Control over thin film growth (e.g., crystallographic orientation and morphology) is of high technological interest as it affects several physicochemical material properties, such as chemical affinity, mechanical stability, and surface morphology. The effect of process parameters on the molecular organization of perfluorinated polymers deposited via initiated chemical vapor deposition (iCVD) has been previously reported. We showed that the tendency of poly(1H,1H,2H,2H-perfluorodecyl acrylate) (pPFDA) to organize in an ordered lamellar structure is a function of the filament and substrate temperatures adopted during the iCVD process. In this contribution, a more thorough investigation of the effect of such parameters is presented, using synchrotron radiation grazing incidence and specular X-ray diffraction (GIXD and XRD) and atomic force microscopy (AFM). The parameters influencing the amorphization, mosaicity, and preferential orientation are addressed. Different growth regimes were witnessed, characterized by a different surface structuring and by the presence of particular crystallographic textures. The combination of morphological and crystallographic analyses allowed the identification of pPFDA growth possibilities between island or columnar growth.
Control over thin film growth (e.g., crystallographic orientation and morphology) is of high technological interest as it affects several physicochemical material properties, such as chemical affinity, mechanical stability, and surface morphology. The effect of process parameters on the molecular organization of perfluorinated polymers deposited via initiated chemical vapor deposition (iCVD) has been previously reported. We showed that the tendency of poly(1H,1H,2H,2H-perfluorodecyl acrylate) (pPFDA) to organize in an ordered lamellar structure is a function of the filament and substrate temperatures adopted during the iCVD process. In this contribution, a more thorough investigation of the effect of such parameters is presented, using synchrotron radiation grazing incidence and specular X-ray diffraction (GIXD and XRD) and atomic force microscopy (AFM). The parameters influencing the amorphization, mosaicity, and preferential orientation are addressed. Different growth regimes were witnessed, characterized by a different surface structuring and by the presence of particular crystallographic textures. The combination of morphological and crystallographic analyses allowed the identification of pPFDA growth possibilities between island or columnar growth.
Low-surface-energy
compounds are a class of materials showing peculiar
physicochemical properties, such as hydrophobicity and oleophobicity,
which make them appealing for a wide variety of applications, from
bioinspired and biocompatible materials[1−3] to anticorrosion[4,5] and antifouling coatings,[6] self-cleaning
surfaces,[7] and permeation membranes.[8]Fluorine-containing polymers are a subclass
of low-surface-energy
materials which have gained particular attention in materials science
due to their intrinsic hydrophobicity as well as peculiar morphology
and surface structure.[9−12] Perfluorinated chains in (co)polymers often result in strongly apolar
surfaces with reduced wettability for both water and/or organic molecules,
reduced adhesion, and excellent antisticking properties due to the
low surface energy and strong chemical inertness.[13] Processing of fluorinated thin films can be achieved with
a variety of techniques,[14] and among these,
vapor-phase techniques have shown several advantages, such as the
solventless processing and control over the chemical composition and
structural properties of the thin films by acting on easily adjustable
process parameters.[12,15] Furthermore, it has been shown
that the growth of fluorinated polymers on nanostructured substrates,
together with the substrate-independent thin film technologies, allowed
for unique surface structures, leading to properties like superhydrophobicity
and oleophobicity.[16]Among the thin
film technologies, initiated chemical vapor deposition
(iCVD) has been increasingly employed for the deposition of perfluorinated
polymers.[17,18] In the iCVD technique, a radical initiator
and monomer(s) are fed into a vacuum chamber from the vapor phase.
The thermal decomposition of the radical initiator (generally a peroxide)
occurs in the gas phase and is driven by a filament heated to 200–350
°C, suspended over a temperature-controlled substrate. Temperatures
in this range have been demonstrated to affect only the labile peroxide
bond of the initiator molecules while leaving the monomer structure
intact.[19] The initiator radicals then attack
the unsaturated bonds of the monomers adsorbed on the substrate (due
to their generally low vapor pressure). Subsequent chain growth and
polymerization reactions follow the path of a classical radical polymerization,
although occurring solely on the substrate surface. The advantages
of iCVD compared to other vapor-based deposition techniques (e.g.,
PE-CVD or physical vapor deposition) are the ability to finely control
the possible reaction pathways and, most importantly, to fully retain
the characteristic functional groups of the monomer.For the
deposition of perfluorinated polymers via iCVD, 1H,1H,2H,2H-perfluorodecyl
acrylate (PFDA, Figure a) has been largely used.[17,20−23] Its fast polymerization of the unsaturated acrylate group as well
as excellent thermal and chemical stability[24] makes it suitable for the synthesis of different polymers and copolymers
and has already been applied for separation membranes,[22] proton conductive membranes,[21,25] and corrosion protection.[5]
Figure 1
(a) Chemical
structure of the PFDA monomer, with the fluorinated
group highlighted (b) two characteristic preferential orientations
of the pPFDA bilayer, with the lamellae either parallel (1) or perpendicular
(2) to the substrate surface. (c) Smectic B structure of pPFDA, forming
a lamellar structure with a periodicity of 31.4 Å. (d) Hexagonal
in-plane structure of the crystalline phase of pPFDA (top view).
