| Literature DB >> 29979032 |
Kamila K Konopińska, Nicholas J Schmidt, Andrew P Hunt, Nicolai Lehnert, Jianfeng Wu, Chuanwu Xi, Mark E Meyerhoff.
Abstract
Further studies aimed at examining the activity of different Cu(II)-ligand complexes to serve as electron-transfer mediators to prepare novel antimicrobial/thromboresistant nitric oxide (NO)-releasing intravenous catheters are reported. In these devices, the NO release can be modulated by applying different potentials or currents to reduce the Cu(II)-complexes to Cu(I) species which then reduce nitrite ions into NO(g) within a lumen of the catheter. Four different ligands are compared with respect to NO generation efficiency and stability over time using both single- and dual-lumen silicone rubber catheters: N-propanoate- N, N-bis(2-pyridylethyl)amine (BEPA-Pr), N-propanoate- N, N-bis(2-pyridylmethyl)amine (BMPA-Pr), 1,4,7-trimethyl-1,4,7-triazacyclononane (Me3TACN), and tris(2-pyridylmethyl)amine (TPMA). Of these, the Cu(II)BEPA-Pr and Cu(II)Me3TACN complexes provide biomedically useful NO fluxes from the surface of the catheters, >2 × 10-10 mol·min-1·cm-2, under conditions mimicking the bloodstream environment. Cu(II)Me3TACN exhibits the best stability over time with a steady and continuous NO release observed for 8 d under a nitrogen atmosphere. Antimicrobial experiments conducted over 5 d with NO-releasing catheters turned "on" electrochemically for only 3 or 6 h each day revealed >2 logarithmic units in reduction of bacterial biofilm attached to the catheter surfaces. The use of optimal Cu(II)-ligand complexes within a lumen reservoir along with high levels of nitrite ions can potentially provide an effective method of preventing/decreasing the rate of infections caused by intravascular catheters.Entities:
Keywords: antimicrobial catheters; copper(II) complexes; electrochemical nitrite reduction; intravenous catheters; modulated NO-release; nitric oxide
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Year: 2018 PMID: 29979032 PMCID: PMC6215362 DOI: 10.1021/acsami.8b05917
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229