Literature DB >> 30114350

Ultra Gas-Proof Polymer Hybrid Thin Layer.

Lynn Lee1, Kwan Hyuck Yoon1, Jin Won Jung1, Hong Rho Yoon1, Hongbum Kim1, Seung Hun Kim2, Seung Yong Song2, Kyung Sun Park1, Myung Mo Sung1.   

Abstract

Hermetic sealing is an important technology for isolating and protecting air-sensitive materials and is key in the development of foldable and stretchable electronic devices. Here we report an ultra gas-proof polymer hybrid thin layer prepared by filling the free volume of the polymer with Al2O3 using gas-phase atomic layer infiltration. The high-density polymer-inorganic hybrid shows extremely low gas transmission rate, below the detection limit of the Ca corrosion test (water vapor transmission rate <10-7 g m-2 day-1). Furthermore, because of the remarkable nanometer-scale thinness of the complete polymer-inorganic hybrid, it is highly flexible, which makes it useful for hermetic sealing of stretchable and foldable devices.

Entities:  

Keywords:  atomic layer infiltration; encapsulation film; flexible OLED; hermetic sealing; organic−inorganic hybrid thin layer

Year:  2018        PMID: 30114350     DOI: 10.1021/acs.nanolett.8b01855

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  4 in total

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Authors:  Eun Young Choi; Ju-Hee Kim; Bu-Jong Kim; Ji Hun Jang; Jincheol Kim; Nochang Park
Journal:  RSC Adv       Date:  2019-04-15       Impact factor: 4.036

2.  ZnO nucleation into trititanate nanotubes by ALD equipment techniques, a new way to functionalize layered metal oxides.

Authors:  Mabel Moreno; Miryam Arredondo; Quentin M Ramasse; Matthew McLaren; Philine Stötzner; Stefan Förster; Eglantina Benavente; Caterina Salgado; Sindy Devis; Paula Solar; Luis Velasquez; Guillermo González
Journal:  Sci Rep       Date:  2021-04-08       Impact factor: 4.379

3.  Low-temperature atomic layer deposition of Al2O3/alucone nanolaminates for OLED encapsulation.

Authors:  Guixiong Chen; Yalian Weng; Fan Sun; Xiongtu Zhou; Chaoxing Wu; Qun Yan; Tailiang Guo; Yongai Zhang
Journal:  RSC Adv       Date:  2019-07-04       Impact factor: 4.036

4.  Poly(styrene)-block-Maltoheptaose Films for Sub-10 nm Pattern Transfer: Implications for Transistor Fabrication.

Authors:  Anette Löfstrand; Reza Jafari Jam; Karolina Mothander; Tommy Nylander; Muhammad Mumtaz; Alexei Vorobiev; Wen-Chang Chen; Redouane Borsali; Ivan Maximov
Journal:  ACS Appl Nano Mater       Date:  2021-05-13
  4 in total

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