(a) Chemical
structure of the PFDA monomer, with the fluorinated
group highlighted (b) two characteristic preferential orientations
of the pPFDA bilayer, with the lamellae either parallel (1) or perpendicular
(2) to the substrate surface. (c) Smectic B structure of pPFDA, forming
a lamellar structure with a periodicity of 31.4 Å. (d) Hexagonal
in-plane structure of the crystalline phase of pPFDA (top view).Furthermore, next to the chemical
characteristics, poly-PFDA (pPFDA)
has been demonstrated to possess peculiar crystallographic and morphological
properties. It is well-known that the number of CF2 repeating
units in the pendant groups determines the hydrophobic/oleophobic
properties of the resulting polymer.[24,26] These properties
arise from the phase separation and self-organization of the perfluorinated
chains as polymer segments (i.e., the pendent groups and the polymer
backbone) are chemically incompatible. The polymer system arranges
all segments in phases with specific order and distance relationships.
In the literature, it has been shown that perfluorinated chains longer
than seven CF units form aggregates in
an ordered lamellar structure called a smectic phase.[24] For pPFDApolymers, a smectic B phase was identified (Figure c,d), in which perfluorinated
side groups are packed in bilayers. In the literature, different values
for the bilayer periodicity have been reported as a function of the
deposition method and experimental condition adopted.[10,24,26,27] Generally, polymers synthesized or deposited using a solvent (e.g.,
spin-coated, casted) showed higher periodicity, in between 34 and
33.2 Å.[24,26,27] Instead, we previously measured shorter periodicity (31.8 Å)
in other iCVD pPFDA layers, suggesting that the absence of solvents
affects the chain organization and crystal formation. Next to the
bilayer, the pendant groups also assume a hexagonal packing within
the lamella, with a lattice parameter of 5.8 Å (Figure d).In a previous contribution,
we studied the effect of iCVD process
parameters on the degree of crystallinity and crystallographic orientation
of pPFDA.[10] Parameters such as the initiator-to-monomer
flow ratio and the filament and substrate temperatures have been shown
to strongly affect the crystallographic order and the morphology of
the polymeric thin films. By tuning the process parameters, two different
preferred orientations of the perfluorinated lamellae were identified,
being either parallel or perpendicular to the substrate surface (Figures c, 1, and 2, respectively). Different wettability
and morphology were observed, depending on the preferred orientation,
in this way obtaining polymers with controllable physicochemical properties.
Figure 2
GIXD data
for thin pPFDA films deposited by iCVD at substrate temperatures
of (a) 20, (b) 30, (c) 40, (d) 50, and (e) 60 °C. The filament
temperature was 280 °C for all the depositions. (f) Specular
XRD patterns of the samples. Data have been shifted vertically for
the sake of clarity.
GIXD data
for thin pPFDA films deposited by iCVD at substrate temperatures
of (a) 20, (b) 30, (c) 40, (d) 50, and (e) 60 °C. The filament
temperature was 280 °C for all the depositions. (f) Specular
XRD patterns of the samples. Data have been shifted vertically for
the sake of clarity.The aim of this study is to further investigate the effect
of the
iCVD parameters on the crystalline arrangement of pPFDApolymers,
shedding light on the possible growth modes of pPFDA and additional
possibilities to control the properties of the polymer. In particular,
more detailed analyses were carried out on the effect of both substrate
and filament temperature on the crystallographic orientation and morphology
of the perfluorinated polymers. The study expanded what has been discussed
in the literature and allows further insight into the iCVD technique
and into the effect of its process parameters on material properties.
Experimental Section
Polymer
coatings of 1H,1H,2H,2H-perfluorodecyl acrylate (PFDA, 97%,
Aldrich, Germany) were deposited in a custom-built initiated chemical
vapor deposition (iCVD) chamber, using tert-butyl
peroxide (TBPO, 98%, Aldrich, Germany) as initiator. The cylindrical
chamber (height 5.5 cm, diameter 36 cm) is pumped by a Duo 65 rotary
vane pump (Pfeiffer Vacuum, Germany), and the process pressure is
regulated by a throttle valve (MKS Instruments, USA). A removable
quartz glass lid allows in situ thickness control
via laser interferometry (He–Ne laser with λ = 633 nm,
Thorlabs, USA). The chamber houses a resistively heated filament array
of 12 parallel nickel–chromium wires (Goodfellow, UK), which
are mounted with a clearance of 2.5 cm above the bottom of the reactor,
used as sample holder. The filament temperature is monitored by a
spot-welded type K thermocouple (Omega Engineering, USA). The substrate
temperature is regulated by an Accel 500 LC heater/chiller (Thermo
Fisher Scientific, USA) to ±2 °C, as monitored by a type
K thermocouple. The PFDA monomer is stored in a glass jar, kept at
80 °C, and flown into the reactor through a heated line (held
at 90 °C). The radical initiator TBPO is kept at room temperature.
