and societal impact, including high-speed whole genome sequencing, electromechanical computing, and molecular electronics using nanogap electrodes.Keywords: break junctions; crack junctions; nanogap electrodes; parallel fabrication; wafer scale
Year: 2018 PMID: 30156331 DOI: 10.1002/adma.201801124
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849