Nitrogen is used as carrier gas. The PFDA flow rate was manually set
by a needle valve (Swagelok, USA). The initiator and carrier gas flow
rates were set through mass flow controllers (MKS Instruments, USA).
In Table , the process
parameters used in this work are reported.
Table 1
Experimental
Conditions Used for the
Growth of PPFDA Thin Films by iCVD
PFDA [sccm]
TBPO [sccm]
N2 [sccm]
Tfilament [°C]
Tsubstrate [°C]
press. [mTorr]
Tsubstrate series
0.20
0.6
4.0
285
20–60
800
Tfilament series
0.26
0.6
4.0
240–360
30
800
0.26
0.6
4.0
240–360
50
800
All samples
were deposited on single-side polished crystalline
silicon wafers (Siegert Wafer) with a 1.5–2 nm thick native
oxide layer on top. Coatings with an average thickness of 220 ±
30 nm were deposited. For the layers deposited at different substrate
temperatures, the amount of monomer adsorbed on the surface, generally
reported as the ratio between the monomer partial pressure (PM) and its saturation pressure (Psat), was not set to a specific value (see Table S1). For the layers deposited at different
filament temperature, the amount of adsorbed monomer was fixed to
a specific value for each of the substrate temperatures investigated.
The specific effect of the monomer adsorption on the crystallinity
and texture of pPFDA thin films was not investigated due to the inconclusive
correlation of the PM/Psat parameter with the crystal growth, inferred by both
literature[5,10] and the present results. More details are
given in the Supporting Information.The thickness of the thin films was measured ex situ by variable angle spectroscopic ellipsometry (M-2000S, J.A. Woollam)
at three different angles (65°, 70°, and 75°) in the
wavelength range 370–1000 nm. The optical model chosen consists
of three layers: the c-Si as substrate, native SiO2 (with
thickness in the range 1.5–2 nm), and the pPFDA thin film.
The optical properties of the latter were modeled by a Cauchy function,
with an Urbach tail accounting for absorption at lower wavelength.The crystalline sample properties were investigated with a PANalytical
Empyrean X-ray diffractometer, equipped with a copper sealed tube
(wavelength λ = 0.154 nm), a Göxbbel mirror, various
slits, and a PIXcel3D solid-state detector operated in
receiving slit mode. Detailed scans were taken in the scanning line
mode, which detects also some off-specular intensity (spread Δω
= ±1.65°). The angular scans (θ/θ) are represented
in the scattering vector (q) notation, whereby q = 4π sin(θ)/λ. Such a representation allows
a direct comparison of measurements taken at other wavelengths. The
index z denotes that only net-planes parallel to
the substrate surface are evaluated (specular scans).Atomic
force micrographs were taken in noncontact mode on a Nanosurf
easyScan 2, equipped with a PPP-NCLR-10 cantilever (NanoWorld AG,
Switzerland). The data are corrected for artifacts with the freely
available software package Gwyddion.[28]Grazing incidence X-ray diffraction (GIXD) was performed to investigate
the in-plane orientation of the crystallites. The measurements were
conducted at the Elettra XRD1-beamline in Trieste, Italy.[29] The incident angle α was set between 1.2°
and 2° for optimal signal intensity, and the wavelength λ
of the primary beam was either 1 or 1.4 Å. Diffracted intensities
were collected on a Pilatus 2M detector, and all data have been recalculated
to (wavelength-independent) reciprocal space maps using the in-house
developed software package GidVis. In such maps, intensities are plotted
in a pseudocolor representation as a function of the specular (q) and the in-plane component
(q) of the scattering
vector. For sake of clarity and comparability, all intensity data
were plotted in square root representation and are represented on
same color scales.
Results and Discussion
The iCVD
technique has been used for the synthesis of pPFDA thin
films following the procedure previously reported.[21,30] Full retention of the monomer structure and conversion of the unsaturated
bonds were witnessed by Fourier transform infrared spectroscopy (FT-IR).
The results are in agreement with successful polymerization also reported
in previous studies.[30,31] X-ray photoelectron spectroscopy
(XPS) was also used as an additional tool to verify the retention
of the PFDA functional groups. Both FT-IR and XPS spectra are reported
in the Supporting Information. In order
to investigate the structural and morphological changes in the pPFDA
thin films as a function of the experimental parameters, the effects
of the substrate and filament temperature were studied. In the literature,
the ratio of the monomer to the initiator flow (I/M) was shown to
greatly affect the structural and morphological properties of the
pPFDA films.[10] This effect was not further
investigated in the current study, and for this reason, the I/M was
kept in the range 2–2.5 where high crystallinity can be achieved.
Substrate
Temperature Effect
pPFDA layers were deposited
varying the substrate temperature in the range 20–60 °C
(Table ). Previous
investigations showed that lower substrate temperatures would result
in increased crystallinity when measured in a specular XRD scan (that
is, measuring crystallographic planes parallel to the substrate).
Increasing the substrate temperature would dramatically reduce the
crystallinity, resulting in thin films with smoother surfaces as measured
with AFM.[10] In order to gain further insight
into the crystal growth behavior, GIXD images and specular scans were
acquired, in this way gathering information on both the in-plane and
out-of-plane crystal orientations. In Figure , both GIXD and specular XRD data are presented
for pPFDA films prepared at different substrate temperatures.All the peaks reported in Figure correspond to aggregates in the ordered smectic B
phase (Figure ). From
the specular scans reported in Figure f, the first-order (q = 0.20 Å–1) and second-order
(0.40 Å–1) Bragg peaks of the bilayer structure
can be observed. These peaks are characteristic for (fluoroalkyl acrylate)
polymers (Figure b)
and correspond to spacings of 31.4 Å (bilayer) and 15.7 Å
(single layer lamella). This bilayer distance is slightly lower than
that of pPFDA synthesized by conventional radical polymerization,
for which values between 33 and 34 Å are reported.[24,26,27] The absence of solvents and the
possible presence of residual stress in the films could account for
the differences in packing. A detailed specular scan depicting second-
and third-order Bragg reflections is provided in the Supporting Information (Figure S3). The trend in crystallinity
as a function of the substrate temperature is in agreement with the
investigation reported in the literature (Figure f) for specular scans. A higher degree of
crystallinity is found at lower temperatures (e.g., at 20 °C),
while an increase in the substrate temperature leads to a decrease
in crystallinity. To assign the decrease in crystallinity either to
an overall amorphization of the layer or to a reorientation of the
crystal structure, GIXD measurements were performed on the same samples
(Figure a–e).
The peaks corresponding to the bilayer structure found in the specular
XRD scans are the 001 and 002. In the patterns, also the third- and
fifth-order peaks are present, located at 0.60 and 1.0 Å–1, respectively. The peak at 1.25 Å–1 is instead attributed to the hexagonal in-plane structure of the
smectic B phase with an interplanar distance of 5 Å (Figure c).[21] At low substrate temperature (Figure a), the polymers show a strong preferential
orientation along the z-axis for the bilayered structure,
that is, with the fluorinated chains perpendicular and the polymeric
backbone chains parallel to the substrate. The crystalline domains
of pPFDA contact the substrate surface along the (001) plane, which
is typically referred to as a fiber texture. The peaks showed a broad
intensity profile, suggesting small crystallite size. The Bragg peak
assigned to the hexagonal in-plane orientation showed a rodlike shape.
Bragg rods are generally attributed to 2D crystals, where little to
no correlation is present between the planes parallel to the substrate.[32]When the substrate temperature is increased
to 30 °C (Figure b), diffracted intensity
was found distributed along arcs of constant |q⃗| (so-called Debye–Scherrer rings). Therefore, a larger spread
of crystal planes contacting the substrate surface was present. When
intensity is measured along the Debye–Scherrer rings, the term
“mosaicity” is generally adopted to describe the extent
of the spread in the crystallite orientation. A higher mosaicity is
witnessed as a function of the relative intensity along the Debye–Scherrer
ring. An extreme case of mosaicity is powder like texture, that is,
when the same intensity is measured along the ring. However, for the
pPFDA layers deposited at 30 °C most of the intensity was still
located at the Bragg spots, indicating that the preferential orientation
of the lamella with the substrate surface largely persists. Additionally,
Bragg peaks appeared sharper both in the GIXD data and in the specular
scan (Figure f), suggesting
an increase in the crystallite size. At 40 °C, two distinct preferential
orientations were observed (Figure c), with the lamella bilayer oriented either parallel
or perpendicular to the substrate surface (schematically depicted
in Figure b). The
appearance of a second crystallite orientation accounts also partially
for the sudden intensity decrease observed in specular XRD scans,
which are only sensitive to one of the two orientations.The
Bragg rod of the hexagonal in-plane orientation was also partially
lost at higher substrate temperature due to a more pronounced randomization
of the crystallite orientations. In the literature, an increase in
substrate temperature from 30 to 45 °C showed a similar decrease
in crystallinity when measured with specular XRD scans, which was
attributed to a more predominant amorphous phase due to the thermal
energy provided to the system during synthesis.[10] In this study, the deeper in-plane structure investigation,
instead, showed that increasing the temperature up to 40 °C allowed
the perfluorinated chains to orient parallel to the substrate and
to organize the lamella structure with the backbone chains perpendicular
to the substrate plane. Increasing the substrate temperature above
40 °C had a detrimental effect on the preferential orientation
of the PFDA crystallites. As reported in Figure d, a powder like spectrum of pPFDA was observed
for substrate temperatures of 50 °C. The further increase in
thermal energy impedes a regular packing of the pPFDA chains with
a distinct contact plane with the substrate surface. The crystallites
were then found to orient randomly in the polymer bulk. Overall, these
effects increased the mosaicity of the polymer texture. Finally, a
general decrease in intensity along the Debye–Scherrer rings
was found at 60 °C, together with an increase in intensity of
the background (Figure e). The more pronounced halo is generally attributed to an amorphous
material, meaning that the higher monomer mobility does not allow
for regular growth of the crystallites during deposition. In a previous
study, the postdeposition thermal stability of pPFDA was evaluated,
evidencing the melting point of the lamella at 73 ± 2 °C.[30] Most likely, the higher mobility of the growing
chains during the deposition along with the additional thermal energy
provided to the monomers adsorbed on the surface induces a loss of
order, yielding a mostly amorphous polymer.To probe the surface
morphology, atomic force microscopy images
were taken for the different pPFDA films, depicted in Figure a–e. Increasing the
temperature from 20 °C (Figure a) to 40 °C (Figure c), the polymer surface showed the appearance
of defined features, indicating an island growth of the polymer. In
the literature, the appearance of defined structured features was
reported for pPFDA layers deposited from solution when the solvent
was quickly evaporated.[27] At low temperatures,
smoother layers were obtained (σRMS = 4 nm), in contrast
with literature values for similar systems.[10] Furthermore, complete adhesion of the layer to the substrate was
witnessed, and no large-scale dewetting of the polymer layer from
the Si substrate was observed. However, it should be noted that smaller
vacancies are evident from the AFM images (e.g., the dark spots in Figure b,c). In a previous
investigation,[10] the phenomenon of dewetting
was ascribed to the low surface energy of the fluorinated polymer
together with the possible inclusion of unreacted monomer and short
oligomers. The more volatile species would then desorb from the polymer
bulk, causing the formation of holes in the polymer. The absence of
dewetting together with the smoother surface for the layer observed
in the present study might be related to differences in the experimental
conditions (e.g., a working pressure of 200 mTorr compared to one
of 800 mTorr in the present study) as well as differences in reactor
geometry influencing the transport of monomer and radical initiator
molecules. In the conditions explored, the amount of monomer adsorbed
on the surface is close to saturation (with a PM/Psat value of 0.9, see the Supporting Information) for very low substrate
temperature. The high amount of PFDA monomer adsorbed on the substrate
surface might induce a more homogeneous growth, limiting the formation
of short oligomers and compensating for the low surface energy of
pPFDA. In Figure f,
the surface roughness (σRMS) and the autocorrelation
length τ are reported as a function of the substrate temperature.
The autocorrelation length can serve as a measure for mean surface
structure size (i.e., the radius). Both parameters were obtained from
an analysis of the radial power spectral density function (rPSDF)
of the data. The rPSDF is based on Fourier decomposition of the image
into specific spatial frequencies, deconvoluting the surface roughness
as a function of unit length.[33] Increasing
the temperature from 20 to 30 °C caused the growth of more pronounced
islands, leading to a dramatic increase of the surface roughness to
130 nm. Static water contact angle measurements (see Figure S4) showed a superhydrophobic behavior (>150°)
for these layers, a consequence of the high surface roughness.[34,35] When compared to pPFDA deposited from solutions, the surface roughness
value is 1 order of magnitude lower than the ones obtained with iCVD,[27] inferring that the presence of solvents suppresses
the structuration of the pPFDApolymer. Interestingly, the lateral
dimension of the islands was only slightly increased, suggesting a
preferential out-of-plane anisotropic growth of the polymer. The islands
have an elongated form, randomly oriented on the polymer surface.
This is in agreement with the GIXD images that indicate an increase
of the mosaicity of the polymer with temperature while still maintaining
a preferential orientation of the bilayers (fiber texture). At 40 °C,
the islands were found to grow, reaching a lateral diameter of about
2 μm and completely covering the surface, while the surface
roughness was found to be fairly constant. The lateral growth of the
grains on the polymer surface can be attributed to the presence of
the two preferential orientations of the bilayer (with respect to
the substrate surface), as evidenced by the GIXD data. The orientations
of the fluorinated chains, both perpendicular and parallel to the
substrate surface, would induce a more isotropic and disordered growth
of the crystals, accounting for the increased lateral dimension and
high roughness. In this condition, superhydrophobicity and nonadhesion
(slippery behavior) were achieved, probably due to the transition
from a Wenzel to a Cassie–Baxter surface (see Figure S4).[36] Furthermore, polarized
optical microscopy images performed on these layers highlighted the
highly crystalline nature of the islands (Figure S7). A sudden change in the surface topography was observed
at temperatures between 50 and 60 °C. The surface roughness and
the features’ lateral diameter dramatically dropped to values
of 25 and 600 nm, respectively. This is accounted for by the powder
like growth of smaller pPFDA crystals, which are able then to cover
the surface and arrange so as to reduce the surface roughness.
Figure 3
Topographical
AFM images for iCVD pPFDA thin films deposited at
substrate temperatures of (a) 20, (b) 30, (c) 40, (d) 50, and (e)
60 °C. High-resolution detailed views are provided in the insets.
(f) Surface roughness σRMS and the autocorrelation
length τ as determined from analysis of the radial power spectral
density function (rPSDF) of the data. Please note that the inset depicted
in (b) uses a different color range for the sake of visibility.
Topographical
AFM images for iCVD pPFDA thin films deposited at
substrate temperatures of (a) 20, (b) 30, (c) 40, (d) 50, and (e)
60 °C. High-resolution detailed views are provided in the insets.
(f) Surface roughness σRMS and the autocorrelation
length τ as determined from analysis of the radial power spectral
density function (rPSDF) of the data. Please note that the inset depicted
in (b) uses a different color range for the sake of visibility.In summary, the substrate temperature
was found to greatly affect
the degree of crystallinity, the crystal orientation, and the topography
of the pPFDA layers. At substrate temperatures from 20 to 40 °C,
the pPFDA layers were found to develop from a fiber texture to a mixture
of two distinct bilayer orientations (parallel and perpendicular to
the substrate), which increases the surface roughness by more than
1 order of magnitude. Raising the substrate temperature further induces
a powder like texture growth and smoother surfaces, instead, eventually
leading to a loss of overall crystallinity. Tuning of the degree of
crystallinity and surface morphology can have high technological interest
when a specific surface roughness is desired.
Filament Temperature Effect
In order to investigate
the effect of the filament temperature on the structure and topography
of pPFDA layer, polymers were deposited with filament temperatures
in the range 240–370 °C and with substrate temperatures
of 30 and 50 °C. The GIXD and specular XRD measurements for the
layers deposited at 30 °C are presented in Figure .
Figure 4
GIXD data for thin pPFDA films deposited by
iCVD at a substrate
temperature of 30 °C and at filament temperatures of (a) 240,
(b) 280, (c) 320, and (d) 360 °C. (e) Specular XRD patterns of
the samples, with a detailed scan of second- and third-order reflections
being depicted in (f). Data have been shifted vertically for the sake
of clarity.
GIXD data for thin pPFDA films deposited by
iCVD at a substrate
temperature of 30 °C and at filament temperatures of (a) 240,
(b) 280, (c) 320, and (d) 360 °C. (e) Specular XRD patterns of
the samples, with a detailed scan of second- and third-order reflections
being depicted in (f). Data have been shifted vertically for the sake
of clarity.The filament temperature
is expected to influence solely the decomposition
pathways of the labile radical initiator, while keeping the structure
of the monomer intact. At temperatures below 270 °C, the initiator
TBPO is known to be cleaved at the peroxide bond, forming two tert-butoxy radicals. When the temperature is increased
above 270 °C, a second cleavage takes place through the β-scission
of the tert-butoxy radicals, leading to the formation
of smaller methyl radicals.[37] Because of
the different dimension of the formed radicals (0.6 and 0.3 nm in
kinetic diameter for the tert-butoxy and methyl radicals,
respectivelya), the filament temperature was
shown to affect the crystal orientation as well as the topography
of the layer. In a previous contribution,[10] we reported on the effect of the filament temperature on the pPFDA
structure, analyzing polymers obtained with filament temperatures
in the range 240–300 °C. At low filament temperatures,
the predominant crystal orientation was found to be with the lamella
oriented perpendicular to the substrate (as shown in Figure c, bottom). At high filament
temperature, instead, the smaller radicals were found to more easily
access also monomers organized perpendicularly on the substrate surface,
and the lamella is then aligned parallel to the substrate. AFM images
also evidenced an increase in surface roughness as a function of the
filament temperature.In the present study, a deviating behavior
was observed. In Figure a–d, GIXD
data of pPFDA films prepared at different filament temperatures are
depicted. All the samples exhibit a preferential texture, with the
lamella being oriented parallel to the substrate. However, with increased
filament temperature also a weak powder like intensity distribution
is noted, indicating the formation of more randomly oriented domains.
This is also evident when comparing the XRD pattern collected with
different detector settings. While differences in intensity appear
much larger in a truly specular scan (Figure e), they become less pronounced
when taking also some off-specular intensity (spread Δω
= ±1.65°) into account (Figure f). Interestingly, the diffraction pattern
of the pPFDA layer deposited at a filament temperature of 240 °C
is exhibiting a rather peculiar Bragg peak pattern (Figure e). Together with the peaks
at 0.20 and 0.40 Å–1, an additional peak is
visible at 0.42 Å–1, corresponding to a planar
spacing of 15 Å. This spacing is smaller than the second order
of the bilayer (15.7 Å), suggesting that a different organization
of the fluorinated chains may occur when only tert-butoxy radicals are initiating the polymer growth. The radicals
might induce a distortion in the bilayer structure, which would also
account for the asymmetric peak at 0.20 Å–1. In the literature, the bilayer structure is also reported in an
alternating configuration, in which the fluorinated chains of two
different polymeric backbones are not facing each other, but instead
interdigitating from the two different chains.[38] In this configuration, interpenetration of the perfluorinated
chains is also possible, reducing the overall spacing of the bilayer
and possibly accounting for the additional peaks. While such a behavior
can also be noted in previously published data,[10] it has not been explicitly addressed, and further investigations
will be needed to confirm this hypothesis. The peak disappeared when
increasing the filament temperature to 280 °C, and the peak position
was found to shift toward the lamella Bragg peak at 0.40 Å–1. At this temperature, both tert-butoxy
and methyl radicals should be present. This competition in the chain
initiation would lead to a higher degree of disorder of the polymer
growth, thus accounting for the lower crystallinity and the larger
mosaicity. A further increase in filament temperature was found to
recover the degree of crystallinity of the polymeric structure together
with a higher mosaicity (Figure c). Finally, increasing the filament temperature up
to 360 °C led to a stronger mosaicity in the polymer crystal
structure, as inferred from the increased intensity along the rings
in the GIXD patterns, and the consequential decrease of intensity
in the XRD specular scan (Figure e).The topographical AFM images of the pPFDApolymer as a function
of the filament temperature are reported in Figure .
Figure 5
Topographical AFM images for iCVD pPFDA thin
films deposited with
filament temperatures of (a) 240, (b) 280, (c) 320, and (d) 360 °C.
Insets: AFM images with higher resolution. (e) 3D representation of
the AFM image reported in (b), showing the isolated columnar growth
of pPFDA. (f) Surface roughness σRMS and the autocorrelation
length τ as determined from analysis of the radial power spectral
density function (rPSDF) of the data.
Topographical AFM images for iCVD pPFDA thin
films deposited with
filament temperatures of (a) 240, (b) 280, (c) 320, and (d) 360 °C.
Insets: AFM images with higher resolution. (e) 3D representation of
the AFM image reported in (b), showing the isolated columnar growth
of pPFDA. (f) Surface roughness σRMS and the autocorrelation
length τ as determined from analysis of the radial power spectral
density function (rPSDF) of the data.At low filament temperature (240 °C, Figure a), the layers are characterized
by a low
surface roughness (19.7 ± 0.2 nm) but a high lateral radius of
the surface features (τ = 530 ± 5 nm). The structures observed
with AFM pointed out an island growth with subsequent coalescence
of the growing islands. The low surface roughness is likely linked
to the prevalence of the tert-butoxy radicals at
this filament temperature; although bulky, a much smaller number of
these radicals is present during deposition and, in turn, also included
in the final polymer. When methyl radicals are expected to form (filament
temperature 280 °C, Figure b), a more disordered growth of the polymer was observed,
as already aforementioned. Together with a decrease in the overall
crystallinity (Figure b), the island growth becomes asymmetric, with features resembling
a columnar type growth. A more comprehensive representation of the
polymer structure is also reported in Figure e. The surface roughness is greatly affected
by the columnar growth, reaching values of 160 ± 2 nm and resulting
in superhydrophobic behavior (Figure S4). A similar phenomenon was reported by Vilaró et al.[5] In their study, PFDA was copolymerized by iCVD
with EGDMA, and the film showed a wormlike shape growth, with protuberances
smaller than 100 nm in radius arising out of a uniform layer. This
effect was attributed to the combination of a microstructuring of
the substrate (obtained via plasma etching prior to deposition) together
with the presence of the comonomer EGDMA. The latter creates the conditions
for a uniform layer from which the nanofeatures can grow. In a similar
fashion, the columnar growth observed in the present study could be
attributed to the presence of two competing growth modes which create
the conditions for an anisotropic polymerization and micro/nano structures.
The growth of a more uniform layer when the methyl radical initiated
the polymerization is confirmed by the AFM images of the pPFDA layers
deposited at higher filament temperatures (320 and 360 °C, Figures c and 5d, respectively). When the dominant radical formation is the
β-scission, smaller, more uniform structures are observed on
the surface. The surface roughness is dramatically reduced (28.2 ±
0.2 nm, Figure f)
together with the lateral diameter of the surface features (Figure f). A further increase
of the filament temperature enhanced this phenomenon, creating smoother
surfaces and smaller surface features.In summary, it was shown
that the filament temperature can be used
to tune the surface structure and the crystallographic orientation
(texture). At low filament temperatures the preferential orientation
is with the bilayer lamella perpendicular to the surface, inducing
an island growth of big isolated structures. Increasing the filament
temperature first leads to a more anisotropic growth of the polymer
layer, with columnar features arising from the more uniform surface,
reducing the overall crystallinity of the layer. Increasing the temperature
further would make the methyl radical the dominant polymerization
initiator. In this regime, smaller features are formed, which lead
to smoother surfaces and more randomly oriented crystals.Finally,
the effects of both substrate and filament temperature
were investigated. In Figure , the main results of the morphological and topographical
analysis are reported for pPFDA thin films deposited at 50 °C
in substrate temperature, changing the filament temperature from 250
to 370 °C, and compared with the results of Figure at 30 °C.
Figure 6
Topographical AFM images
of the pPFDA layers deposited at substrate
temperature of 50 °C and filament temperatures of (a) 330 and
(b) 370 °C. (c) Surface roughness σRMS and the
autocorrelation length τ for all the samples. (d) Specular XRD
data as a function of filament temperature. The plots are stacked
along the y-axis for the sake of clarity.
Topographical AFM images
of the pPFDA layers deposited at substrate
temperature of 50 °C and filament temperatures of (a) 330 and
(b) 370 °C. (c) Surface roughness σRMS and the
autocorrelation length τ for all the samples. (d) Specular XRD
data as a function of filament temperature. The plots are stacked
along the y-axis for the sake of clarity.As previously mentioned, the layers deposited at
higher substrate
temperatures are generally smoother and with a higher mosaicity (see Figures and 3). However, as also observed for the layer deposited at 30
°C, when increasing the filament temperature, a competitive growth
initiated by the tert-butoxy and methyl radicals
is observed. However, increasing the substrate temperature and, in
turn, the mobility of species on the surface seemed to delay the columnar
growth observed for layers deposited with a filament temperature of
280 °C (Figure b). The layers deposited at higher substrate temperatures showed
a retention of low surface roughness and lateral feature radius when
using filament temperatures up to 300 °C (Figure c), with values in the ranges of 27–37
and 250–260 nm, respectively. This result pointed out the possible
suppression of the chain initiation attributed to the methyl radicals
at higher substrate temperature. Under these conditions, a higher
mobility and lower surface adsorption could affect the degree of polymerization
initiated by this specific radical type. The formation of columnar
isolated structures, a possible indication of the competitive growth
between the two types of radicals, is observed at 330 °C, as
reported in Figure a,c. The roughness was found to increase to values of 75 nm, together
with a lateral radius of surface features in the order of 900 nm.
At this filament temperature, the amount of methyl radicals that are
generated is high enough to compensate for the higher mobility and
lower surface adsorption, triggering the competitive growth. The water
contact angle showed superhydrophobic behavior for these layers, as
a consequence of the high surface roughness (Figure S4). Increasing the filament temperature even further reduces
this phenomenon, and smoother layers with more homogeneously distributed
surface structures were observed (Figure b). The crystallinity followed the aforementioned
trend as a function of the morphology and competitive growth mechanisms.
The lower degree of crystallinity was found for the layer showing
the highest surface roughness, deposited at 330 °C. At both higher
and lower filament temperatures, the degree of crystallinity is comparable
(Figure d). In the
XRD scan, only peaks attributed to the bilayer lamella were found.
The additional peak at 0.42 Å–1 is not present
when increasing the temperature of the substrate to 50 °C. The
higher mobility of the monomer on the surface during the growth was
probably sufficient to avoid distorted or alternative crystal organizations.
Conclusions
In the present work, more insights into the
growth modes and crystal
organization of pPFDA layers deposited by iCVD were presented. A clear
dependence of the morphology and crystal structure from the process
parameters explored was observed. The possibility to finely tune these
parameters can have a high impact on applications where specific surface
properties (such as roughness and wettability) are sought. Moreover,
additional insights into the polymer growth represent useful tools
for the fundamental understanding of iCVD processes.Low substrate
temperatures were found to lead to smooth, crystalline
layers, with a preferential orientation in the fiber structure. As
the substrate temperature is increased, a process window where both
orientation and roughness of the pPFDA can be tuned was identified.
At 40 °C, two preferential orientations were found, with the
bilayer both parallel and perpendicular to the substrate surface.
The presence of both orientations leads to a peak in the surface roughness,
tunable between 4 and 130 nm with substrate temperature. A further
increase of the substrate temperature leads to a loss of crystallinity
and smoothening of the polymer surface.A variation of the filament
temperature could also be used to tune
the morphology and crystal structure. At low filament temperature,
the dominance of the tert-butoxy radicals initiating
the polymerization caused the formation of a fiber-like structure
with a possible distortion of the lattice due to the steric hindrance
of the initiator. Increasing the filament temperature additionally
leads to the formation of methyl radicals. The competition between
the two types of initiator radical in growing the polymer chains can
be related to the formation of columnar structures, increasing the
surface roughness up to 150 nm. When the methyl radical initiator
is instead dominant, loss of preferred growth was found, with a drop
in the roughness and increased mosaicity of the polymer crystal structure.In the experimental conditions explored in this study, it was possible
to steer the film properties and tailor the material characteristics,
which might be relevant for specific applications. The possibility
to range from rough, highly crystalline layers (advantageous in fields
like biomaterials) to smooth amorphous layers (adopted for instance
in optical applications) can be of a high technological interest.
Differences to what has previously been reported in the literature
hint at other influencing factors (such as pressure and reactor geometry),
which affect film growth in iCVD processes. For this reason, more
investigations would be necessary in order to identify a general process
window and, in turn, the possibility to finely predict the film properties.
Authors: Martin Tazreiter; Paul Christian; Robert Schennach; Thomas Grießer; Anna Maria Coclite Journal: Anal Methods Date: 2017-08-21 Impact factor: 2.896